High-stability recyclable surface-enhanced Raman substrate and preparation method
A surface-enhanced Raman, high-stability technology, used in Raman scattering, gaseous chemical plating, superimposed layer plating, etc. Chemical stability and other issues, to achieve excellent performance stability and recycling function, good surface enhanced Raman effect, anti-oxidation effect
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[0017] Example 1
[0018] 1. Use acetone, alcohol, and deionized water to ultrasonically clean the silicon substrate or glass substrate and dry it;
[0019] 2. Fix the pretreated substrate on the sample stage of the electron beam evaporation coating machine;
[0020] 3. At room temperature, using metallic silver as the target, evacuate the chamber of the electron beam evaporation coating machine to a vacuum of 3×10 -5 Pa;
[0021] 4. Adjust the incident angle of the electron beam to 82 degrees, and make the sample stage stand still, and grow a silver nanorod thin film with a nanorod length of 300nm on the base of the sample stage;
[0022] 5. A uniform and dense titanium oxide film is deposited on the silver substrate at 82°C by the atomic layer deposition method to prepare a silver-titanium oxide composite film, wherein the thickness of the titanium oxide film is 1.5nm;
[0023] 6. Preparation 10 -6 mol / L rhodamine 6G solution;
[0024] 7. Put the surface-enhanced Raman substrate prepare...
Example Embodiment
[0028] Example 2
[0029] 1. Use acetone, alcohol, and deionized water to ultrasonically clean the silicon substrate or glass substrate and dry it;
[0030] 2. Fix the pretreated substrate on the sample stage of the electron beam evaporation coating machine;
[0031] 3. At room temperature, using metallic silver as the target, evacuate the chamber of the electron beam evaporation coating machine to a vacuum of 5×10 -5 Pa;
[0032] 4. Adjust the incident angle of the electron beam to 85 degrees, and rotate the sample stage at a rate of 5 rpm, and grow a 400nm silver nanorod straight film on the substrate of the sample stage obliquely;
[0033] 5. By atomic layer deposition method, a uniform and dense titanium oxide film is deposited on a silver substrate at 90°C to prepare a silver-titanium oxide composite film, wherein the thickness of the titanium oxide film is 2.3nm;
[0034] 6. Preparation 10 -6 mol / L rhodamine 6G solution;
[0035] 7. Put the surface-enhanced Raman substrate prepared ...
Example Embodiment
[0039] Example 3
[0040] 1. Use acetone, alcohol, and deionized water to ultrasonically clean the silicon wafer substrate or glass substrate and dry it;
[0041] 2. Fix the pretreated substrate on the sample stage of the electron beam evaporation coating machine;
[0042] 3. At room temperature, using metallic silver as the target, evacuate the chamber of the electron beam evaporation coating machine to a vacuum of 8×10 -5 Pa;
[0043] 4. Adjust the incident angle of the electron beam to 88 degrees, and rotate the sample stage at a rate of 10 rpm, and grow the silver nanorod film with a length of 500nm on the substrate of the sample stage obliquely;
[0044] 5. By atomic layer deposition method, a uniform and dense titanium oxide film is deposited on a silver substrate at 100°C to prepare a silver-titanium oxide composite film, wherein the thickness of the titanium oxide film is 3.1nm;
[0045] 6. Preparation 10 -6 mol / L rhodamine 6G solution;
[0046] 7. Put the surface-enhanced Raman s...
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