Monocrystalline silicon piece texturizing liquid and texturizing method thereof
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A single crystal silicon wafer and texturing liquid technology, which is applied in the direction of single crystal growth, single crystal growth, chemical instruments and methods, etc., can solve problems that are not conducive to the deep and uniform contact of the diffusion junction in the rear channel, high fragmentation rate of the cell, and manufacturing problems. Instable fleece effect and other problems, to achieve the effect of small thinning, clear spire and good uniformity
Active Publication Date: 2011-02-02
ZHEJIANG JINKO SOLAR CO LTD
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Problems solved by technology
The existing texturing liquid and its texturing process have the following problems: (1) The amount of silicon wafer texturing thinning is large, the cell fragmentation rate is high, and the warpage is large
(2) The texturing effect is unstable and the yield is difficul
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Embodiment 1
[0023] Embodiment 1: A kind of monocrystalline silicon wafer texturing liquid
[0024] In parts by mass, sodium hydroxide is 0.6%, isopropanol is 4.5%, additives are 0.4%, and water is 94.5%. The proportion of additives is in parts by mass, glucose 0.5%, nonylphenol polyoxyethylene ether 1500ppb, sodium lactate 0.5%, propylene glycol 0.1%, sodium silicate 0.2%, sodium carbonate 0.2%, and the rest is water.
Embodiment 2
[0025] Embodiment 2: another monocrystalline silicon wafer texturing liquid
[0026] In parts by mass, sodium hydroxide is 0.5%, isopropanol is 8%, additives are 0.1%, and water is 94.5%. The proportion of additives is in parts by mass, glucose 2%, decylphenol polyoxyethylene ether 6000ppb, sodium citrate 0.1%, propylene glycol 0.05%, sodium silicate 0.1%, sodium carbonate 0.05%, and the rest is water.
Embodiment 3
[0027] Example 3: Yet another texturing solution for monocrystalline silicon wafers
[0028] In parts by mass, sodium hydroxide is 1.5%, isopropanol is 4%, additives are 1.2%, and water is 94.5%. The proportion of additives is in parts by mass, potassium gluconate 0.1%, nonylphenol polyoxyethylene ether 800ppb, sodium lactate 1.5%, propylene glycol 1.2%, sodium silicate 4%, sodium bicarbonate 1%, and the rest is water.
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Abstract
The invention relates to monocrystalline silicon piece texturizing liquid and a texturizing method thereof. The formula of the texturizing liquid comprises the following components in percentage by mass: 0.1 to 3 percent of sodium hydroxide, 2 to 10 percent of isopropanol, 0.01 to 2 percent of additive and the balance of water, wherein the formula of the additive comprises the following components in percentage by mass: 0.001 to 3 percent of glucose, sodium gluconate or potassium gluconate, 100 to 8,000ppb of polyoxyethylene ether, 0.001 to 2 percent of sodium lactate or sodium citrate, 0.01 to 2 percent of propylene glycol, 0.01 to 6 percent of sodium silicate, 0.001 to 2 percent of sodium carbonate or sodium bicarbonate and the balance of water. The method for texturization comprises the steps of placing a monocrystalline silicon solar battery plate into the texturizing liquid for reaction for 10 to 30 min at the temperature of 70 to 90 DEG C. A pyramid on the monocrystalline silicon piece has a high nucleation density and is thin, small and uniform, the reduction thickness is small, texturization reflectivity is low and the rate of texturizing finished products is high.
Description
technical field [0001] The invention belongs to the technical field of monocrystalline silicon solar cells, and in particular relates to a texturing liquid for monocrystalline silicon wafers and a method for making texturing thereof. Background technique [0002] Using the principle of anisotropic etching of single crystal silicon by low-concentration alkaline etching solution, a pyramid structure is formed on the surface of silicon, which increases the optical path of incident light, increases light absorption, reduces reflectivity, and improves the conversion efficiency of solar cells. At present, in the texturing liquid of monocrystalline silicon wafers, the currently used texturing liquid mainly includes: caustic alkali sodium hydroxide or potassium hydroxide, buffer additives such as isopropanol, alcohol, sodium silicate and the like. The existing texturing liquid and its texturing process have the following problems: (1) The amount of silicon wafer texturing thinning i...
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