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Method for preparing sulfhydryl silane-rare earth nanometer compound membrane on single crystal silicon sheet surface

A technology of mercaptosilane and single crystal silicon wafers, which is applied in the field of preparation of organic and inorganic nanocomposite films, can solve the problems of long film forming cycle, etc., and achieve the effect of low cost, dense film forming and uniform distribution

Inactive Publication Date: 2005-09-21
SHANGHAI JIAO TONG UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

This method requires 24-96 hours to prepare the precursor solution in the process of preparing the self-assembled film, which makes the entire film-forming cycle too long, and does not involve specific methods in the process of substrate processing, and this method is Prepared an organic self-assembled thin film, which did not involve the improvement and research of rare earth elements on the performance of the thin film

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0014] First, pre-treat the monocrystalline silicon wafers, soak the monocrystalline silicon wafers in aqua regia, heat the aqua regia in an electric furnace for 5 hours, cool naturally at room temperature, take out the monocrystalline silicon wafers, and use a deionized Rinse repeatedly with water and dry in a desiccator. Immerse the treated monocrystalline silicon wafer in the prepared mercaptosilane solution and let it stand for 8 hours. The molar concentration of the components of the mercaptosilane solution is: 0.5 mmol / L of 3-mercaptopropylmethyldimethoxysilane, solvent It is a benzene solution; after taking it out, wash it with chloroform, acetone, and deionized water, blow it dry with nitrogen, place it in the prepared rare earth self-assembly solution, and assemble it at 80°C for 12 hours to obtain the mercaptosilane-rare earth self-assembly Assemble nanofilms.

[0015] The component weight percentages of the rare earth self-assembly solution adopted in the present i...

Embodiment 2

[0019] First, pre-treat the monocrystalline silicon wafers, soak the monocrystalline silicon wafers in aqua regia, heat the aqua regia with an electric furnace for about 6 hours, cool naturally at room temperature, take out the monocrystalline silicon wafers, and use Rinse with deionized water repeatedly and dry in a desiccator. Immerse the treated monocrystalline silicon wafer in the prepared mercaptosilane solution and let it stand for 6 hours. The molar concentration of the components of the mercaptosilane solution is: 3-mercaptopropylmethyldimethoxysilane 0.1mmol / L, solvent It is a benzene solution; after taking it out, wash it with chloroform, acetone, and deionized water respectively, blow it dry with nitrogen, place it in the prepared rare earth self-assembly solution, and assemble it at 90°C for 11 hours to obtain the mercaptosilane-rare earth self-assembly Assemble nanofilms.

[0020] The components by weight percentage of the rare earth self-assembly solution adopte...

Embodiment 3

[0024] Firstly, pre-treat the monocrystalline silicon wafer, soak the monocrystalline silicon wafer in aqua regia, heat the aqua regia with an electric furnace for about 5 hours, cool it naturally at room temperature, take out the monocrystalline silicon wafer, and use Rinse with deionized water repeatedly and dry in a desiccator. Immerse the treated monocrystalline silicon wafer in the prepared mercaptosilane solution and let it stand for 7 hours. The molar concentration of the components of the mercaptosilane solution is: 1.0 mmol / L of 3-mercaptopropyltrimethoxysilane, and the solvent is benzene solution After taking it out, wash it with chloroform, acetone, and deionized water respectively, dry it with nitrogen, place it in the prepared rare earth self-assembly solution, and assemble it at 100 ° C for 10 hours to obtain the mercaptosilane-rare earth self-assembly nano film .

[0025] The component weight percentages of the rare earth self-assembly solution adopted in the p...

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Abstract

A method is for making mercaptosilicane-tombarthitenanometer coextruded film on the surface of a monocrystalline silicon chip, in which base material is a single-crystal chip with surface treated, employing a self-assemblage process on the surface to make said film, which comprises the following steps: putting the monocrystalline silicon chip into chloroazotic acid, pretreating the chip, washing and drying it, and immersing it into the mercaptosilicane solution for 8 hours, after the flush process, weathering it with nitrogen, then putting it into the self-assemblage solution with tombarthite compound, ethanol, ethylene diamine tetraacetic acid, chlor ammonia, aquacare and aquacare to assemble, and then getting the mercaptosilicane-tombarthite self-assemblage nanometer coextruded film. The invention provides an easy technique, and the tombarthite self-assemblage film made on the surface of the monocrystalline silicon chip can reduce friction and increase wear-resistance dramatically.

Description

technical field [0001] The invention relates to a method for preparing an organic and inorganic nanocomposite film, in particular to a method for preparing a mercaptosilane self-assembled rare earth nanocomposite film on the surface of a single crystal silicon wafer. It belongs to the field of film preparation. Background technique [0002] With the advancement of high technology, the machinery manufacturing industry is developing in the direction of miniaturization, which involves the tribological problems of the surface of micro-machines. Due to the advantages of high hardness, low cost and small surface roughness of silicon material, the application in MEMS has been paid more and more attention. However, silicon materials without surface treatment are highly brittle, and surface cracks are prone to delamination wear and brittle fracture under low tensile stress, which is difficult to meet the requirements of use. Therefore, surface modification technology is required to ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C22/02C23C22/78
Inventor 程先华白涛吴炬王梁
Owner SHANGHAI JIAO TONG UNIV
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