Flexible film used for flexible organic solar battery
A flexible film and organic technology, applied in the field of solar cells, can solve the problems of poor weather resistance, low conversion efficiency, and short service life of flexible organic solar cells, and achieve the effect of high surface hardness and improved service life
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment 1
[0030] Preparation of transparent conductive film:
[0031] A PET substrate with a thickness of 125 μm was selected, and an indium tin oxide (ITO) transparent conductive film was fabricated on one side by magnetron sputtering method, with a sheet resistance of 31.8Ω / □.
[0032] Preparation of the barrier layer:
[0033] On the other side of the above-mentioned PET substrate, a 30nm-thick silicon oxide inorganic barrier layer was first prepared by plasma-enhanced chemical vapor deposition (PECVD), and then coated with a polyurethane resin binder on the surface, and dried to obtain a thickness of 5.1 μm organic barrier layer, and then alternately make two pairs of silicon oxide layers and polyurethane resin layers according to the above conditions to obtain a barrier layer.
[0034] Preparation of functional layer:
[0035] On the surface of the barrier layer prepared above, a layer of ethylene-tetrafluoroethylene copolymer (ETFE) was first coated with a thickness of 8.4 μm; t...
Embodiment 2
[0039] Preparation of transparent conductive film:
[0040] A PC substrate with a thickness of 75 μm was selected, and a silver metal grid transparent conductive film was fabricated on one side by inkjet printing method, and the sheet resistance was 2.1Ω / □.
[0041] Preparation of the barrier layer:
[0042] On the other side of the above-mentioned PC substrate, a 50nm-thick silicon oxynitride inorganic barrier layer was first prepared by electron beam physical vapor deposition (EBPVD), and then a polyester resin binder was coated on the surface, and after drying, a thickness of 3.5 μm organic barrier layer, and then alternately fabricate two pairs of silicon oxynitride layers and polyester resin layers according to the above conditions to obtain a barrier layer.
[0043] Preparation of functional layer:
[0044] On the surface of the barrier layer prepared above, a layer of perfluoroethylene propylene copolymer (FEP) is first coated with a thickness of 2.4 μm; then an organ...
Embodiment 3
[0048] Preparation of transparent conductive film:
[0049] A PEN substrate with a thickness of 175 μm was selected, and a polythiophene transparent conductive film was fabricated on one side by micro-gravure coating method, with a sheet resistance of 61.8Ω / □.
[0050] Preparation of the barrier layer:
[0051] On the other side of the above-mentioned PEN substrate, a 70nm-thick silicon carbide inorganic barrier layer was first produced by magnetron sputtering, and then an epoxy resin adhesive was coated on the surface, and an organic barrier layer with a thickness of 8.5 μm was obtained after drying. barrier layer, and then alternately fabricate two pairs of silicon oxycarbide layers and epoxy resin layers according to the above conditions to obtain a barrier layer.
[0052] Preparation of functional layer:
[0053] On the surface of the barrier layer prepared above, a layer of ethylene-tetrafluoroethylene copolymer (ETFE) is first coated with a thickness of 5.9 μm; then an...
PUM
| Property | Measurement | Unit |
|---|---|---|
| Thickness | aaaaa | aaaaa |
| Film thickness | aaaaa | aaaaa |
| Water vapor transmission rate | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
Login to View More 