High-entropy alloy/Ti3SiC2 multilayer composite coating and preparation method thereof
A high-entropy alloy, multi-layer composite technology, applied in metal material coating process, coating, vacuum evaporation coating and other directions, can solve the problems of anisotropy, low bonding strength, and high brittleness of the coating
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[0055] The present invention provides the above-mentioned high-entropy alloy / Ti 3 SiC 2 The preparation method of the multi-layer composite coating comprises the following steps:
[0056] (1) Deposit the bottom layer and the transition layer on the surface of the substrate in turn;
[0057] (2) Alternately and cyclically deposit TiVNbMoTaW layers and Ti layers on the surface of the transition layer 3 SiC 2 layer to obtain a multi-layer composite coating pre-product;
[0058] The deposition method of the TiVNbMoTaW layer is magnetron sputtering deposition, the Ti 3 SiC 2 The deposition method of the layer is arc ion plating deposition;
[0059] (3) heat-treating the multi-layer composite coating preform to obtain a high-entropy alloy / Ti 3 SiC 2 Multilayer composite coating.
[0060] In the present invention, the bottom layer and the transition layer are sequentially deposited on the surface of the substrate. In the present invention, the substrate is preferably one or...
Embodiment 1
[0125] (1) Preparation of TiVNbMoTaW high-entropy alloy target
[0126] Step 1: The substrate selects a titanium alloy with a thickness of 6 mm as the substrate, and the surface is sandblasted, degreasing, and then ultrasonically cleaned with acetone and anhydrous ethanol, and dried for later use.
[0127]Step 2: The TiVNbMoTaW high-entropy alloy powder (as-cast atomized spherical powder) with a purity of 90% is sieved with a 200-mesh sieve, and dried in a vacuum drying oven at 150° C. for 45 minutes to obtain spray powder;
[0128] Step 3: Turn on the PCS-1000 cold spray equipment, fix the substrate on the spray jig, and use N 2 (99.9%) gas is used as the working air pressure for spraying, and the spraying process parameters are as follows:
[0129] The deposition temperature is 550℃;
[0130] The spraying pressure is 5Pa;
[0131] The nitrogen flow is 6L / min;
[0132] Nozzle size is 2.5×0.25mm 2 ;
[0133] The spraying speed is 1000mm / min;
[0134] The spraying dista...
Embodiment 2
[0143] Using TC4 titanium alloy as matrix, using Ti target, Ti 3 SiC 2 The alloy target was used as the ion arc target, and the TiVNbMoTaW high-entropy alloy target was used as the magnetron sputtering target. The polished substrates were ultrasonically cleaned in acetone and alcohol at 50 °C for 15 min, respectively, and then sucked up with filter paper. After drying, they were hung on the selected sample holder in the coating chamber with a target-to-base distance of 10 mm. Start the power supply, turn on the vacuum pump, the Roots pump, and vacuum the cavity to 5.0×10 -3 After Pa, the temperature in the deposition chamber was heated to 400°C, then argon gas of 300sccm was introduced, the substrate bias was set to -1000V, and the surface of the substrate was cleaned with Ar ions, and the bombardment time was 15min.
[0144] Coating steps:
[0145] (1) First, a layer of Ti metal layer was deposited on the substrate by arc ion plating (AIP) technology. The substrate bias wa...
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