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Adsorption carrier for vapor deposition material for vapor deposition of antifouling film

A technology of adsorption carrier and evaporation material, applied in vacuum evaporation coating, metal material coating process, sputtering coating, etc., can solve problems such as broken steel wool, spots of anti-fouling film, and difficult porosity management, and achieve The effect of improving the friction resistance and ensuring the uniformity

Active Publication Date: 2015-09-23
OPTORUN SHANGHAI CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The porous ceramic sintered body contains many impurities, and these impurities are the main reason for the deterioration of the characteristics of the evaporation material, so it is unfavorable to the friction resistance and uniformity of the antifouling film; the steel wool is pressed into the When the adsorption carrier is made of a crucible, the volume of the steel wool limits the amount of organic matter absorbed
And due to the rigid nature of steel wool, porosity management is difficult
Steel wool tends to crumble, causing spots on the antifouling film

Method used

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  • Adsorption carrier for vapor deposition material for vapor deposition of antifouling film
  • Adsorption carrier for vapor deposition material for vapor deposition of antifouling film
  • Adsorption carrier for vapor deposition material for vapor deposition of antifouling film

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Effect test

Embodiment 1

[0037] In this embodiment, a sintered body formed with a single metal iron as a raw material is selected. The melting point of metallic iron is 1535°C, and the sintering temperature is 1000°C-1500°C. Will not react with vapor deposition materials. And it has good ductility and thermal conductivity, low price, and is suitable for mass industrial production.

[0038] Table 2

[0039]

[0040] Table 2 is the friction test result table of the antifouling film evaporated using the adsorption carrier of this embodiment, which records the water drop contact angle of the antifouling film after 0-27000 times of friction. It can be seen that when the antifouling film of the adsorption carrier of this embodiment is used After the film has been rubbed 17,000 times, the water droplet contact angle of the antifouling film still meets the requirements, and the number of rubbing times far exceeds that of the antifouling film vapor-deposited on the adsorption carrier of the prior art. ...

Embodiment 2

[0042] In this embodiment, a sintered body formed from a single metal material, stainless steel, is selected. Stainless steel is an alloy with iron and chromium as the main elements. It is also divided into different types of stainless steel because it contains nickel, carbon, molybdenum, titanium, columbium, selenium, etc. Generally speaking, stainless steel has a high melting point, a sintering temperature of 1000°C-1350°C, high strength, and a wide range of uses.

[0043] table 3

[0044]

[0045] Table 3 is the friction test result table of the antifouling film evaporated using the adsorption carrier of this embodiment, which records the water droplet contact angle of the antifouling film after 0-34000 times of friction. It can be seen that when the antifouling film of the adsorption carrier of this embodiment is used After the film has been rubbed 29,000 times, the water droplet contact angle of the anti-fouling film still meets the requirements, and the number of fr...

Embodiment 3

[0047] In this embodiment, a sintered body formed with a single metal copper as a raw material is selected. The melting point of metallic copper is about 1083°C, which is lower than that of iron and stainless steel. For the sintered body obtained from copper, the sintering temperature is relatively low, ranging from 500°C to 1050°C, so the sintering process is relatively simple.

[0048] Table 4

[0049]

[0050] Table 4 is the friction test result table of the antifouling film evaporated using the adsorption carrier of this embodiment, which records the water droplet contact angle of the antifouling film after 0-37000 times of friction. It can be seen that when the antifouling film of the adsorption carrier of this embodiment is used After the film has been rubbed for 26,000 times, the water drop contact angle of the antifouling film still meets the requirements, and with the increase of the number of subsequent frictions, the change of the water drop contact angle is ver...

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Abstract

The invention provides an adsorption carrier for an evaporation material for evaporation of an anti-fouling film. The adsorption carrier is a sintered body of metal powder, and the metal powder is one or a metal mixture of at least two selected from iron, stainless steel, copper and aluminum. The adsorption carrier provided by the invention has the advantages that the adsorption carrier does not contain impurities and can ensure that the impurities can not be produced by melting during the film plating process under high-vacuum and high-temperature conditions, and the adsorption carrier can not perform chemical reaction with the evaporation material which is adsorbed and carried by the adsorption carrier; a sintering raw material with appropriate heat conductivity can be selected according to the demands of film plating equipment, so that the uniformity of film plating is ensured; and the anti-fouling film which is obtained by using the adsorption carrier provided by the invention to perform vacuum evaporation can greatly improve the wear resistance and is better than the anti-fouling film which is obtained by evaporation by using the adsorption carrier in the prior art.

Description

technical field [0001] The invention relates to the field of vacuum film coating, in particular to an adsorption carrier for vapor deposition materials used for vapor deposition of antifouling films. Background technique [0002] Vacuum coating method is an important film-making method. It has become an indispensable and important technology in the electronic industry such as microelectronics, electronic materials and components, the watch industry, the optical industry such as cameras, and the construction industry such as window glass. In addition, in the high-tech represented by the electronic information industry, the vacuum coating technology also plays a pivotal role. Among the vacuum coating methods, there are representative vacuum evaporation methods, ion plating methods, sputtering coating methods, and chemical vapor deposition (chemical vapor deposition, CVD) methods. Among them, the vacuum evaporation method is the most common method for making thin films. This ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C14/24C23C14/12B22F3/16
Inventor 小岛岳秦燕詒小林一博唐健
Owner OPTORUN SHANGHAI CO LTD
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