Organic photoelectric device and preparation method thereof
An optoelectronic device and organic technology, applied in the field of organic optoelectronic devices and their preparation, can solve problems such as low conductivity, lower device energy conversion efficiency, and difficulty in effective charge transmission, so as to increase light absorption, increase visible light transmittance, The effect of increasing the external quantum efficiency
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Embodiment 1
[0077] Such as image 3 As shown, the substrate 1 of the device is transparent glass, the anode layer 2 is ITO, and the material of the hole transport layer 31 is Fe doped with a uniform surface distribution diameter of 10 nm. 3 o 4 The NPB of multi-walled carbon nanotubes of particles, the material of light-emitting layer 32 is Alq 3 , The electron transport layer 33 is made of BCP, and the cathode layer 4 is made of Mg:Ag alloy. The entire device structure is described as:
[0078] Glass substrate / ITO / NPB: magnetic multi-walled carbon nanotubes (15%, 50nm) / Alq 3 (20nm) / BCP(40nm) / Mg:Ag(100nm)
[0079] The preparation method is as follows:
[0080] ①Use acetone, ethanol solution and deionized water to ultrasonically clean the transparent conductive substrate ITO glass, and dry it with dry nitrogen after cleaning. The ITO film on the glass substrate is used as the anode layer of the device, the square resistance of the ITO film is 15Ω / □, and the film thickness is 180nm; ...
Embodiment 2
[0089] Such as image 3 As shown, the substrate 1 of the device is transparent glass, the anode layer 2 is ITO, the material of the hole transport layer 31 is NPB, and the material of the light emitting layer 32 is Alq 3 , the material of the electron transport layer 33 is γ-Fe doped with a uniform surface distribution diameter of 15nm 2 o 3 Particles of single-walled carbon nanotubes of BPhen, cathode layer 4 made of Mg:Ag alloy. The entire device structure is described as:
[0090] Glass substrate / ITO / NPB(50nm) / Alq 3 (20nm) / BPhen: magnetic single-walled carbon nanotubes (10%, 50nm) / Mg:Ag(100nm)
[0091] The preparation method is as follows:
[0092] ①Use acetone, ethanol solution and deionized water to ultrasonically clean the transparent conductive substrate ITO glass, and dry it with dry nitrogen after cleaning. The ITO film on the glass substrate is used as the anode layer of the device, the square resistance of the ITO film is 15Ω / □, and the film thickness is 180nm...
Embodiment 3
[0098] Such as image 3 As shown, the substrate 1 of the device is polyethylene terephthalate (PET), the anode layer 2 is ITO, the material of the hole transport layer 31 is PVK, the material of the light emitting layer 32 is PPV, and the material of the electron transport layer 33 is For BPhen doped with single-walled carbon nanotubes with cobalt particles uniformly distributed on the surface and with a diameter of 15 nm, the cathode layer 4 is made of Mg:Ag alloy. The entire device structure is described as:
[0099] PET / ITO / PVK(50nm) / PPV(20nm) / BPhen: magnetic single-walled carbon nanotubes (15%, 50nm) / Mg:Ag(100nm)
[0100] The preparation method is as follows:
[0101] ①Use acetone, ethanol solution and deionized water to ultrasonically clean the ITO-coated PET substrate, and dry it with dry nitrogen after cleaning. Among them, the ITO film on the PET substrate is used as the anode layer of the device, the square resistance of the ITO film is 15Ω / □, and the film thicknes...
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