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Process for producing metallic high-energy X-ray focusing combination lens

A combined lens and manufacturing process technology, which is applied in the production of metal high-energy X-ray focusing combined lens, and in the field of manufacturing technology of metal high-energy X-ray focusing combined lens, can solve the problem of further narrowing the center thickness of the lens unit and the cross-sectional geometry of the device. Problems such as shape limitation and device surface roughness, etc., achieve the effects of easy mass production, favorable integration, and low surface roughness

Inactive Publication Date: 2004-06-16
ZHEJIANG UNIV OF TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] 1. Due to the use of mechanical processing methods, the processing accuracy is low and the surface of the device is rough;
[0005] 2. The cross-sectional geometry of the processed device is limited;
[0006] 3. It is not conducive to mass production;
[0007] 4. It is difficult to further reduce the central thickness of the lens unit;
[0008] 5. Not conducive to integration

Method used

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  • Process for producing metallic high-energy X-ray focusing combination lens
  • Process for producing metallic high-energy X-ray focusing combination lens
  • Process for producing metallic high-energy X-ray focusing combination lens

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0028] (A) grow a layer of copper or titanium or nickel or gold or titanium oxide material film by sputtering or evaporation on the silicon or glass substrate through conventional cleaning, as the electroforming cathode film;

[0029] (B) coating a layer of positive photoresist on the electroformed cathode film, and baking and curing;

[0030] (C) coat one deck of SU8 photoresist on the cured positive photoresist, and its thickness is 100 microns;

[0031] (D) bake the sample coated with SU8 photoresist in an oven to cure the SU8 photoresist;

[0032] (E) carry out photoetching to SU8 photoresist with ultraviolet lithography method, its photoetching mask plate is the chromium plate that has been prepared with focusing combination lens structure pattern;

[0033] (F) Baking the sample after photolithography first, and developing again, so that the SU8 photoresist in the area not irradiated by ultraviolet light on the upper surface of the sample is dissolved in the developing s...

Embodiment 2

[0040] The implementation mode is carried out according to the process steps in the summary of the invention. In step (C), the thickness of the SU8 photoresist coated on the sample is 500 microns, and the rest of the steps are exactly the same as in Example 1.

Embodiment 3

[0042] The implementation mode is carried out according to the process steps in the summary of the invention. In step (C), the thickness of the SU8 photoresist coated on the sample is 800 microns, and the rest of the steps are exactly the same as in Example 1.

[0043] In the above three embodiments, we use the same patterned reticle of the focusing combination lens structure. Through the above three embodiments, all metal high-energy X-ray focusing composite lenses can be produced. During the implementation of the process, we found that for Example 1, when the thickness of the electroformed metal material is close to 100 microns, its thickness control becomes difficult. In Example 3, the ion exchange rate in the electroforming process slowed down due to the increase in the depth of the structure. This is because we are making a microstructure with a large aspect ratio. When the width is the same, the aspect ratio of the SU8 photoresist pattern is larger, and the ion exchang...

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Abstract

The invention relates to a technique to make a metal high-energy X-ray focusing combined lens. The combined lens includes substrate, electroformed cathode film, metal lens array and air gap. The making technique: clean the substrate, place surface growth metal film as electroformed cathode, coat and harden positive photoetching glue, coat negative one SU8 on the positive one, photoetch, develop, eliminate the exposed positive one, electroform, eliminate the remaining positive one and SU8, etch the electroformed cathode not covered by metal electroformed construction, and complete making.

Description

technical field [0001] The invention belongs to X-ray tiny optical devices, in particular to a manufacturing process of a metal high-energy X-ray focusing combination lens, which is suitable for the occasion of making a metal high-energy X-ray focusing combination lens. technical background [0002] Creating an X-ray lens was long considered impossible because all materials refract too weakly and absorb too strongly at X-ray wavelengths. In order to realize the focusing of X-ray beams, scientists have successively developed grazing incidence X-ray total reflection mirrors, transmission X-ray zone plates, multilayer films, crystal X-ray Bragg-Fresnel elements and X-ray catheter elements, etc. But these components are difficult to use in the high-energy X-ray band. In 1996, Snigirev reported an X-ray combination lens that can be used in the high-energy X-ray band. The combined lens has many advantages, such as no need to bend the optical path, good high temperature stability...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/32G21K1/00H01J29/60
Inventor 乐孜纯梁静秋
Owner ZHEJIANG UNIV OF TECH