Method for preparing colorful TiN film by utilizing direct current magnetron sputtering

A technology of DC magnetron sputtering and thin film, which is applied in the direction of sputtering plating, ion implantation plating, metal material coating process, etc., can solve the problems that have not been reported, and achieve the effect of low deposition temperature and high surface finish

Inactive Publication Date: 2011-08-10
TIANJIN NORMAL UNIVERSITY
View PDF3 Cites 5 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, there are few reports on the application of TiN film to the decoration industry by magnetron sputtering.
On the other hand, most of the current decorative TiN is onl...

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Method for preparing colorful TiN film by utilizing direct current magnetron sputtering
  • Method for preparing colorful TiN film by utilizing direct current magnetron sputtering
  • Method for preparing colorful TiN film by utilizing direct current magnetron sputtering

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0033] Equipment used: SA-6T vacuum ion coating machine

[0034] Preparations before the experiment: immerse the smooth-surfaced high-speed steel or stainless steel substrate in 95% ethanol solution for ultrasonic excitation for 10 minutes, then soak it in acetone solution, dry it with a hair dryer, and then fix it in the sample of the vacuum deposition chamber on the shelf.

[0035] Coating process parameters:

[0036] Background vacuum degree: 3×10 -3 Pa, sputtering ion source process parameters: sputtering voltage 200 V, sputtering beam 2 A, sputtering energy 400 W.

[0037] Other process parameters: Acceleration voltage is 0, auxiliary energy is 0, auxiliary beam current is 0; the temperature of the substrate is not heated.

[0038] Nitrogen is used as the sputtering gas during the deposition process, and the flow rates are maintained at 0.59, 0.84, 1.99, 2.21, 2.37 sccm (standard cubic centimeters per minute) through the flow controller, and the corresponding working ...

Embodiment 2

[0040] Equipment used: SA-6T vacuum ion coating machine

[0041] Preparations before the experiment: immerse the smooth-surfaced high-speed steel or stainless steel substrate in 95% ethanol solution for ultrasonic excitation for 20 minutes, then soak it in acetone solution, dry it with a hair dryer, and then fix it in the vacuum deposition chamber. on the shelf.

[0042] Coating process parameters:

[0043] Background vacuum degree: 3×10 -3 Pa, sputtering ion source process parameters: sputtering voltage 200 V, sputtering beam 2 A, sputtering energy 400 W.

[0044] Other process parameters: Acceleration voltage is 0, auxiliary energy is 0, auxiliary beam current is 0; the temperature of the substrate is not heated.

[0045]Nitrogen was used as the sputtering gas during the deposition process, and the flow rates were maintained at 0.59, 0.84, 1.99, 2.21, and 2.37 sccm (standard cubic centimeters per minute) through the flow controller; the working pressure was 0.42 Pa. The...

Embodiment 3

[0047] (1) Use polished, smooth surface high-speed steel or stainless steel as the substrate coating;

[0048] (2) Immerse the substrate to be coated in 95% ethanol solution for ultrasonic excitation for 15 minutes, then soak in acetone solution and dry with a hair dryer;

[0049] (3) Then fix the substrate to be coated on the sample rack in the vacuum deposition chamber for coating, and vacuum the back and bottom before coating to 3×10 -3 Pa, and clean the surface by ion bombardment for 3 minutes; the distance between the substrate and the sputtering target is 150 mm, and no bias is applied;

[0050] (4) Keep the sputtering power at 200 W when coating the substrate, and plate TiN film samples of different colors under different nitrogen flow rates and different deposition pressures; the nitrogen flow rates used are controlled by flow meters, which are 0.59, 0.84, 1.99, 2.21, 2.37 sccm, the corresponding deposition pressures are 0.11, 0.16, 0.36, 0.39, 0.42 Pa; the deposition...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention provides a method for preparing a colorful TiN film by utilizing direct current magnetron sputtering. The method comprises the following steps: (1) based on high-peed steel as a substrate material, grinding the substrate material by respectively using a flint glass paper and then a crocus paper, and then polishing until the surface of the substrate material is of a mirror plane; (2) immersing the processed substrate material into an ethanol solution to carry out ultrasonic excitation for 10-20 minutes, carrying out dipping bath with acetone, and drying with a blower; (3) then fixing the substrate material on a specimen holder of a vacuum precipitation chamber for film coating, pumping the vacuum at the back bottom before film coating to 3*10<-3>Pa, and carrying out ion bombarding on the surface to clean for 3-5 minutes; and (4) plating different TiN film specimens under the different nitrogen flows (precipitation pressures). The result shows that the nitrogen flow (precipitation pressure) has an important influence on the color of a decoration coating film, and the color of the TiN film layer can be effectively changed through regulating the nitrogen flow. In the method, the film layer color required in practicable production through changing the nitrogen flow.

Description

[0001] Statement on funding research or development: This invention is funded by the Tianjin Normal University Academic Advancement Program (52X09038) and the Ministry of Education's research start-up fund for returning overseas students. technical field [0002] The invention belongs to the technical field of physical vapor deposition surface decoration coating treatment. It relates to a colored TiN thin film and a preparation method thereof. More specifically, it is a method for preparing colored TiN thin films by using DC magnetron sputtering technology. Background technique [0003] The emergence of TiN hard film doubles the cutting life of the tool, obtains good machining accuracy and efficiency, and has been widely used in the machining industry [1-5] . In fact, TiN coating also has broad application prospects in the decorative plating industry and occupies an important position. This is because TiN not only has good wear resistance and corrosion resistance, but is...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
IPC IPC(8): C23C14/35C23C14/06
Inventor 黄美东侯兴刚李德军
Owner TIANJIN NORMAL UNIVERSITY
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap