High-gain graphene photodetector based on double gate voltage regulation and preparation method thereof
A technology of photodetector and graphene, which is applied in the field of photodetection, can solve the problems that the performance of composite structure photodetector is difficult to control, the effect of interface coupling is difficult to achieve the best, and the response time of the device is sacrificed, and the structure and preparation process are achieved. Simple and easy to realize, reduce production cost, simple preparation process
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Embodiment 1
[0042] This embodiment is a high-gain graphene photodetector based on double gate voltage regulation, and its structure is as follows figure 1 shown.
[0043] The photodetector includes an SOI substrate, a metal electrode, an ion gel (5), and a graphene strip (6). The metal electrodes include a drain electrode (4), a source electrode (4), a top gate electrode (7) and a bottom gate electrode (8).
[0044] Its structural section is as figure 2 As shown, the substrate is 220 nm thick lightly doped top silicon (1), 2 μm thick silicon oxide (2) and 450 μm thick lightly doped bottom silicon (3) from top to bottom.
[0045] The drain electrode and the source electrode are respectively arranged at two ends above the lightly doped top silicon (1), and the two are composed of 3nm of chromium and 50nm of gold, with a spacing of 30μm. The graphene strip (6) is between the drain electrode and the source electrode, and the drain electrode and the source electrode are connected by the gr...
Embodiment 2
[0049] A preparation method of a high-gain graphene photodetector based on double gate voltage regulation, the main process steps include:
[0050] 1. Substrate preparation. Substrate SOI substrate. like image 3 As shown, in this embodiment, the adopted SOI substrate structure is, from top to bottom, lightly doped top silicon with a thickness of 220 nm, silicon oxide with a thickness of 2 μm, and lightly doped bottom silicon with a thickness of 450 μm. Before the substrates were used, acetone and ethanol were used for ultrasonic cleaning for 30 min in turn.
[0051] 2. Graphene growth. The graphene film was grown by chemical vapor deposition apparatus, the substrate was copper foil with a relatively flat surface, and the raw material was analytically pure ethanol. Under the action of high temperature, carbon atoms in ethanol are deposited on the surface of the substrate through adsorption, migration and other processes on the copper substrate to form a graphene film. The...
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