Resist pattern-forming method, and radiation-sensitive resin composition
a technology of resist pattern and resin composition, which is applied in the direction of photosensitive materials, instruments, photomechanical equipment, etc., can solve the problems of reduced carbon content, film loss, and impaired etching resistan
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synthesis example 1
[0247]A monomer solution was prepared by dissolving 28.4 g (35 mol %) of the compound (M-1), 18.0 g (15 mol %) of the compound (M-10) and 53.6 g (50 mol %) of the compound (M-16) in 200 g of 2-butanone, and then adding thereto 2.38 g (3 mol %) of AIBN. A 1,000 mL three-necked flask charged with 100 g of 2-butanone was purged with nitrogen for 30 minutes, and thereafter heated to 80° C. with stirring. The monomer solution prepared was added dropwise using a dropping funnel over 3 hrs. The time when dropwise addition was started was assumed to be a start time point of the polymerization reaction, and the polymerization reaction was carried out for 6 hours. After completion of the polymerization reaction, the polymerization solution was cooled to no greater than 30° C. by water-cooling. The cooled polymerization solution was charged into 2,000 g of methanol, and the white powder precipitated was filtered off. Thus resultant white powder was washed twice with 400 g of methanol, and ther...
synthesis examples 2 to 19
[0248]Polymers (A-2) to (A-11), and (CA-1) to (CA-8) were obtained in a similar manner to Synthesis Example 1 except that each monomer compound of the type and the amount shown in Tables 1-1 and 1-2 was used. Further, the content of the structural unit derived from each monomer and the molar ratio of the hydrocarbon group (a2) to the hydrocarbon group (a1) in each polymer obtained, and measurements of Mw and Mw / Mn ratio of each polymer are shown in Tables 2-1 and 2-2.
TABLE 1-1Proportion of monomer-chargedStructural unit (II)Structural unitnot containingcontainingStructural unitOther structural(I)hydroxyl grouphydroxyl group(III)unitPolymermonomermol %monomermol %monomermol %monomermol %monomermol %SynthesisA-1M-135M-1015——M-1650——Example 1SynthesisA-2M-245M-1110——M-1645——Example 2SynthesisA-3M-335M-1225——M-1640——Example 3SynthesisA-4M-530M-1017M-133M-1650——Example 4SynthesisA-5M-645M-9 25——M-1620——Example 5M-1710SynthesisA-6M-730M-1010——M-1645——Example 6M-1515SynthesisA-7M-440M-9 15...
synthesis example 20
[0249]A monomer solution was prepared by dissolving 35.8 g (70 mol %) of the compound (M-2) and 14.2 g (30 mol %) of the compound (M-18) in 100 g of 2-butanone, and then adding thereto 2.34 g of dimethyl 2,2′-azobisisobutyrate. A 500 mL three-necked flask charged with 20 g of 2-butanone was purged with nitrogen for 30 minutes, and thereafter heated to 80° C. with stirring. The monomer solution prepared was added dropwise using a dropping funnel over 3 hrs. The time when dropwise addition was started was assumed to be a start time point of the polymerization reaction, and the polymerization reaction was carried out for 6 hours. After completion of the polymerization reaction, the polymerization solution was cooled to no greater than 30° C. by water-cooling. The reaction solution was transferred to a 1 L separatory funnel, then homogenously diluted with 200 g of n-hexane, and 800 g of methanol was charge thereto followed by mixing. Subsequently, 20 g of distilled water was charged, an...
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