Preparation method of TiAlSiN and CrAlSiN nano composite coating

A nano-composite coating and substrate technology, which is applied in the coating, metal material coating process, ion implantation plating, etc., can solve the problems of high temperature friction coefficient of TiAlN coating, coating mechanics, wear resistance decline, cutting tool cutting, etc. To solve problems such as large force, achieve the effects of excellent solid solution grains, excellent high temperature stability, and excellent mechanical properties

Pending Publication Date: 2022-04-19
GUANGDONG UNIV OF TECH
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  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] 1. Although it has a time-hardening effect, the mechanical properties of TiAlN coatings are poor under high temperature, protective atmosphere or vacuum conditions, but the oxidation initiation temperature of TiAlN coatings in air environments is lower than 800 °C;
[0005] 2. The high-temperature friction coefficient of TiAlN coating is large, which can easily lead to high cutting force, chatter and serious wear of the tool;
However, studies have found that with the introduction of Si elements, soft w-AlN (wurtzite-AlN) is easily precipitated in TiAlSiN and CrAlSiN, resulting in a sharp decline in coating mechanics and wear resistance, and ultimately destroys the service performance of the coating.

Method used

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  • Preparation method of TiAlSiN and CrAlSiN nano composite coating
  • Preparation method of TiAlSiN and CrAlSiN nano composite coating
  • Preparation method of TiAlSiN and CrAlSiN nano composite coating

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preparation example Construction

[0025] A preparation method of TiAlSiN, CrAlSiN nano composite coating, comprising the following steps:

[0026] S1: mechanically grinding, polishing and cleaning the WC-Co substrate;

[0027] S2: Using a magnetron sputtering power supply, sputter TiSi and CrSi targets in front of the WC-Co substrate; at the same time, use a cathodic arc evaporation power supply to arc evaporate TiAl and CrAl targets in front of the WC-Co substrate.

[0028] In step S2, the magnetron sputtering power supply sputters TiSi and CrSi targets, and the Si atomic ratio content in the target is 50%-100%; in step S2, the target average power density of the magnetron sputtering TiSi and CrSi targets is 5 -20 W / cm 2; In step S2, the cathodic arc evaporation power supply evaporates TiAl and CrAl targets, and the Al atomic ratio content in the target is 0-70%; in step S2, the average target current density of the cathodic arc evaporation TiAl and CrAl targets is 0.5-2A / cm 2 ; In step S2, the temperature ...

Embodiment 1

[0030] Substrate pretreatment

[0031] (1) Mechanically grinding and polishing the WC-Co substrate;

[0032] (2) Solvent cleaning treatment; first use isopropanol to ultrasonically clean for 10 minutes, then use 98% alcohol solution to ultrasonically clean for 10 minutes, take it out, and then use ultrapure water to ultrasonically clean for 3 minutes;

[0033] (3) Glow cleaning treatment: Ar gas ion source was used to clean the substrate for 30 minutes, the ambient pressure was 0.1Pa; the bias voltage of the substrate was -800V, and the frequency was 240kHz.

[0034] TiAlSiN nanocomposite coating prepared by magnetron sputtering and cathodic arc evaporation;

[0035] (1) Use the magnetron sputtering power supply to sputter the Ti50Si50 target in front of the substrate; at the same time use the cathodic arc evaporation power supply to arc evaporate the TiSi target in front of the substrate;

[0036] (2) The average power density of the magnetron sputtering Ti50Si50 target is ...

Embodiment 2

[0038] Preparation of TiAlSiN Nanocomposite Coatings by Magnetron Sputtering and Cathodic Arc Evaporation

[0039] (1) Use the magnetron sputtering power supply to sputter the Ti50Si50 target in front of the substrate; at the same time use the cathodic arc evaporation power supply to arc evaporate the TiSi target in front of the substrate;

[0040] (2) The average power density of the magnetron sputtering Ti50Si50 target is 20W / cm 2 , the average target current density of cathodic arc evaporation Ti target is 2A / cm 2 ; During the film deposition process, the substrate temperature was maintained at 600 °C, the working gas was introduced, the deposition chamber pressure was adjusted to 2.0Pa, the substrate was loaded with a negative bias voltage of -150V, and the TiAlSiN coating was deposited.

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Abstract

The invention discloses a preparation method of a TiAlSiN and CrAlSiN nano composite coating. The preparation method comprises the following steps that S1, a WC-Co matrix is subjected to mechanical grinding, polishing and cleaning treatment; s2, sputtering a TiSi target and a CrSi target in front of the WC-Co substrate by using a magnetron sputtering power supply; according to the method, on the basis of the PVD thin film deposition plasma characteristic research theory, the cathode arc evaporation technology has the high ionization characteristic, the ionization rate of magnetron sputtering is low, the magnetron sputtering power source is used, TiSi and CrSi targets are sputtered in front of the substrate, a silicon deposition source is obtained through the magnetron sputtering method, and the TiAl and CrAl targets are deposited in front of the WC-Co substrate through the cathode arc evaporation power source. The Si < + > energy and the ionization rate are low, so that the diffusion capability is weak, the amorphous SiNx can be located at a grain boundary or an interface, and finally, the production of an amorphous SiNx interface phase is facilitated; a cathode arc evaporation power supply is used, TiAl and CrAl targets are subjected to arc evaporation in front of a substrate, high ionization of Ti, Cr and Al is achieved, solid solution grains are easily formed, and the mechanical property is excellent.

Description

technical field [0001] The invention relates to a preparation method, in particular to a preparation method of TiAlSiN and CrAlSiN nanocomposite coatings, belonging to the technical field of nanocomposite coatings. Background technique [0002] my country is the world's largest manufacturing and processing base with the most complete industrial structure. The metal cutting industry consumes a large amount of cutting tools every year. With the further optimization of my country's industrial structure, the demand for high-quality precision metal cutting will continue to rise. Efficient, high-speed, high-precision cutting has become the main development direction of modern processing technology. In high-speed dry cutting, due to the severe friction between the tool and the surface of the processed material, the cutting temperature is as high as 900°C-1200°C, so the tool has problems such as high-temperature oxidation, poor red hardness, and severe wear. Depositing a hard coat...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/32C23C14/35C23C14/06
CPCC23C14/325C23C14/352C23C14/0641C23C14/0021C23C14/0036C23C14/345
Inventor 吴正涛王启民李海庆
Owner GUANGDONG UNIV OF TECH
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