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Anti-reflection layer coating, anti-reflection layer as well as preparation method and application of anti-reflection layer

An anti-reflection layer and coating technology, which is applied to coatings and devices for coating liquid on the surface, etc., can solve the problems of easy migration of small molecule perfluorinated compounds, inconsistent refractive index, instability, etc., and achieve good film-forming properties and easy removal, low refractive index, and easy handling

Pending Publication Date: 2022-07-29
WUHAN INSTITUTE OF TECHNOLOGY
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the two-phase blend will precipitate and become unstable during long-term storage. In addition, after the coating is formed, small molecule perfluorinated compounds are also prone to migration, resulting in inconsistent refractive index.

Method used

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  • Anti-reflection layer coating, anti-reflection layer as well as preparation method and application of anti-reflection layer
  • Anti-reflection layer coating, anti-reflection layer as well as preparation method and application of anti-reflection layer

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0047] A preparation method of an anti-reflection layer, comprising the steps:

[0048] (1) Dissolve polyethyleneimine with a molecular weight of 10,000 in water, and configure it into a 10wt% aqueous solution;

[0049] (2) Add perfluorocarboxylic acid to the above solution, the molar ratio of perfluorocarboxylic acid to polyethyleneimine is 1:1, and then, add 1-(3-dimethicone equimolar to perfluorocarboxylic acid) Methylaminopropyl)-3-ethyl-carbodiimide hydrochloride and equimolar 4-dimethylaminopyridine were refluxed for 24h at 80°C. After the reaction is completed, use n-butanol as a precipitant to precipitate the grafted polymer, wash the precipitate with water, dissolve the precipitate with water, then use n-butanol to precipitate the grafted polymer, and finally wash with water to obtain washing. After the grafted polymer.

[0050] (3) Dissolving the washed graft polymer obtained in step (2) in water to prepare a polymer solution of 8 wt %.

[0051](4) Add Capstone FS...

Embodiment 2

[0054] A preparation method of an anti-reflection layer, comprising the steps:

[0055] (1) Dissolve polyvinyl alcohol with a molecular weight of 30,000 in water, and configure it into a 10wt% aqueous solution;

[0056] (2) Adding perfluorocarboxylic acid to the above solution, the molar ratio of perfluorocarboxylic acid and polyvinyl alcohol is 3:1, and then adding 1-(3-dimethylformaldehyde in an equimolar amount of perfluorocarboxylic acid to it Aminopropyl)-3-ethyl-carbodiimide hydrochloride and equimolar 4-dimethylaminopyridine were refluxed at 80°C for 24h. After the reaction is completed, use n-butanol as a precipitant to precipitate the grafted polymer, wash the precipitate with water, then use water to dissolve the precipitate, then use n-butanol to precipitate the grafted polymer, and finally wash with water to dissolve in this way. - Precipitation-washing operation three times, the grafted polymer after washing can be obtained.

[0057] (3) Dissolving the washed gr...

Embodiment 3

[0061] A preparation method of an anti-reflection layer, comprising the steps:

[0062] (1) dissolving polyvinylpyrrolidone K18 in water, and configuring it into a 15wt% aqueous solution;

[0063] (2) adding perfluorosulfonic acid to the above solution, the molar ratio of perfluorosulfonic acid and polyvinylpyrrolidone K18 is 5:1, then, adding 1-(3-difluorosulfonic acid equimolar to perfluorosulfonic acid) Methylaminopropyl)-3-ethyl-carbodiimide hydrochloride and equimolar 4-dimethylaminopyridine were refluxed at 80°C for 24h. After the reaction is completed, use n-butanol as a precipitant to precipitate the grafted polymer, wash the precipitate with water, then use water to dissolve the precipitate, then use n-butanol to precipitate the grafted polymer, and finally wash with water to dissolve in this way. - Precipitation-washing operation three times to obtain the grafted polymer after washing.

[0064] (3) Dissolving the washed grafted polymer obtained in step (2) in water...

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Abstract

The invention discloses an anti-reflection layer coating, an anti-reflection layer as well as a preparation method and application of the anti-reflection layer. The preparation method of the anti-reflection coating comprises the following steps: firstly, dissolving at least one of a water-soluble polymer and an alcohol-soluble polymer in a solvent to obtain a polymer solution, then adding a perfluorinated compound, a dehydrating agent and a proton trapping agent into the polymer solution for reaction, and after the reaction is finished, adding a precipitator to obtain a precipitate; performing cyclic operation of dissolving, precipitating and washing on the precipitate to obtain a grafted polymer, and preparing the grafted polymer into a grafted polymer solution; and adding a wetting agent, a defoaming agent and an antioxidant into the grafted polymer solution, and uniformly mixing to obtain the anti-reflection layer coating. The anti-reflection coating prepared from the anti-reflection coating has the advantages of low refractive index, zero extinction coefficient, favorable film-forming property and high removability, and has application value in the field of chip manufacturing.

Description

technical field [0001] The invention belongs to the field of chip manufacturing and chemical materials, and in particular relates to an anti-reflection layer coating, an anti-reflection layer and a preparation method and application thereof. Background technique [0002] The lithography process used to produce integrated circuit devices is to cast a positive or negative resist composition on a substrate, then bake to remove the solvent in the composition, and then use ultraviolet, far ultraviolet, electron beam or X-ray to remove the solvent. The resist is exposed to radiation; and the exposed resist is developed to form a resist pattern. Note that the substrate used for processing is highly reflective. During exposure, light passing through the resist layer is often reflected by the substrate and then returned to the resist layer, causing those areas that were not expected to be exposed to be exposed by the reflected light, causing pattern defects. In addition, the light ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C09D179/02C09D129/04C09D139/06C09D7/20B05D1/00
CPCC09D179/02C09D129/04C09D139/06C09D7/20B05D1/005
Inventor 杜飞鹏鲜于万新付萍
Owner WUHAN INSTITUTE OF TECHNOLOGY