Non-vacuum solar spectrum selective absorption film and preparation method thereof

A technology of absorbing film and solar spectrum, which is applied in the field of solar thermal utilization materials, can solve the problems of low radiation performance and low resistivity, and achieve good spectral selective absorption, low cost and light weight

Active Publication Date: 2010-03-10
GRIMAT ENG INST CO LTD
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

(2) TiAlN thin film has low resistivity, and should have low radiation performance in the mid-to-far infrared; (3) Recently, Harish C et al. have obtained TiAl with an oxidation resistance of 600 degrees Celsius, an absorption rate of 0.95, and an emissivity of 0.07. Nitrogen/titanium aluminum oxynitride/silicon nitride film layer; (4) no one at home an

Method used

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  • Non-vacuum solar spectrum selective absorption film and preparation method thereof
  • Non-vacuum solar spectrum selective absorption film and preparation method thereof
  • Non-vacuum solar spectrum selective absorption film and preparation method thereof

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Embodiment 1

[0042] (1) The TX-1000 multi-target composite coating machine produced by Beijing Tianruixing Co., Ltd. was used for coating; in order to improve the bonding force between the titanium nitrogen oxide film and the substrate, the substrate material was respectively soaked in sulfuric acid, detergent, and detoxification before being placed in the vacuum chamber. Sonicate in ionized water, gasoline, and ethanol for 5 to 20 minutes, then dry; place in a vacuum chamber, bake at 100 degrees Celsius for 10 minutes, and the experimental background vacuum is 3×10 -3 Pa, before the sample is deposited, argon is introduced to a pressure of 8×10 -2 Pa, the cathode current is 75 amps, and the negative bias voltage of 800 volts bombards the surface of the sample with argon ions to remove the gas and impurities adsorbed on the surface and expose a clean surface. When the background vacuum in the vacuum sputtering chamber is better than 3×10 -3 Introduce appropriate amount of reaction gases n...

Embodiment 2

[0049] (1) The TX-1000 multi-target composite coating machine produced by Beijing Tianruixing Co., Ltd. was used for coating; in order to improve the bonding force between the titanium nitrogen oxide film and the substrate, the substrate material was respectively soaked in sulfuric acid, detergent, and detoxification before being placed in the vacuum chamber. Sonicate in ionized water, gasoline, and ethanol for 5 to 20 minutes, then dry; place in a vacuum chamber, bake at 100 degrees Celsius for 10 minutes, and the experimental background vacuum is 3×10 -3 Pa, before the sample is deposited, argon is introduced to a pressure of 8×10 -2 Pa, the cathode current is 75 amps, and the negative bias voltage of 800 volts bombards the surface of the sample with argon ions to remove the gas and impurities adsorbed on the surface and expose a clean surface. When the background vacuum in the vacuum sputtering chamber is better than 3×10 -3 Introduce an appropriate amount of reaction gas ...

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Abstract

The invention provides a non-vacuum solar spectrum selective absorption film and a preparation method thereof. The absorption film comprises a stainless steel or copper substrate which is successivelyprovided with a titanium-aluminum film, a titanium-aluminum-nitrogen film, a titanium-aluminum-oxygen-nitrogen film and a titanium-aluminum-oxygen film from inside to outside, wherein the films are prepared by adopting multi-arc ion plating; a target material adopts titanium-aluminum alloy target of which the atomic ratio of titanium to aluminum is 50:50; and the content of nitrogen and/or oxygenin the films is controlled by controlling the flow of argon, nitrogen and oxygen in the atmosphere of multi-arc ion plating. The method comprises: (1) selecting and cleaning a substrate material; (2)baking the substrate material in a vacuum sputtering chamber of a multi-target compound coating machine; (3) performing argon-ion bombardment on the surface of the substrate material; (4) coating thesubstrate material; and (5) performing annealing treatment. The absorption film has the advantages of high absorptivity alpha in a solar spectral range (0.3 to 2.5 microns), low emissivity epsilon inan infrared region (2 to 50 microns) and the characteristic of resisting high-temperature oxidation, thereby meeting the requirements of solar high-temperature utilization.

Description

technical field [0001] The invention relates to a non-vacuum solar spectrum selective absorption film layer and a preparation method thereof, belonging to the technical field of solar heat utilization materials. Background technique [0002] The solar selective absorption film is characterized by a high absorption rate α in the solar spectral range (0.3-2.5 microns), and a very low emissivity ε in the infrared region (2-50 microns); it can convert low energy density The conversion of solar energy into heat energy with high energy density, enriching solar energy and improving the efficiency of solar thermal conversion is an important content in the research work of solar thermal utilization. In the past 20 to 30 years of research in our country, the main achievements are limited to low-temperature utilization, and the fields include daily bathing, swimming pool heating, seawater desalination, heating, drying, and breeding. But from a long-term point of view, medium and high ...

Claims

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Application Information

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IPC IPC(8): F24J2/48B32B15/04B32B33/00C23C14/34C23C14/14C23C14/54
CPCY02E10/40
Inventor 郝雷王树茂蒋利军刘晓鹏李华玲李志念李国斌
Owner GRIMAT ENG INST CO LTD
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