Metal nanodot array surface enhancing Raman active base and preparation method thereof
A surface-enhanced Raman and active substrate technology, which is applied in the direction of Raman scattering, surface reaction electrolytic coating, metal material coating technology, etc., can solve the problem of affecting the spectral stability, uniformity and repeatability of adsorbed molecules, expensive equipment, The problem of high preparation cost can achieve significant surface Raman enhancement effect, uniform and stable enhanced signal, and easy industrial production.
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment 1
[0031] Example 1: In this example, using UTAM as a mask, a large-area ordered and uniform Au nanoparticle lattice was prepared on a Si substrate, and a 1×10 -6 M's Rhodamine (rhodamine 6G, R6G) and 3 x 10 -3 M's 4-mercaptopyridine (4-mercaptopyridine, 4-MPy) was used as a probe molecule, and the surface Raman spectrum was tested. The specific process is as follows:
[0032] 1) Preparation of large-area ordered UTAM:
[0033] a. Pretreatment of aluminum sheets: ultrasonic cleaning with acetone for 30 min, CVD high temperature annealing, nitrogen protection at 450-550 °C, and electroplating in a mixture of ethanol and perchloric acid at a temperature of 0 °C under constant current (750 mA) conditions. chemical polishing.
[0034] b. Anodization: UTAM was prepared by a two-step method at a constant voltage of 40 V using a self-made anodizing device with 0.3 M oxalic acid solution as the electrolyte. The aluminum sheet is first anodized, and then immersed in a mixture of 6% ...
PUM
Property | Measurement | Unit |
---|---|---|
particle diameter | aaaaa | aaaaa |
diameter | aaaaa | aaaaa |
diameter | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com