A method for forming a superhard amorphous carbon coating in vacuum

A technology of amorphous carbon and carbon coating, applied in coating, vacuum evaporation coating, metal material coating process, etc., can solve the problems of high internal compressive stress, substrate deformation, etc., and achieve improved performance and enhanced surface hardness , the effect of improving biocompatibility

Inactive Publication Date: 2006-06-28
ARGOR ALJBA
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] The described method has an essential drawback in that in the carbon coating to be formed, high internal compressive stresses are generated and when the coating reaches a predetermined thickness, the high internal compressive stress causes deformation of the substrate and separation of the coating. Floor

Method used

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Examples

Experimental program
Comparison scheme
Effect test

example 1

[0034] A sample, such as freshly cleaved single crystal NaCl, is fixed in an appropriate apparatus and positioned at a 30° angle relative to the carbon plasma stream. A 30 nm thick carbon film was coated by arc sputtering graphite cathodes in a pulse discharge, using the following parameters: the voltage applied across the capacitor bank with a capacitance of 2000 μF was 300 V; the discharge pulse duration was 0.75 ms; the discharge pulse repetition frequency was 1 Hz . Under these conditions, the average energy of carbon ions is 35 eV. The sample had an initial temperature of 293K and a final temperature of 313K. During the coating of the carbon film, the temperature change of this sample was 20K. When the carbon films were separated from the single crystal NaCl, they were studied by means of electron diffraction and three amorphous halos were determined. For a detailed structural study of the near-range ordering in the atomic arrangement of carbon atoms, the angular distr...

example 2

[0036]A ground sample of hardened carbon steel with dimensions of 20 x 20 x 10 mm is used; the sample is fixed on a special device for heat removal and positioned in a vacuum chamber at an angle of 45° to the carbon plasma flow. The sample is placed in a vacuum chamber, and the vacuum chamber is evacuated to 10 -3 Pa pressure. The sample was treated with titanium ions generated by an arc source of titanium plasma using a consumable cathode made of titanium. Titanium ions were electrostatically accelerated by applying an accelerating negative voltage of 1000 V to the device. The arc current was set to 75A. The processing time was 3 minutes. Then the potential was lowered to 70 V and a 50 nm thick layer of titanium was applied. Subsequently, a carbon coating with a thickness of 5 μm was applied by sputtering with a pulsed vacuum arc from a graphite cathode, with the following parameters: the applied voltage to a capacitor bank with a capacitance of 2000 μF was 300 V; The di...

example 3

[0039] A silicone plate sample is fixed on a rotating horizontal surface in a vacuum chamber. Evacuate the vacuum chamber to 10 -3 Pa pressure. The panel surface was treated by accelerated argon ions using the following discharge parameters: discharge current 100 mA, discharge voltage 2000 V; treatment time 1.5 minutes. A 170 nm thick layer of carbon was then sputtered by arc pulses using the following parameters: the applied voltage to a capacitor bank with a capacitance of 2000 μF was 300 V; the discharge pulse duration was 1.0 ms; the discharge pulse repetition rate was 3 Hz. Under these conditions, the average energy of carbon ions is 25 eV. The carbon plasma beam is deflected at an angle of 15° towards the surface of the carbon deposit by a magnetic field.

[0040] The internal compressive stress in the carbon deposit is 0.5 GPa, which is determined from the deformation value of the silicone plate. The coatings produced were free from delamination.

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Abstract

A method for forming a superhard amorphous carbon coating in vacuum, comprising the steps of: placing an article in a vacuum chamber, evacuating the chamber, treating a surface for the article with accelerated ions; applying, on the treated surface, a layer of a material that provides adhesion for subsequent layers, initiating pulsed electric-arc discharge on a graphite cathode, and obtaining a pulsed carbon plasma stream from a plurality of cathode spots that move along the cathode surface. After that, the carbon plasma is condensed in a predetermined area on the article surface to produce a superhard amorphous carbon coating, the article temperature being maintained within the range of 200 to 450 K through controlling a repetition frequency of the electric-arc discharge pulses. According to the invention, the carbon plasma pulsed stream has average ion energy of 25-35 eV and ion concentration of 1012, 1013 cm-3; axis of the carbon plasma stream being set at angle of 15-45° to a predetermined surface of an article. During application of the coating, the article temperature change Deltat is maintained within the range of 50-100 K.

Description

technical field [0001] The present invention relates to a technique for forming a superhard and durable coating in a vacuum, and in particular, to a method for forming a superhard amorphous carbon coating in a vacuum. Background of the invention [0002] A well-known method for forming a stress-relieved tetrahedrally coordinated amorphous carbon film involves depositing a graphite target on a substrate using a pulsed laser to form a carbon film with an internal stress exceeding 6 GPa, and then fabricating it at 500-750°C The film is annealed to reduce internal stress (see, eg, US Patent 6,103,305). [0003] Said method is not feasible due to high temperature annealing of the produced product, which leads to a loss of strength of the material from which the product is made and sometimes destroys the produced product. [0004] The closest technology is a method of forming a superhard carbon coating in a vacuum, which includes the following steps: placing the product in a vacu...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/22C23C14/02C23C14/06C23C14/32
CPCC23C14/025C23C14/0605C23C14/225C23C14/325
Inventor 亚历山大·亚科夫列维奇·科尔帕克夫维塔利·尼古拉耶维奇·英克缨谢尔盖·伊凡诺维奇·尤克哈努维
Owner ARGOR ALJBA
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