Preparation method of high silicon orientation silicon steel thin plate

Abstract

The preparation process of high silicon orientation low carbon silicon steel sheet includes the technological steps of: sputtering target material onto two sides of low carbon silicon steel base material with silicon content lower than 3.0 wt % to form deposited layers of ferrosilicon film or multilayer Fe-Si film under vacuum or protecting atmosphere in a sputtering room; introducing N2 and / or O2 to the sputtering room to deposit Ti, Cr, Al or MgO target on the outer surface to form AlN, TiN, MgO or Cr-containing spinel type oxide coating; high energy particle implantation or diffusing annealing, rolling and final re-crystallization annealing treatment. The present invention has short preparation period, and the prepared high silicon orientation low carbon silicon steel sheet has very low surface C, P and O contents and deposited layer with crystal grains in regular size and orientation.

Description

Technical field: [0001] The invention belongs to a method for preparing a low-carbon high-silicon silicon steel sheet. In particular, it relates to a method for preparing a high-silicon orientation low-carbon high-silicon silicon steel sheet. Background technique [0002] High-silicon silicon steel has good electromagnetic properties, the silicon content increases, the iron loss decreases, the resistivity of the silicon steel sheet increases, and the eddy current loss decreases. When the silicon content in the silicon steel sheet reaches 6.5%, the magnetostriction coefficient tends to zero, so 6.5 %Si high silicon steel sheet is a kind of soft magnetic material with excellent performance. [0003] At present, the production of high-silicon silicon steel generally adopts traditional metallurgical smelting, and is produced by rolling (hot rolling, cold rolling) and annealing processes. Due to the increase of silicon content, the brittleness of silicon steel sheet increases. ...

AI Technical Summary

Problems solved by technology

[0005] The above documents and patents indicate that DC magnetron sputtering deposition method, radio frequency magnetron sputtering deposition method, ion beam sputtering deposition method, and multi-arc ion sputtering deposition method are only used for the preparation of ceramic coatings on the surface of silicon steel materials, and do not involve The specific preparation of high-silicon silicon steel, especially the problems existing in the preparation, rolling and heat treatment of silicon steel with high silicon content, such as the brittleness of silicon steel sheet increases due to the increase of silicon content, when the silicon content reaches 3.2% or more A sharp drop, various rolling defects are prone to occur during the rolling process, and problems such as deterioration of processing performance have not been resolved

The preparation method described in the Chinese patent "Ultra-thin, large-size, high-silicon silicon steel sheet electron beam physical vapor deposition preparation method" (CN1804109A) is an electron beam deposition method, and the deposited silicon steel film is deposited on CaF 2 On the powder, it can be used after peeling off at last, and for large-scale industrial production, there are still problems in the peeling off of the deposited silicon steel film; and because it has not been annealed, there are also problems in the uniformity of its composition, the compactness and strength of the film