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Lithium niobate optical waveguide mask for fiber-optic gyroscope as well as preparation method and application of lithium niobate optical waveguide mask

A technology of fiber optic gyroscope and lithium niobate, applied in the direction of optical waveguide light guide, light guide, optics, etc., can solve the problem of rough edge of silicon dioxide mask, reduce residual intensity modulation, reduce roughness, and improve high and low temperature stability Effect

Active Publication Date: 2022-04-12
XIAN SINO HUAXIN MEASUREMENT & CONTROL
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0004] In order to solve the above-mentioned technical problems, the object of the present invention is to provide a lithium niobate optical waveguide mask for fiber optic gyro and its preparation method and application, so as to solve the problem of rough edges of the silicon dioxide mask prepared in the prior art

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  • Lithium niobate optical waveguide mask for fiber-optic gyroscope as well as preparation method and application of lithium niobate optical waveguide mask

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Embodiment 1

[0049] A preparation method of a lithium niobate optical waveguide mask for a fiber optic gyroscope (for the process flow, see figure 1 , the schematic diagram of its preparation process is shown in figure 2 ), including the following steps:

[0050] (1) Deposit a layer of silicon dioxide film with a thickness of 80nm on the X-cut lithium niobate wafer by PECVD (plasma enhanced chemical vapor deposition method);

[0051] (2) After cleaning and drying the lithium niobate wafer on which the silicon dioxide film was deposited, spin-coat a near-ultraviolet negative photoresist (ma-N1410 near German MRT company) with a thickness of 1 μm on the silicon dioxide film surface UV negative i-ray photoresist), and then after pre-baking, exposure (exposure dose is 270mJ / cm 2 ) and developing to complete the photolithography process to form a photoresist pattern;

[0052] (3) The lithium niobate wafer formed with the photoresist pattern is subjected to aging exposure without a photolith...

Embodiment 2

[0058] A preparation method of a lithium niobate optical waveguide mask for a fiber optic gyroscope (for the process flow, see figure 1 , the schematic diagram of its preparation process is shown in figure 2 ), including the following steps:

[0059] (1) Deposit a silicon dioxide film with a thickness of 50nm on a Z-cut lithium niobate wafer by magnetron sputtering;

[0060] (2) After cleaning and drying the lithium niobate wafer on which the silicon dioxide film was deposited, spin-coat a near-ultraviolet negative photoresist (ma-N1410 type of German MRT company) with a thickness of 0.5 μm on the surface of the silicon dioxide film near-ultraviolet negative i-line photoresist), and then pre-baked and exposed (the exposure dose is 270mJ / cm 2 ) and developing to complete the photolithography process to form a photoresist pattern;

[0061] (3) The lithium niobate wafer formed with the photoresist pattern is subjected to aging exposure without a photoresist plate using a phot...

Embodiment 3

[0067] A preparation method of a lithium niobate optical waveguide mask for a fiber optic gyroscope (for the process flow, see figure 1 , the schematic diagram of its preparation process is shown in figure 2 ), including the following steps:

[0068] (1) Deposit a layer of silicon dioxide film with a thickness of 100nm on the Z-cut lithium niobate wafer by PECVD (plasma enhanced chemical vapor deposition method);

[0069] (2) After cleaning and drying the lithium niobate wafer on which the silicon dioxide film was deposited, spin-coat a near-ultraviolet negative photoresist (ma-N1410 type of German MRT company) with a thickness of 0.5 μm on the surface of the silicon dioxide film near-ultraviolet negative i-line photoresist), and then pre-baked and exposed (the exposure dose is 270mJ / cm 2 ) and developing to complete the photolithography process to form a photoresist pattern;

[0070] (3) The lithium niobate wafer formed with the photoresist pattern is subjected to aging e...

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Abstract

The invention discloses a lithium niobate optical waveguide mask for a fiber-optic gyroscope as well as a preparation method and application of the lithium niobate optical waveguide mask, and the method comprises the following steps: manufacturing a silicon dioxide film on a lithium niobate substrate, then coating the surface of the silicon dioxide film with negative photoresist, and then carrying out photoetching to form a photoresist pattern; and performing ultraviolet aging and thermal aging on the lithium niobate substrate on which the photoresist pattern is formed, cleaning and etching the lithium niobate substrate after thermal aging, and finally removing the photoresist to prepare the lithium niobate optical waveguide mask for the fiber-optic gyroscope. According to the invention, the roughness of the edge of the silicon dioxide mask is reduced, the number of dotted defects at the waveguide window is reduced, the quality of the silicon dioxide mask is improved and the scattering loss of the proton exchange lithium niobate optical waveguide is reduced on the premise of not increasing additional equipment, the scattering loss is 0.04-0.07 dB / cm, and the performance of the proton exchange lithium niobate optical waveguide is improved. The purposes of reducing device insertion loss, reducing residual intensity modulation and improving high and low temperature stability are achieved.

Description

technical field [0001] The invention relates to the technical field of semiconductor integrated circuit manufacturing, in particular to a lithium niobate optical waveguide mask for an optical fiber gyroscope and a preparation method and application thereof. Background technique [0002] Lithium niobate integrated optical device is the key device of fiber optic gyroscope. The lithium niobate chip is the core of the lithium niobate integrated optical device, which integrates the functions of polarization / analysis, 3dB light splitting / combining, and phase modulation required by the fiber optic gyroscope. The lithium niobate integrated optical device and the fiber optic ring together constitute the angular velocity sensitive closed loop of the fiber optic gyroscope. Therefore, the optical path quality of the lithium niobate chip is crucial to the performance of the fiber optic gyroscope. [0003] At present, lithium niobate optical waveguide chips generally have the problem of ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G02B6/12G02B6/122G02B6/13G02B6/134G02B6/136
Inventor 段启航范建强徐金涛刘尚波李楼杨广曹辉杨一凤许慎诺王嘉
Owner XIAN SINO HUAXIN MEASUREMENT & CONTROL