Preparation method for Ga-doped ZnO nanometer material

A nano-material and preparation technology, applied in the field of preparation of Ga-doped nano-ZnO, can solve the problems of irreparable glass substrate, long reaction time, high temperature, etc., and achieve controllable surface morphology, less impurities in the product, and low reaction temperature Effect

Inactive Publication Date: 2012-06-20
UNIV OF SCI & TECH BEIJING
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Problems solved by technology

Although the above method is simple to operate, environmentally friendly and low in cost, the temperature required for the reaction is high, the pressure is high and the reaction time is long
For solar cell photoanodes that require glass as a carrier, temperatures above 600°C will cause irreparable damage to the glass substrate

Method used

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  • Preparation method for Ga-doped ZnO nanometer material
  • Preparation method for Ga-doped ZnO nanometer material
  • Preparation method for Ga-doped ZnO nanometer material

Examples

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Embodiment Construction

[0022] Below in conjunction with example technical scheme of the present invention is further described:

[0023] 1. Dissolve zinc nitrate hexahydrate and gallium nitrate with a molar ratio of 1:0.05 in deionized water to prepare a mixed solution of 75ml 0.2mol / L zinc nitrate and 0.01mol / L gallium nitrate, and perform ultrasonic treatment for 1 hour A clear and transparent solution was obtained.

[0024] 2. Measure 2.5ml of ethylenediamine with a graduated cylinder and add it to the solution described above, and then ultrasonicate for half an hour to obtain a milky white reaction precursor.

[0025] 3. Measure the pH value of the reaction precursor solution with a pH meter or pH test paper, and gradually add sodium hydroxide in small amounts to adjust the pH value of the precursor solution to control it within the range of 9~11, and then ultrasonically for half an hour for later use.

[0026] 4. Wash 4 pieces of FTO conductive glass successively through acetone, absolute...

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Abstract

The invention discloses a preparation method for a Ga-doped ZnO nanometer material, and belongs to the technical field of preparation of nanometer materials. The preparation method is characterized by comprising the following steps of: dissolving zinc nitrate and gallium nitrate into de-ionized water, wherein the molar ratio of the zinc nitrate to the gallium nitrate is 1:0.01 to 1:0.1, and a PH value is controlled within the range of 9 to 11; performing ultrasonic treatment on the mixed solution for 30 minutes to obtain a reaction precursor solution; ultrasonically washing a fluorine-doped tin oxide (FTO) conductive glass substrate by using acetone, absolute ethanol, isopropyl alcohol and the de-ionized water, and drying the washed FTO conductive glass substrate; placing the treated glass substrate in the prepared reaction precursor solution, and sealing the reaction precursor solution and preserving the heat; and taking the glass substrate out, flushing the glass substrate by using the de-ionized water, and drying the glass substrate to obtain the glass substrate to which the Ga-doped ZnO nanometer material is attached. The preparation method is low in reaction temperature and low in cost, and simple equipment is used; and in addition, the prepared product has a fluffy and porous surface, high porosity and high electric conductivity, and is applicable to devices such as dye sensitized solar cells and the like.

Description

technical field [0001] The invention belongs to the technical field of nanometer material preparation, and in particular provides a method for preparing Ga-doped nanometer ZnO. Ga-doped ZnO nanomaterials with nanoflower-like structure were synthesized by hydrothermal method. Background technique [0002] ZnO is a semiconductor material with a forbidden band width of 3.37eV and an exciton binding energy of 60meV at room temperature, and has broad application prospects in optoelectronic and electronic devices. ([1] ZnO has a band gap of 3.37eV at room temperature and a semiconductor material with an exciton binding energy of 60meV, which has broad application prospects in optoelectronic and electronic devices. ([1] Pan, Z.W., Z.R. Dai and Z.L. Wang, Nanobelts of semiconductor oxides. Science, 2001. 291(5510): p. 1947. [2]. Lin, C.H., et al., Preparation and cathodoluminescence of ZnO phosphor. Materials chemistry and physics, 2003. 77(3) : p. 647-654.) However, compared wit...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01G9/20B82Y40/00
CPCY02E10/542Y02P70/50
Inventor 顾有松邱英秦子张跃
Owner UNIV OF SCI & TECH BEIJING
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