Crystalline oxide thin film, multilayer body and thin film transistor
An oxide thin film, thin film transistor technology, applied in transistors, crystal growth, coating, etc., can solve problems such as deviation reliability, deterioration, pipeline corrosion, etc., and achieve the effect of good mobility
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Embodiment 1
[0306] A thin film transistor was manufactured through the following steps.
[0307] (1) Formation of an oxide semiconductor layer
[0308] The sputtering target obtained from the raw material mixture of the ingredient composition ratio shown in Table 1 was used. Table 1 shows the metal composition ratio (unit: at%) in the oxide sputtering target.
[0309] Using this oxide sputtering target, an oxide semiconductor thin film (oxide semiconductor layer). The film-forming conditions are shown in Table 1. A mixed gas of high-purity argon and high-purity oxygen (impurity gas concentration: 0.01% by volume) was used as the sputtering gas.
[0310] (2) Semiconductor patterning
[0311] Next, the formed oxide semiconductor layer is patterned into an island shape by photolithography.
[0312] First, a photoresist film is formed on the oxide semiconductor layer. As the photoresist, AZ1500 (manufactured by AZ Electronic Materials) was used. Exposure was performed through a photom...
Embodiment 2～3
[0339] Small TFTs according to Examples 2 to 3 were manufactured in the same manner as in Example 1 except that the ingredient composition ratio of the sputtering target and the small TFT production conditions were changed as shown in Table 1.
Embodiment 4～8
[0343] Small TFTs related to Examples 4 to 8 were manufactured in the same manner as in Example 1 except that the ingredient composition ratio of the sputtering target and the small TFT production conditions were changed as shown in Table 2.
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