Method for manufacturing gallium nitride-based LED (Light Emitting Diode) with vertical structure
A gallium nitride-based, vertical structure technology, applied in electrical components, circuits, semiconductor devices, etc., can solve the problems of reduced chip yield, easy generation of bubbles in wafers, and reduced reliability, achieving a small difference in thermal expansion coefficients and improving thermal conductivity. performance, the effect of improving yield
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[0029] ① Preparation of LED chips
[0030] On the sapphire substrate 1, the n-type GaN layer 3 and the p-type GaN layer 4 are epitaxially sequentially, and the mutually independent LED chips 2 are formed on the sapphire substrate 1 through a photolithography process, see figure 1 ; Evaporate metal ITO, NiAg or NiAu on the surface of the LED chip 2, and treat it in a nitrogen atmosphere at 200-400°C for 1-10min to form a p-electrode 5; then thin the sapphire substrate 1: use diamond-containing Grinding with a grinding wheel, then polishing with a polishing solution containing diamond sand, and thinning the sapphire substrate 1 to 70-120 μm; finally, cutting the sapphire substrate according to the LED chip 2 into individual pieces independently by cutting with a laser, a diamond knife or a grinding wheel saw The LED chip, the cross-sectional schematic diagram of a single LED chip see figure 2 .
[0031] ② Treatment of composite metal substrates
[0032] A gold layer 7 is eva...
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