Method for preparing composite Ag-Ti oxide antibacterial film by magnetron sputtering
A magnetron sputtering and oxide technology, which is applied in sputtering coating, metal material coating process, vacuum evaporation coating, etc., can solve the problem of poor antibacterial spectrum and durability, difficulty in large-scale industrial production, and variable production High cost and other issues, to achieve the effect of reducing bacterial infection, durable antibacterial properties, and high uniformity
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Embodiment 1
[0058] Take a glass piece with a flat surface of 2cm×2cm, soak it in hydrochloric acid, wash it in acetone solvent for 10 minutes under ultrasonic conditions, then clean it in absolute ethanol for 5 minutes under ultrasonic conditions, take it out and wash it with deionized water Rinse for 15 minutes and dry at 15°C for 3 hours. The magnetron sputtering equipment with three targets is adopted, among which two targets (titanium targets) adopt intermediate frequency magnetron power supply, and the silver target adopts general magnetron power supply. When coating, first evacuate the system until the absolute pressure is below 0.001Pa, then pass in argon gas and pure oxygen as a reaction gas, control the flow rate of argon gas to 35 sccm, the flow rate of reaction gas to 20 sccm, and maintain the system pressure at 2Pa. Under the temperature condition of 250°C, first turn on the intermediate frequency magnetron sputtering power supply and sputter metal titanium first, and sputter ...
Embodiment 2
[0060] Take a 2cm x 2cm glass slide with a flat surface, and stick a piece of 1.5cm x 1.5cm non-woven fabric on it, clean it in 75% ethanol for 15 minutes under ultrasonic conditions, and then clean it in acetone solvent for 10 minutes. After taking it out, rinse it with deionized water for 5 minutes, and dry it at 85°C for 0.5 hours. The magnetron sputtering equipment with three targets is adopted, among which two targets (titanium targets) adopt intermediate frequency magnetron power supply, and the silver target adopts general magnetron power supply. When coating, first evacuate the system until the absolute pressure is below 0.001Pa, then pass in argon and reaction gas air, control the flow rate of argon gas to 35 sccm, the flow rate of reaction gas to 20 sccm, and maintain the system pressure at 0.5 Pa. At a temperature of 20°C, turn on the intermediate frequency magnetron sputtering power supply to sputter metal titanium and the magnetron sputtering power supply to sputt...
Embodiment 3
[0062]Take a glass piece with a flat surface of 1cm×1cm, soak it in hydrochloric acid, clean it in acetone solvent under ultrasonic conditions for 10 minutes, then clean it in absolute ethanol for 10 minutes under ultrasonic conditions, and wash it in toluene under ultrasonic conditions. Rinse for 10 minutes, take it out, rinse with deionized water for 5 minutes, and dry at 30°C for 2 hours. The magnetron sputtering equipment with three targets is adopted, among which two targets (titanium targets) adopt intermediate frequency magnetron power supply, and the silver target adopts general magnetron power supply. When coating, first evacuate the system until the absolute pressure is below 0.001Pa, then pass in argon gas and pure oxygen as a reaction gas, control the flow rate of argon gas to 35 sccm, the flow rate of reaction gas to 20 sccm, and maintain the system pressure at 1.2Pa. Under the temperature condition of 80°C, first turn on the intermediate frequency magnetron sputt...
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