Organic electroluminescent device and preparation method thereof
An electroluminescent device and luminescence technology, which is applied in the direction of organic light-emitting devices, organic light-emitting device structures, organic semiconductor devices, etc., can solve the problems of organic layer damage, low luminous efficiency, easy quenching, etc.
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[0034] The preparation method of the organic electroluminescence device 100 of an embodiment, it comprises the following steps:
[0035] Step S110 , sequentially forming a hole injection layer 20 , a hole transport layer 30 , a light emitting layer 40 , an electron transport layer 50 and an electron injection layer 60 on the surface of the anode 10 .
[0036] The anode 10 is indium tin oxide glass (ITO), fluorine-doped tin oxide glass (FTO), aluminum-doped zinc oxide glass (AZO) or indium-doped zinc oxide glass (IZO), preferably ITO.
[0037] In this embodiment, before the hole injection layer 20 is formed on the surface of the anode 10, the anode 10 is pretreated. The pretreatment includes: performing photolithography on the anode 10, cutting it into the required size, using detergent, deionized Water, acetone, ethanol, and isopropanone were each ultrasonically cleaned for 15 minutes to remove organic pollutants on the surface of the anode 10 .
[0038] The hole injection la...
Embodiment 1
[0053] The structure prepared in this example is ITO / WO3 / NPB / Alq 3 / Bphen / LiF / ZnS:Ag / TAZ:TiO 2 / ITO organic electroluminescent device, in this embodiment and the following embodiments, " / " indicates a layer, and ":" indicates doping.
[0054] First, carry out photolithography treatment on ITO, cut it into the required size, and then use detergent, deionized water, acetone, ethanol, and isopropanol to sonicate for 15 minutes each to remove organic pollutants on the glass surface; clean the conductive substrate Carry out suitable treatment: oxygen plasma treatment, treatment time is 5min, power is 30W; evaporation hole injection layer, material is WO 3 , with a thickness of 60nm; evaporated hole transport layer, made of NPB, with a thickness of 30nm; evaporated luminescent layer, made of BCzVBi, with a thickness of 30nm; evaporated electron transport layer, made of Bphen, with a thickness of 50nm; evaporated electron Injection layer, material is LiF, thickness is 0.7nm; Evapo...
Embodiment 2
[0062] The structure prepared in this example is AZO / MoO 3 / TCTA / ADN / Bphen / CsF / CdS:Al / OXD-7:TiO 2 / AZO's organic electroluminescent devices.
[0063] First, use detergent, deionized water, and ultrasonication on the AZO glass substrate for 15 minutes to remove organic pollutants on the glass surface; evaporate the hole injection layer: the material is MoO 3 , with a thickness of 80nm; evaporated hole transport layer: the material is TCTA, with a thickness of 60nm; evaporated luminescent layer: the selected material is ADN, with a thickness of 5nm; evaporated electron transport layer, the material is Bphen, with a thickness of 200nm; evaporated The electron injection layer is plated, the material is CsF, and the thickness is 10nm; the vapor deposition cathode is vapor-deposited on the surface of the electron injection layer by thermal resistance evaporation to prepare a metal sulfide doped layer, and the material is CdS:Al, CdS and Al The mass ratio is 5:1, the thickness is 1...
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