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High-gain graphene photodetector based on double gate voltage regulation and preparation method thereof

A technology of photodetector and graphene, which is applied in the field of photodetection, can solve the problems that the performance of composite structure photodetector is difficult to control, the effect of interface coupling is difficult to achieve the best, and the response time of the device is sacrificed, and the structure and preparation process are achieved. Simple and easy to realize, reduce production cost, simple preparation process

Active Publication Date: 2022-08-02
CHONGQING INST OF GREEN & INTELLIGENT TECH CHINESE ACADEMY OF SCI +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, the increase in gain is based on the trap effect, that is, at the expense of device response time
[0005] Due to the uncontrollability of graphene doping and the instability of interface contact, the performance of composite structure photodetectors is usually difficult to achieve controllability, and its interface coupling effect is also difficult to achieve the best.

Method used

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  • High-gain graphene photodetector based on double gate voltage regulation and preparation method thereof
  • High-gain graphene photodetector based on double gate voltage regulation and preparation method thereof
  • High-gain graphene photodetector based on double gate voltage regulation and preparation method thereof

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Embodiment 1

[0042] This embodiment is a high-gain graphene photodetector based on double gate voltage regulation, and its structure is as follows figure 1 shown.

[0043] The photodetector includes an SOI substrate, a metal electrode, an ion gel (5), and a graphene strip (6). The metal electrodes include a drain electrode (4), a source electrode (4), a top gate electrode (7) and a bottom gate electrode (8).

[0044] Its structural section is as figure 2 As shown, the substrate is 220 nm thick lightly doped top silicon (1), 2 μm thick silicon oxide (2) and 450 μm thick lightly doped bottom silicon (3) from top to bottom.

[0045] The drain electrode and the source electrode are respectively arranged at two ends above the lightly doped top silicon (1), and the two are composed of 3nm of chromium and 50nm of gold, with a spacing of 30μm. The graphene strip (6) is between the drain electrode and the source electrode, and the drain electrode and the source electrode are connected by the gr...

Embodiment 2

[0049] A preparation method of a high-gain graphene photodetector based on double gate voltage regulation, the main process steps include:

[0050] 1. Substrate preparation. Substrate SOI substrate. like image 3 As shown, in this embodiment, the adopted SOI substrate structure is, from top to bottom, lightly doped top silicon with a thickness of 220 nm, silicon oxide with a thickness of 2 μm, and lightly doped bottom silicon with a thickness of 450 μm. Before the substrates were used, acetone and ethanol were used for ultrasonic cleaning for 30 min in turn.

[0051] 2. Graphene growth. The graphene film was grown by chemical vapor deposition apparatus, the substrate was copper foil with a relatively flat surface, and the raw material was analytically pure ethanol. Under the action of high temperature, carbon atoms in ethanol are deposited on the surface of the substrate through adsorption, migration and other processes on the copper substrate to form a graphene film. The...

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Abstract

The invention discloses a high-gain graphene photodetector based on double gate voltage regulation and a preparation method thereof. Wherein, the detector includes a substrate with a top layer semiconductor, an intermediate layer insulating medium and a bottom layer semiconductor from top to bottom; it also includes a drain electrode, a source electrode, a top gate electrode and a bottom gate electrode, the drain electrode and the source electrode The electrodes are respectively arranged at both ends above the top semiconductor; it also includes a device channel between the drain electrode and the source electrode, and an ion insulating layer covering the device channel; the top gate electrode and the bottom gate electrode are respectively connected with the device channel. The drain electrode and the source electrode are connected, and are also connected with the ion insulating layer and the underlying semiconductor respectively. The detector uses the bottom gate to control the concentration and distribution of carriers in the semiconductor thin film, while the top gate controls the concentration and type of carriers in graphene through ion gel, extending the response band from visible light to near-infrared band. The speed is increased while the response time is also accelerated.

Description

technical field [0001] The invention relates to the technical field of photoelectric detection, in particular to a high-gain graphene photodetector based on double gate voltage regulation and a preparation method thereof. Background technique [0002] With the increasing development demands for miniaturization, integration, and high performance of optoelectronic devices, graphene is considered to be a promising material due to its excellent optoelectronic properties. [0003] The low optical absorption rate (2.3%) and short carrier lifetime (1 ps) of graphene lead to the extremely low quantum efficiency of graphene, which has always been a challenge for its application in optoelectronic devices. Photodetectors that utilize graphene itself as a light-absorbing material have low quantum efficiencies. [0004] The graphene composite structure photodetector based on the grating pressure mechanism provides a gain for the device, enabling it to obtain high photoresponsivity. How...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L31/113H01L31/18
CPCH01L31/1136H01L31/1804Y02P70/50
Inventor 伍俊魏兴战蒋昊史浩飞韩钦申钧
Owner CHONGQING INST OF GREEN & INTELLIGENT TECH CHINESE ACADEMY OF SCI