Nickel-chromium alloy target with high purity and high compositional uniformity and method for preparing same

A nickel-chromium alloy, high-purity technology, applied in metal material coating process, ion implantation plating, coating, etc., can solve the problem of uneven microscopic distribution of finished components, low product consistency and yield, and process parameter dependence. Experience and other issues to achieve the effect of easy control of superheat, fast heating speed, uniform distribution of alloy composition and temperature field

Inactive Publication Date: 2012-10-17
FUZHOU UNIV
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  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] However, most of the nickel-chromium series alloy targets on the market so far are prepared by the traditional process of "graphite crucible intermediate frequency induction melting-steel mold casting", which cannot meet the requirements of the times, because the tradit

Method used

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  • Nickel-chromium alloy target with high purity and high compositional uniformity and method for preparing same
  • Nickel-chromium alloy target with high purity and high compositional uniformity and method for preparing same
  • Nickel-chromium alloy target with high purity and high compositional uniformity and method for preparing same

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0040] Design and prepare a nickel-chromium atomic percentage of 50%:50% alloy target,

[0041] a) Composition design and batching, select 159.1g of Jinchuan nickel block with a purity of 99.96% and 140.9g of 1# chromium block with a purity of 99.99% that meet the national standard, so that the total weight of the alloy raw material is 300 g, and the atomic percentage of nickel and chromium is 50 %:50%;

[0042]b) For the production of alloy ingots, put the above ingredients into the crucible of the water-cooled copper crucible vacuum induction suspension melting furnace, and vacuumize the melting chamber to (1.0±0.2)×10 -3 After Pa, use the inert gas argon to wash the furnace, and then vacuumize it again, then backfill the inert gas with argon protection, the furnace pressure is 100±10Pa, and carry out melting and alloying under the protection of inert gas argon;

[0043] c) After turning off the induction melting power supply, the alloy liquid is directly cooled into the wa...

Embodiment 2

[0054] To design and prepare a nickel-chromium alloy target with an atomic percentage of 20%:80%, the specific steps are the same as in Example 1, the difference is that:

[0055] 1) Adjust the composition percentage of Ni atoms and Cr atoms in the nickel-chromium alloy described in step a) to 20%:80%, and the impurity content is ≤0.0005%;

[0056] 2) Set the annealing temperature of the final annealing (solution aging) homogenization treatment in step g) at 1200°C, and the annealing time is 3 hours; after mechanical finishing, a nickel with a diameter of 60mm and a thickness of 6mm is obtained Chromium sputtering target, in which the composition ratio of Ni atoms to Cr atoms is 20.0870%:79.9125%, and the impurity is ≤0.0005%.

Embodiment 3

[0058] Design and preparation of a nickel-chromium alloy target with an atomic percentage of 80%:20%

[0059] Concrete steps are identical with embodiment one, difference is:

[0060] 1) Adjust the composition percentage of Ni atoms and Cr atoms in the nickel-chromium alloy described in step a) to 80%:20%, and the impurity content is ≤0.0005%;

[0061] 2) Set the annealing temperature of the final annealing (solution aging) homogenization treatment in step g) at 1000°C, and the annealing time is 8 hours; after mechanical finishing, a nickel with a diameter of 60mm and a thickness of 6mm is obtained Chromium sputtering target, in which the ratio of Ni atoms to Cr atoms is 79.8870%:20.1125%, and the impurity is ≤0.0005%.

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Abstract

The invention relates to a nickel-chromium alloy target with high purity and high compositional uniformity and a method for preparing the same. According to the technical scheme of the invention, the parameter of processes including smelting, solidifying, thermal-mechanical processing and annealing heat treatment of the nickel-chromium series alloy target are controlled accurately according to the material science and the process calculation and simulation results. The nickel-chromium series alloy target prepared by adopting the method has a wide component range, comprises 5-95% of nickel, less than or equal to 0.0005% of impurities and the balance of chromium, and can be widely applied to the optoelectronic industry, the data storage industry, the integrated-circuit industry, the optical communication industry and other sophisticated industry.

Description

technical field [0001] The invention relates to a nickel-chromium alloy target material with high purity and high composition uniformity and a preparation method thereof. Background technique [0002] At present, nickel-chromium targets are widely used in anti-friction, anti-friction, heat-resistant, anti-corrosion and other surface strengthening films, as well as low-emissivity glass, microelectronics, magnetic recording, semiconductor, thin film resistance, flat panel display, data storage, optical communication industry and other industries. , is a special metal material with high added value. With the urgent need for technology upgrading and performance improvement in the optoelectronic information industry, microelectronics and new energy industries, there is an increasing demand for high-quality alloy targets with high purity and high composition uniformity at home and abroad. Therefore, the added value of high-quality targets will be higher and higher, and the market...

Claims

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Application Information

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IPC IPC(8): C23C14/34C23C14/14C22C19/05C22C27/06C22C1/02C22F1/10C22F1/11
Inventor 吴波黄超然刘海龙王敏李锋宝
Owner FUZHOU UNIV
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