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Phosphorus chemical nickel plating concentrated solution and plating process

A technology of electroless nickel plating and concentrated solution, which is applied in the direction of liquid chemical plating, metal material coating process, coating, etc., to achieve the effect of simple and convenient operation, fast deposition rate and good stability of plating solution

Active Publication Date: 2015-02-04
JINCHUAN GROUP LIMITED
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] The object of the present invention is to aim at the shortcomings of the existing medium-phosphorus nickel plating solution, to provide an environmentally friendly, all-bright medium-phosphorus electroless nickel-plating concentrated solution, which has fast deposition rate, good stability and long service life.

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0055] Take succinic acid, butynediol, deionized water and nickel sulfate produced by Jinchuan Group Nickel Salt Co., Ltd., mix the components at room temperature, and stir until the solid components are completely dissolved to obtain liquid A. Contain 450g of nickel sulfate, 0.025g of succinic acid, and 0.0239g of butynediol in liter A liquid; uniformly mix sodium hydroxide and acetic acid to obtain the first buffer, and the amount of sodium hydroxide per liter of the first buffer is 95g, Acetic acid 60g; uniformly mix sodium hydroxide and acetic acid to obtain the second buffering agent, containing 15g of sodium hydroxide and 3g of acetic acid in every liter of the second buffering agent; uniformly mixing lactic acid and malic acid to obtain the first complexing agent, the second buffering agent per liter Contain 70g of lactic acid and 90g of malic acid in the first complexing agent; uniformly mix lactic acid and malic acid to obtain the second complexing agent, containing 6g...

Embodiment 2

[0058] Take adipic acid, propargyl alcohol, deionized water and nickel sulfate produced by Jinchuan Group Nickel Salt Co., Ltd.; at room temperature, mix the components and stir until the solid components are completely dissolved to obtain liquid A. Contain sodium sulfate 450g, adipic acid 0.03g, propargyl ketone 0.025g in A liquid; Mix sodium hydroxide and acetic acid evenly, obtain the first buffering agent, contain sodium hydroxide amount 100g, acetic acid 65g in every liter of the first buffering agent; Uniformly mix sodium hydroxide and acetic acid to obtain the second buffer, containing 17g of sodium hydroxide and 5g of acetic acid per liter of the second buffer; uniformly mix lactic acid and malic acid to obtain the first complexing agent, each liter of the first complex Contain 75g of lactic acid and 95g of malic acid in the agent; uniformly mix lactic acid and malic acid to obtain the second complexing agent, and contain 10g of lactic acid and 46g of malic acid in ever...

Embodiment 3

[0061] Take succinic acid, ethoxylated propargyl alcohol, deionized water and nickel sulfate produced by Jinchuan Group Nickel Salt Co., Ltd.; at room temperature, mix the taken components and stir until the solid components are completely dissolved to obtain liquid A , containing 450g of nickel sulfate, 0.0255g of succinic acid, and 0.0245g of ethoxylated propargyl alcohol in each liter of A liquid; uniformly mixing sodium hydroxide and acetic acid to obtain the first buffer, containing hydroxide per liter of the first buffer Sodium content 97.5g, acetic acid 62.5g; Uniformly mix sodium hydroxide and acetic acid to obtain the second buffer, containing 16g of sodium hydroxide and 4g of acetic acid per liter of the second buffer; Uniformly mix lactic acid and malic acid to obtain the first complex Compounding agent, containing 72.5g of lactic acid and 92.5g of malic acid in every liter of the first complexing agent; uniformly mixing lactic acid and malic acid to obtain the secon...

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Abstract

The invention discloses a phosphorus chemical nickel plating concentrated solution and a plating process, the concentrated solution comprises three parts of an A solution, a B solution and a C solution, a main salt, a brightening agent, an accelerating agent and deionized water are mixed into the A solution at room temperature; a first buffer, a first complexing agent, sodium hypophosphite, a stabilizer, polyethylene glycol 6000, a brightening agent and deionized water are mixed into the B solution at room temperature; a second buffer, a second complexing agent, the stabilizer, the sodium hypophosphite, the polyethylene glycol 6000, the accelerating agent, the brightening agent, ammonia and the deionized wate are mixed r at room temperature into the C solution; the A solution and the B solution are used for grooving, and the A solution and the C solution are used for replenishment. According to the volume percentage, the A solution, the B solution, and dilution water are mixed into a chemical nickel plating solution for plating, the nickel content in the nickel plating solution is lower than 4.0g / L, and the A solution and the C solution are replenished. When the concentrated solution is used for nickel plating, deposition rate is quick, coating hardness and wear resistance are high, and the concentrated solution is suitable for chemical nickel plating of aluminum alloy, all kinds of iron alloy, copper alloy, nickel iron alloy, nickel copper alloy and some non conductive substrates.

Description

technical field [0001] The invention belongs to the technical field of electroless nickel plating, and relates to an electroless nickel plating solution, in particular to a medium-phosphorus electroless nickel plating concentrated solution; the invention also relates to a nickel plating process using the nickel plating concentrated solution. Background technique [0002] Medium phosphorus electroless nickel plating is currently the most widely used in industry, mainly used in automobiles, electronics, textile machinery, petrochemical machinery, food industry, office equipment, precision machinery industry, etc. [0003] Most of the existing medium-phosphorus nickel plating solutions use expensive compounds that are not easily available in the market, such as succinic acid, salicylic acid, etc., as complexing agents. If the deposition rate of the coating is too fast, the stability of the plating solution will be poor and the service life will be short. , the coating quality i...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C18/36
CPCC23C18/36
Inventor 谢刚李宝平王霞邢晓钟张霞张国勇孙正德黄淑芳
Owner JINCHUAN GROUP LIMITED
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