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Edge-emitting diode semiconductor laser with raster structure

A grating structure, edge-emitting technology, applied in the structure of optical waveguide semiconductors and other directions, can solve the problems of edge-emitting laser threshold characteristics, adverse effects of output mode output power, and uniformity of carrier distribution in the active region. The preparation process is fully compatible, the carrier leakage is reduced, and the preparation process is simple.

Active Publication Date: 2012-07-04
BEIJING UNIV OF TECH
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0006] Since the edge-emitting semiconductor laser applies the injection current to the strip-shaped electrode, the concentration gradient formed by the non-equilibrium minority carriers injected into the active layer from the center to both sides makes it inevitable that lateral diffusion will occur. This will affect the uniformity of carrier distribution in the active region, thus adversely affecting the threshold characteristics, output mode, and output power of the edge-emitting laser.

Method used

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  • Edge-emitting diode semiconductor laser with raster structure
  • Edge-emitting diode semiconductor laser with raster structure

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Embodiment 1

[0026] The method for manufacturing edge-emitting semiconductor lasers provided by the present invention is widely applicable to edge-emitting semiconductor lasers of various material systems. The following uses a 980nm InGaAs quantum well edge-emitting semiconductor laser as an example to illustrate its principle.

[0027] Such as figure 1 As shown, the structure of an edge-emitting semiconductor laser used to improve the uniformity of carrier distribution in the active region in this embodiment includes:

[0028] A, substrate 7, the substrate 7 is an N-type gallium arsenic material with a thickness of about 300-400um, and the substrate 10 is used for epitaxial growth of various layers of materials of the laser thereon;

[0029] B, N-type confinement layer 5, the N-type confinement layer 5 is made on the substrate 7, and the N-type confinement layer 5 is an N-type AlGaAs material, which can effectively confine the optical field;

[0030] C. The N-type waveguide layer 3 and t...

Embodiment 2

[0036] figure 2 A flow chart of a method for making an edge-emitting semiconductor laser provided by the present invention, the method may include the following steps:

[0037] Step 101: sequentially preparing an AlGaAs confinement layer, an AlGaAs optical waveguide layer, and an InGaAs quantum well active layer on an N-type GaAs substrate, and forming respective confinement heterostructures;

[0038] Step 102: Photocutting the ridge waveguide on the epitaxial wafer;

[0039] Step 103: depositing an electrical insulating layer on the epitaxial wafer;

[0040] Step 104: Photocutting lead holes on the electrical insulating layer;

[0041] Step 105: photoetching a grating structure at the lead hole on the ridge platform;

[0042] Step 106: preparing a P-face electrode on the epitaxial wafer;

[0043] Step 107: Thinning and polishing the N-type substrate and preparing an N-surface electrode;

[0044] For the flow chart of the method for making an edge-emitting semiconductor ...

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Abstract

The invention discloses an edge-emitting diode semiconductor laser with a raster structure and belongs to the optoelectronic technical field of semiconductors. The edge-emitting diode semiconductor laser comprises a semiconductor laser epitaxial structure, a silicon dioxide insulating layer, an upper layer of P type electrode and a lower layer of P type electrode, wherein the semiconductor laser epitaxial structure consists of a substrate, an N type limit layer, an N type waveguide layer, a multi-quantum well active region, a P type waveguide layer, a P type limit layer and a P type ohmic contact layer; and the raster structure is grown on a crestiform table. The photolithographic process is adopted in a manufacturing process; and after scraping, a chip is sintered on a copper heat sink and is packaged and fixedly arranged on a radiating base. According to the structure, due to the introduction of the raster structure on the crestiform table, the lateral diffusion of current carriers injected into an active layer is inhibited, the uniformity of the current carriers in the active area is improved, and the threshold current of a semiconductor laser is reduced. The edge-emitting diode semiconductor laser is simple in manufacturing process, low in cost and good in repeatability.

Description

technical field [0001] An edge-emitting semiconductor laser with a grating structure belongs to the technical field of semiconductor optoelectronics and relates to a semiconductor laser. Background technique [0002] Semiconductor lasers are widely used in important fields such as optical fiber communication, optical disk access, spectral analysis, and optical information processing due to their small size, light weight, and low price. And it is especially suitable for military fields such as laser night vision, laser fuze, and laser radar. Edge-emitting semiconductor lasers are an important part of the field of semiconductor lasers. They directly use the natural cleavage planes of semiconductor materials as resonator planes, with simple processes and perfect crystal planes. Edge-emitting semiconductor lasers have the following advantages: [0003] 1. Since the lateral dimension of the active layer is reduced, the symmetry of the light field is increased, so the coupling e...

Claims

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Application Information

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IPC IPC(8): H01S5/22
Inventor 崔碧峰计伟陈京湘郭伟玲张松王晓玲
Owner BEIJING UNIV OF TECH
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