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Extreme ultraviolet light source droplet target generation device and method based on electric field force induction

A technology of extreme ultraviolet light source and generating device, applied in electrostatic heating/cooling device, electrostatic spraying device, spraying electric energy device, etc., can solve the problem of long and high transmission distance of vibration wave, requiring large air pressure and liquid metal tin density High viscosity and other problems, to achieve high jet lateral stability, avoid and high pressure air pressure source, reduce the effect of operating power consumption

Pending Publication Date: 2021-11-12
JIANGHAN UNIVERSITY
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] The main problems at present are 1. The vibration source applied in the droplet generator comes from a rigid vibrating rod, and its vibration frequency is 20 to 50 megahertz. controlled lateral drift
The lateral movement of the droplet will prevent the laser pulse from accurately bombarding the center of the droplet, which will directly affect the efficiency of extreme ultraviolet light generation; 2. The diameter of the tin droplet matching the laser pulse is 20 to 60 microns, which is the diameter of the micropore of the nozzle The same order of magnitude is also required, and the density and viscosity of liquid metal tin are high, and a large air pressure is required to spray liquid tin through the micropores, which makes the microporous nozzles always bear high pressure and the high temperature of liquid tin itself. Further increases the instability of sprayed tin droplets

Method used

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  • Extreme ultraviolet light source droplet target generation device and method based on electric field force induction
  • Extreme ultraviolet light source droplet target generation device and method based on electric field force induction

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Effect test

Embodiment 1

[0033] combine figure 2 , in an embodiment of the present invention, an EUV light source droplet target generation device induced by an electric field force includes a capacitor 7, the capacitor 7 includes a heating part and an ejection part, and the bottom end of the ejection part is provided with Microporous nozzle 2, and tin tetrachloride is contained in band capacitor 7, and 8 is electrically connected with positive pole 11 on the outer wall of described band capacitor 7, and positive pole 11 voltage is 100-500V DC bias; Said band capacitor 7 A ring-shaped belt electrode plate 10 is arranged directly below the ring-shaped belt electrode plate 10, and the ring-shaped belt electrode plate 10 is electrically connected with a negative pole.

[0034] In one embodiment of the present invention, the tin tetrachloride 8 in the band capacitor 7 is ejected from the microporous nozzle 2 to form a jet 3, and simultaneously a positive voltage is applied to the side wall of the band ca...

Embodiment 2

[0043] A generation method of the above-mentioned extreme ultraviolet light source droplet target generation device based on electric field force induction, comprising the following steps:

[0044]1) fill tin tetrachloride 8 in band capacitor 7, and apply air pressure source 5, described air pressure source 5 can select nitrogen, helium, the pressure of air pressure source is 1-5Mpa, makes tin tetrachloride 8 through micro The hole nozzle 2 forms a jet to eject;

[0045] 2) Apply a positive voltage to the wall of the capacitor 7 to make the surface of the jet 3 positively charged;

[0046] 3) Apply a negative voltage to the annular belt electrode plate 10, form an electric field force with the jet 3, and stretch the jet 3;

[0047] 4) Modulate the periodic amplitude change of the negative voltage on the annular belt electrode plate 10 to form a changing electric field force to break the jet 3 into droplets 4;

[0048] 5) Adjust the period of the amplitude on the annular belt...

Embodiment 3

[0050] Add water or ethanol to the tin tetrachloride 8, and its dissolved concentration range is 85%-99%. In order to improve the positive charge concentration in the jet 3 and enhance the effect of the electric field force, the tin tetrachloride 8 can be dissolved in water or In ethanol, in order to increase the concentration of free tin ions in the solution.

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Abstract

The invention relates to the technical field of semiconductor manufacturing, in particular to an extreme ultraviolet light source droplet target generation device and method based on electric field force induction. The device comprises a capacitor which comprises a heating part and a spraying part, the bottom end of the spraying part is provided with a micropore nozzle, tin tetrachloride is contained in the capacitor, and the outer side wall of the capacitor is electrically connected with a positive electrode. The device has the beneficial effects that the tin tetrachloride in the capacitor is sprayed out from the micropore nozzle to form jet flow, meanwhile, positive voltage is applied to the side wall of the capacitor, so that the surface of the jet flow is positively charged, meanwhile, periodic amplitude change is applied to an annular charged polar plate, so that variable electric field force is formed, the jet flow is broken into liquid drops, compared with a traditional method that an ultrasonic vibration rod is used for generating a vibration source to break the jet flow, a periodic electric field force stretching jet flow breaking method provided avoids transverse drift generated when a vibration signal is transmitted to the micropore nozzle, and has relatively high jet flow transverse stability.

Description

technical field [0001] The invention relates to the technical field of semiconductor manufacturing, in particular to a device and method for generating droplet targets of extreme ultraviolet light sources induced by electric field force. Background technique [0002] The extreme ultraviolet lithography machine adopts an extreme ultraviolet (Extreme ultraviolet, EUV) exposure light source, which is mainly an extreme ultraviolet light with a center wavelength of 13.5 nm and a bandwidth of 2%. The extreme ultraviolet light is produced by bombarding the metal tin target with high-frequency high-energy pulsed laser to generate high-temperature and high-density plasma. Ionization and recombination processes are constantly occurring in this plasma and radiate extreme ultraviolet light with a wavelength of 13.5nm. The effective element in the target material that interacts with the laser is metal tin. The common tin target supply device is a droplet target generator. Please refer t...

Claims

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Application Information

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IPC IPC(8): B05B5/00B05B5/03B05B5/053
CPCB05B5/001B05B5/0533B05B5/03
Inventor 兰慧朱珣邓宏涛陈子琪
Owner JIANGHAN UNIVERSITY
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