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Slope-induced self-assembled colloidal crystals based on industrial applications and preparation methods thereof

A technology of colloidal crystals and self-assembly, applied in self-gel state, chemical instruments and methods, crystal growth, etc., can solve the problems of cumbersome process, long production cycle, complicated production process, etc., and achieve easy industrialization and not easy Volatile, low-cost effect

Inactive Publication Date: 2015-10-28
UNIV OF SCI & TECH OF CHINA
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

The process of scooping up the membrane method is cumbersome. Firstly, it is necessary to obtain a single-layer densely packed array of small balls in a certain liquid (such as water, oil, or mercury, etc.), then use the substrate to fish out the small balls from below the liquid surface, and finally transfer the small balls. onto the target base
Obviously, this method is not only a cumbersome process, but also requires relatively high craftsmanship, and it is difficult to transfer the single-layer close-knit balls on the liquid surface to the target substrate perfectly.
[0004] In short, the existing methods for preparing colloidal crystals can only prepare local single crystals in a small area, and it is difficult to obtain large-area colloidal crystals; Colloidal crystal production method for industrial application

Method used

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  • Slope-induced self-assembled colloidal crystals based on industrial applications and preparation methods thereof
  • Slope-induced self-assembled colloidal crystals based on industrial applications and preparation methods thereof
  • Slope-induced self-assembled colloidal crystals based on industrial applications and preparation methods thereof

Examples

Experimental program
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Effect test

Embodiment 1

[0044] Embodiment 1: Using the present invention to realize the assembly of polystyrene beads with a diameter of 370 nm into a single-layer colloidal crystal.

[0045] (1) Select a silicon wafer with a size of 20mm×20mm×400μm as the chip substrate, clean the substrate according to the standard RCA method, and then hydrophilize it. The hydrophilization treatment method is to soak the substrate in a mixture of hydrogen peroxide and concentrated sulfuric acid for at least 6 hours. The volume ratio of hydrogen peroxide and concentrated sulfuric acid is not strictly limited. This experiment uses a volume ratio of hydrogen peroxide and concentrated sulfuric acid of 1:3.

[0046] (2) Wash the self-made polystyrene beads with a diameter of 370nm twice, and then disperse them in the mixed solution of ethanol and ethylene glycol (8:1 volume ratio), where the volume fraction of the beads in the mixed solution is 3%.

[0047] (3) Fix the substrate obtained in step (1) on a slope with an...

Embodiment 2

[0052] Embodiment 2: Using the present invention to realize the assembly of polystyrene beads with a diameter of 460 nm into a single-layer colloidal crystal.

[0053] (1) Select a silicon wafer with a size of 40mm×40mm×400μm as the chip substrate, clean the substrate according to the standard RCA procedure, and then hydrophilize it. For the hydrophilization treatment method, refer to step (1) of Example 1.

[0054] (2) Wash the self-made polystyrene beads with a diameter of 460nm twice, and then disperse them in a mixture of ethanol and ethylene glycol (volume ratio 6:1), where the volume fraction of the beads in the mixture is 10%.

[0055] (3) Fix the substrate obtained in step (1) on a slope with an inclination angle of 30°.

[0056] (4) Put the inclined plane containing the substrate into an incubator, and set the temperature of the incubator to 75°C.

[0057] (5) Take 120 μL of the monodisperse polystyrene nanosphere glue solution obtained in step (2) and drop it on t...

Embodiment 3

[0060] Embodiment 3: Using the present invention to realize the assembly of polystyrene beads with a diameter of 3 μm into a single-layer colloidal crystal.

[0061] (1) Select a silicon wafer with a size of 20mm×20mm×400μm as the chip substrate, clean the substrate according to the standard RCA procedure, and then hydrophilize it. For the hydrophilization treatment method, refer to step (1) of Example 1.

[0062] (2) Wash the self-made polystyrene beads with a diameter of 3 μm twice, and then disperse them in a mixture of ethanol and ethylene glycol (volume ratio 5:1), where the volume fraction of the beads in the mixture is 15%.

[0063] (3) Fix the substrate obtained in step (1) on a slope with an inclination angle of 85°.

[0064] (4) Put the inclined plane containing the substrate into an incubator, and set the temperature of the incubator to 80°C.

[0065] (5) Take 30 μL of the monodisperse polystyrene nanosphere glue solution obtained in step (2) and drop it on the t...

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Abstract

The invention provides a method for preparing a slope-induced self-assembly colloidal crystal based on industrialized application, comprising the following steps of: (1) preparing a substrate, comprising the steps of cleaning and hydrophilizing; (2) preparing a glue solution, namely dispersing micro spheres or nano spheres into a solvent to obtain the glue solution with a certain concentration; (3) fixing the substrate prepared in the step (1) on a slope; (4) placing the slope containing the substrate in the step (3) in a constant temperature device; (5) uniformly dripping the glue solution at the top of the substrate in a line, wherein the glue solution flows downward along the slope and finally overspreads the whole substrate; and (6) drying, so that the colloidal crystal is obtained. The method provided by the invention has the advantages that force existing in the natural world is skilfully utilized by virtue of a simple device, and self-assembly of micro sphere and the nano sphere crystals on an industrial large-scale substrate is realized. The slope-induced self-assembly colloidal crystal provided by the invention has a good application prospect in the fields such as the modern semiconductor industry, micro-nano machining, data storage, optical engineering and micro-nano masking (globule printing).

Description

technical field [0001] The invention relates to the field of colloidal crystals, in particular to a slope-induced self-assembly colloidal crystal based on industrial application and a preparation method thereof. Background technique [0002] In recent years, the assembly of small spheres into colloidal crystals has aroused great interest among scientific and technological workers. This is because colloidal crystals have many applications and potential applications, for example, it can be used in nanoprinting, biosensing, surface plasmons, data storage, photonic crystals, etc. With the increasing pursuit of the miniaturization of devices, micro-nano processing technology has attracted more and more attention. The role of colloidal crystals in micro- and nano-printing processes is expected to replace expensive and time-consuming equipment such as electron beam etching, ion beam etching, and photolithography, and play an irreplaceable role in the wave of industrialization. Th...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C30B5/00
Inventor 吴以治许小亮
Owner UNIV OF SCI & TECH OF CHINA
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