Production method for nickel oxide anode thin film used for full solid-state thin-film lithium ion battery

A lithium-ion battery and anode thin-film technology, applied in the field of electrochemistry, can solve the problems of difficult large-area deposition of thin films, unrealized industrialization, and low deposition rate, and achieve the effects of low oxidation temperature, simple equipment, and uniform grain size distribution

Inactive Publication Date: 2008-05-07
HENAN UNIV OF SCI & TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, these preparation methods have shortcomings such as low deposition rate, high cost, or difficulty in large-area deposition of thin films, and have not been industrialized.
Before the present invention, there was no report on the preparation of nanocrystalline NiO anode films for all-solid-state thin-film lithium-ion batteries using vacuum evaporation combined with oxygen ion generator-assisted thermal oxidation methods

Method used

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Effect test

Embodiment 1

[0014] In the present invention, a vacuum evaporation technique combined with a thermal oxidation method assisted by an oxygen ion generator is adopted. First, the cleaned stainless steel substrate was fixed on a rotating disk and placed in a vacuum coating machine (DM-450A, Beijing Instrument Factory). Evaporation source material is high-purity nickel wire, heated by molybdenum boat. The working vacuum of the stainless steel bell jar (vacuum coating chamber) is 5.2×10 -4 pa, deposition rate and film thickness were controlled using a film thickness monitor (LHC-2). The deposition rate and film thickness were 50 nm / min and ~150 nm, respectively. After the deposition of the metal Ni film is completed, the filling of pure argon gas is stopped, and the electron cyclotron resonance (ECR) oxygen ion generator is turned on. The gas charged into the ECR oxygen ion generator is Ar+O 2 Mixed gas (Ar and O 2 The volume ratio is 80:20), the power is 298W, and the working vacuum is kep...

Embodiment 2

[0019]In the present invention, a vacuum evaporation technique and a thermal oxidation method assisted by an oxygen ion generator are used. Firstly, the cleaned gold-plated single-crystal silicon substrate was fixed on a rotating disc and placed in a vacuum coating machine (DM-450A, Beijing Instrument Factory). The evaporation source material is high-purity nickel wire, which is heated by resistance wire. The working vacuum of the stainless steel bell jar (vacuum coating chamber) is 9.7×10 -4 Pa, deposition rate and film thickness were controlled using a film thickness monitor (LHC-2). The deposition rate and film thickness were 50 nm / min and ~150 nm, respectively. After the deposition of the metal Ni film is completed, the filling of pure argon gas is stopped, and the electron cyclotron resonance (ECR) oxygen ion generator is turned on. The gas charged into the ECR oxygen ion generator is Ar+O 2 Mixed gas (Ar and O 2 The volume ratio is 80:20), the power is 280W, and the ...

Embodiment 3

[0024] In the present invention, a vacuum evaporation technique and a thermal oxidation method assisted by an oxygen ion generator are used. First, the cleaned gold-plated alumina ceramic substrate was fixed on a rotating disc and placed in a vacuum coating machine (DM-450A, Beijing Instrument Factory). Evaporation source material is high-purity nickel block (particle size less than 0.5mm), heated by molybdenum boat. The working vacuum of the stainless steel bell jar (vacuum coating chamber) is 4.3×10 -3 Pa, deposition rate and film thickness were controlled using a film thickness monitor (LHC-2). The deposition rate and film thickness were 50 nm / min and ~150 nm, respectively. After the deposition of the metal Ni film is completed, the filling of pure argon gas is stopped, and the electron cyclotron resonance (ECR) oxygen ion generator is turned on. The gas charged into the ECR oxygen ion generator is Ar+O 2 Mixed gas (Ar and O 2 The volume ratio is 80:20), the power is 27...

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Abstract

The present invention provides a preparation method of a nickel oxide anode film used for the solid film lithium-ion battery, which adopts the vacuum vapor deposition method to deposit a Ni film on a substrate, and then adopts the heat oxidation method combining with the oxygen generator to prepare a NiO film material. The oxidation temperature for the preparation method of the nickel oxide anode film of the solid film lithium-ion battery provided by the present invention is low, the cost is low, the process and the equipments are simple, the deposition speed is higher than that of the traditional method, and a nano nickel oxide film with uniform granular size and complete structure is easy to obtain, which has good chemical performance, and can be used as the anode material of the solid film lithium-ion battery.

Description

technical field [0001] The invention belongs to the technical field of electrochemistry, and in particular relates to a method for preparing a nickel oxide thin film. The prepared thin film can be used as an anode material in an all-solid-state thin-film lithium ion battery. Background technique [0002] All-solid-state thin-film lithium batteries have the advantages of small size, easy integration, high energy density, and good cycle performance, which has become a hot research topic in the field of micro-batteries. However, most of the current integrated circuit processes use reflow soldering technology, in which the device is instantaneously heated to above 250°C. Thin-film batteries with metal lithium as the anode will be severely damaged due to the low melting point of lithium (about 180°C), which will affect its electrochemical charge and discharge performance. In addition, metal Li is very active and easily reacts with oxygen and water vapor in the air. In the proces...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01M4/04C23C14/24C23C14/58H01M4/1391
CPCY02E60/12Y02E60/10
Inventor 赵胜利文九巴蔡羽陈海云李董轩祝要民李洛利
Owner HENAN UNIV OF SCI & TECH
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