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Preparation of nitrogen rich three dimensional mesoporous carbon nitride and its sensing and photocatalytic properties

a three-dimensional mesoporous carbon nitride and nitrogen rich technology, applied in the field of three-dimensional nitrogen rich mesoporous materials, can solve the problems of limited chemical reactivity, inefficient sensing and/or solar energy conversion of catalysts, and cost-intensive manufacturing

Inactive Publication Date: 2021-09-23
SABIC GLOBAL TECH BV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Benefits of technology

This patent describes a new material that can be used for various applications, such as absorbing large molecules, catalyzing chemical reactions, and producing hydrogen. This material has unique properties, including a high nitrogen content and a narrow band gap. It can also be easily prepared from nontoxic precursors. Overall, this material has good textural properties and can be used for various applications without the need for additional semiconductor dopants.

Problems solved by technology

Many of the aforementioned catalysts suffer in that they are costly to manufacture and have limited chemical reactivity, light scattering, surface area, light absorption spectrum, recombination suppression properties, and / or have unordered structures.
These deficiencies make the catalysts inefficient for sensing and / or solar energy conversion, and in particular, water splitting applications.

Method used

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  • Preparation of nitrogen rich three dimensional mesoporous carbon nitride and its sensing and photocatalytic properties
  • Preparation of nitrogen rich three dimensional mesoporous carbon nitride and its sensing and photocatalytic properties
  • Preparation of nitrogen rich three dimensional mesoporous carbon nitride and its sensing and photocatalytic properties

Examples

Experimental program
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Effect test

example 1

Synthesis of Three-Dimensional Cubic Mesoporous Silica Template, KIT-6

[0062]Pluronic P-123 (4.0 g) was dissolved in a solution containing distilled water (144 g) and HCl (36 wt. %, 7.9 g) with stirring at 35° C. After complete dissolution, n-butanol (4.0 g) was added immediately. After stirring 1 h, TEOS (8.6 g) was added to the homogeneous clear solution with constant agitation. The mixture was kept under vigorous and constant agitation at 35° C. for 24 hours. Subsequently, the reaction mixture was aged at 150° C. for 24 h under static conditions. The molar gel composition of the synthesis mixture was 0.041TEOS:0.0007P123:0.054C4H9OH:0.076HCl:8.28 H2O. The white solid product was filtered hot without washing, dried in oven at 100° C. for 24 h, and then calcined in air at 540° C.

example 2

Synthesis of Three-Dimensional Mesoporous Carbon Nitride MCN-TZL from 3-AT

[0063]3-amino-1,2,4-triazole (3.0 g, 3-AT) and KIT-6 (1.0 g) was mixed in acidic DI water (0.16 g HCl in 4-5 g DI water). The mixture agitated for few minutes at a few degrees above room temperature. Upon complete dissolution, the mixture was placed in a drying oven for 6 hours at 100° C. and then 160° C. for another 6 hours. The composite of silica template and partially condensed 3-AT was heat treated at 500° C. in argon atmosphere. The composite obtained after carbonization was treated with HF at room temperature to dissolve the silica template. The template free carbon nitride (MCN-TZL) obtained was filtered, washed several times with ethanol, and dried at 100° C.

example 3

Characterization of MCN-TZL and KIT-6

1. X-Ray Diffraction Analysis

[0064]XRD: Powder XRD patterns were recorded on a Rigaku Ultima+(JAPAN) diffractometer using CuKα (λ=1.5408 Å) radiation. Low angle powder x-ray diffractograms were recorded in the 2θ range of 0.6-6° with a 2θ step size of 0.0017 and a step time of 1 sec. In case of wide-angle X-ray diffraction, the patterns were obtained in the 20 range of 10-80° with a step size of 0.0083 and a step time of 1 sec. FIG. 2 shows the low angle powder XRD patterns of MCN-TZL of the present invention and the 3D mesoporous silica template, KIT-6. FIG. 3 is a wide-angle powder XRD pattern of MCN-TZL of the present invention.

[0065]The XRD pattern of the KIT-6 silica template exhibited a sharp well resolved (211) reflection and several higher order reflections, (420), (332) at 2θ angles below 4°, indicating long range structural ordering with the symmetry of body centered cubic Ia3d space group. The unit cell constant, calculated from the (2...

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Abstract

Disclosed are compositions, processes, and methods directed to mesoporous carbon nitride materials having high nitrogen content. The mesoporous carbon nitride material has a three dimensional C3N5 3-amino-1,2,4-triazole based mesoporous carbon nitride matrix having an atomic nitrogen to carbon ratio of 1.4 to 1.7, and a band gap of 1.8 to 3 eV.

Description

CROSS REFERENCE TO RELATED APPLICATIONS[0001]This application claims the benefit of priority of U.S. Provisional Patent Application No. 62 / 375,022 filed Aug. 15, 2016, which is hereby incorporated by reference in its entirety.BACKGROUND1. Field of the Invention[0002]The invention generally concerns a three-dimensional nitrogen rich mesoporous material having a general formula of C3N6. In particular, the nitrogen rich mesoporous material includes a three dimensional (3D) C3N6 3-amino-1,2,4-triazole based mesoporous carbon nitride matrix having an atomic nitrogen to carbon ratio of 1.4 to 1.7, and a band gap of 1.8 to 3 eV.2. Description of Related Art[0003]Scientific interest in carbon nitride (CN) materials has increased this last decade because of their unique semi-conductor behavior, basic sites, electronic properties, and other unique characteristics.[0004]Mesoporous materials with three-dimensional (3D) porous structure have textural characteristics, such as specific surface are...

Claims

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Application Information

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IPC IPC(8): B01J27/24B01J23/42B01J35/00B01J35/10B01J37/00B01J37/08C01B3/04B01J19/12G01N33/50G01N21/64
CPCB01J27/24G01N2201/06113B01J35/004B01J35/1019B01J35/1038B01J35/1042B01J35/1061B01J37/0018B01J37/084C01B3/042B01J19/12G01N33/5005G01N21/6428G01N21/6402B01J2219/0892B01J2219/12G01N2021/6439B01J23/42C01B21/0605C01P2002/72C01P2002/82C01P2002/84C01P2002/85C01P2004/03C01P2004/04C01P2006/12C01P2006/14C01P2006/16Y02E60/36B01J35/39B01J35/615B01J35/633B01J35/635B01J35/647
Inventor MANE, GURUDAS P.VINU, AJAYANRAVON, UGOAL-BAHILY, KHALID
Owner SABIC GLOBAL TECH BV
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