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Film system structure for laser and infrared two-waveband high-reflection film and preparation method of film system structure

A film structure and high-reflection film technology, which is applied in optics, optical components, sputtering coating, etc., can solve the problems of poor laser damage threshold and low reflectivity in the laser band, and reduce weight, volume, and firmness Good, high hardness effect

Active Publication Date: 2013-04-03
LUOYANG INST OF ELECTRO OPTICAL EQUIP OF AVIC
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Laser and infrared dual-band high-reflection film is applied to the optical system of laser and infrared "two light in one". The ordinary dual-band reflective film is a metal film. The disadvantage is that the reflectivity of the laser band is low and the laser damage threshold is poor.

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0021] The film structure of this embodiment is a 12-layer film structure composed of four film materials; the first layer of SiO film with an optical thickness of 60nm; the second layer of aluminum film with an optical thickness of 200nm; the third layer of YbF 3 film, the optical thickness is 293nm; the fourth layer of ZnS film, the optical thickness is 293nm; in this way, the optical thickness of all the odd-numbered layers of the 3~12-layer film is the same as that of the film layer, and the optical thickness of all the even-numbered layers of the film material and the film layer is the same. All have the same thickness.

[0022] Coating layer requires equipment configuration:

[0023] The equipment used needs to be equipped with an E-type electron beam evaporation source, three resistance evaporation sources, an optical film thickness controller, a quartz crystal film thickness control device, an ion beam auxiliary device, and a heating and baking device.

[0024] 1. Pre...

Embodiment 2

[0043] 1. Prepare

[0044] 1) Clean the vacuum chamber, coating fixture, evaporation source baffle and ion source, etc.;

[0045] 2) Fill the Al film material into the electron gun crucible with graphite crucible, SiO, YbF 3 , ZnS were loaded into the molybdenum evaporation boat;

[0046] 3) Replace the quartz crystal sheet and light control glass sheet;

[0047] 4) Compile and debug the coating program.

[0048] 2. Clean parts

[0049] 1) Renew the surface of the part with cerium oxide polishing powder;

[0050] 2) Clean the surface of the parts with absorbent cotton dipped in alcohol-ether mixture;

[0051] 3) Put it into the special fixture and put it into the vacuum chamber as quickly as possible.

[0052] 3. Plating film layer

[0053] Close the door of the vacuum chamber and start the coating program to start coating. The process is as follows:

[0054](1) Evacuate and bake the substrate, place the parts to be plated into the vacuum chamber, and evacuate to a vac...

Embodiment 3

[0062] 1. Prepare

[0063] 1) Clean the vacuum chamber, coating fixture, evaporation source baffle and ion source, etc.;

[0064] 2) Fill the Al film material into the electron gun crucible with graphite crucible, SiO, YbF 3 , ZnS were loaded into the molybdenum evaporation boat;

[0065] 3) Replace the quartz crystal sheet and light control glass sheet;

[0066] 4) Compile and debug the coating program.

[0067] 2. Clean parts

[0068] 1) Renew the surface of the part with cerium oxide polishing powder;

[0069] 2) Clean the surface of the parts with absorbent cotton dipped in alcohol-ether mixture;

[0070] 3) Put it into the special fixture and put it into the vacuum chamber as quickly as possible.

[0071] 3. Plating film layer

[0072] Close the door of the vacuum chamber and start the coating program to start coating. The process is as follows:

[0073] (1) Evacuate and bake the substrate, place the parts to be plated into the vacuum chamber, and evacuate to a va...

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Abstract

The invention relates to a film system structure for a laser and infrared two-waveband high-reflection film and a preparation method of the film system structure. The film system structure consists of twelve layers of films from inside to outside and is made from the combination of metal and four dielectric film materials SiO, Al, YbF3 and ZnS. The film system of the film system structure integrates the characteristic of wide reflection zone of a metal reflection film and the characteristic of high reflectivity of a dielectric reflection film; the reflectivity of the film system is higher than 95% for the waveband being 7Mum-11Mum and higher than 99% for the waveband being 1.064Mum; an optical device plated with the film system can be used for instruments of laser and infrared common-optical-path optical system; and the film system structure has the characteristic of high reflectivity for the two wavebands and meanwhile has a high laser induced damage threshold, thus having significance for improving the performance of the optical device and reducing the weight and the size of the optical device.

Description

technical field [0001] The invention belongs to the optical film manufacturing technology, and relates to a film system structure used for laser and infrared dual-band high-reflection film, and also relates to a preparation method of the film system structure. Background technique [0002] Laser has the characteristics of good monochromaticity, good interference, high brightness and directivity, and is increasingly used in military equipment and civilian fields. Laser and infrared dual-band high-reflection coatings are used in laser and infrared "two-light-in-one" optical systems. Ordinary dual-band reflection coatings are metal films. The disadvantages are low reflectivity in the laser band and poor laser damage threshold. Contents of the invention [0003] The object of the present invention is to provide a film system structure for laser and infrared dual-band high reflection film that can improve the reflectivity and damage threshold of the film layer in the laser band...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G02B1/10B32B9/04C23C14/24C23C14/06C23C14/10C23C14/18
Inventor 刘凤玉
Owner LUOYANG INST OF ELECTRO OPTICAL EQUIP OF AVIC
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