Preparing method of high-density and high-purity sputtering rotation silver target material

Abstract

The invention discloses a preparing method of a high-density and high-purity sputtering rotation silver target material. Firstly, stainless steel is machined according to the requirement of customers, secondly, sand blasting is carried out through brown aluminium oxide, and thirdly, Cu-Al wires are used for bottoming, wherein the thickness of a bottoming layer is 0.5 mm. A laval spraying pipe manufactured through carbon tungsten alloy is used for spraying silver powder, and the structure of the spraying pipe designed through carbon tungsten is shown as the graph 1. The silver powder is spherical powder, the granularity ranges from 5 microns to 45 microns, the pressure of nitrogen ranges from 3 Mpa to 5 Mpa, the heating temperature of nitrogen ranges from 400 DEG C to 500 DEG C, and the powder conveying rotating speed is 6 RPM. Secondary acceleration is carried out on particles through the laval spraying pipe, and the particle speed is increased to range from 600 m / s to 800 m / s. By means of the method for preparing the silver target material through cold spraying, the beneficial effects of the simple technology and the compact structure are achieved. The relative density of the target material can reach more than 99.8%, the grain structure in the target material is uniform and fine, and the defective structure is avoided. The deposition efficiency is high, and the production cost is reduced.

Description

technical field [0001] The invention relates to the field of touch screen / optical glass magnetron sputtering coating, in particular to a method for preparing a high-density and high-purity sputtering rotating silver target. Background technique [0002] With the rapid development of social economy, electronic products have become an indispensable tool and necessity in our life. A very key component in electronic products is touch screen and optical glass. The coating is achieved by magnetron sputtering coating process. The material to realize this process is a rotating target. At present, the market demand for rotating targets in China and the Asia-Pacific region exceeds 70% of the world's total demand. The market prospect is broad. For the touch screen industry and optical coating industry, magnetron sputtering The film has two extremely important index parameters, which are transmittance and resistivity. Whether the index parameters of magnetron sputtering coating can reac...

AI Technical Summary

Problems solved by technology

Using the casting process to prepare the target, the first process control parameter multi-target yield is not high, the second casting target has a relatively coarse grain structure, and there may be some casting defects such as inclusions, pores, etc. inside, which will affect the quality of the sputtered film. The more splicing gaps in the multi-section assembly of the third target, the more uniformity of the plasma will be affected during the coating process, and it may cause local abnormal discharge, thereby reducing the uniformity and yield of the film layer

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