Preparation method of fluorescent nanometer standard plate

Abstract

The invention relates to a preparation method of a fluorescent nanometer standard board. The method includes the steps of firstly, forming a metal layer on the surface of a base layer through an electron beam evaporating method or a magnetron sputtering method; secondly, coating the surface of the metal layer with a photoresist layer in a spinning mode, exposing the photoresist layer at equal intervals through an electron beam etching method, and forming photoresist strips at equal intervals after developing; thirdly, soaking the photoresist strips in a silylating reagent to silylate the surface and form a silane layer; fourthly, soaking the silane layer in a fluorescent dye solution to react for 30 min so that the surface of the silane layer can be decorated with a fluorescent dye layer; fifthly, coating the surface of the fluorescent dye layer with a transparent protecting layer in a spinning mode. The method is few in steps, simple in process, mild in reaction condition, free of pollution and high in process repeatability; by accurately adjusting the structure and size of the fluorescent nanometer standard board, the fluorescent strips are neatly arrayed, and the resolution capacity of the system is visually reflected; meanwhile, the standard board of the structure can be manufactured in batches and is high in stability and resolution ratio.

Description

technical field [0001] The invention relates to a preparation method of a fluorescent nano standard plate, in particular to a preparation method of a fluorescent nano standard plate used to characterize the resolution of a super-resolution fluorescence microscope system. Background technique [0002] For a long time, optical microscopy imaging technology has played an important role in the process of human exploration of the microscopic world. However, limited by Abbe's diffraction limit, traditional optical microscopy cannot bring life science research to the nanoscale. With the continuous development and improvement of fluorescence microscopy imaging, it is possible to break through the diffraction limit. In recent years, many super-resolution fluorescence microscopy techniques have emerged, such as Single Molecule Localization Microscopy (SMLM), Structured Illumination Microscopy (SIM) and Stimulated Emission Depletion Microscopy. (Stimulated Emission Depletion, STED) a...

AI Technical Summary

Problems solved by technology

However, in the existing technology, the structure and size of the standard plate are difficult to obtain repeatable and accurate processing, the arrangement of the fluorescent lines is not neat enough, the manufacturing process is complicated, and mass production cannot be realized. The difficulty of this processing is mainly due to the The structural design of the standard board is not scientific and reasonable enough, and the arrangement of some process links has not been perfect

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