A kind of nanoparticle based on n-(2-hydroxypropyl) methacrylamide polymer and preparation method thereof

A technology of methacrylamide and polymer, applied in the field of N-methacrylamide (HPMA) polymer and its derivatives, nanoparticles passing through the mucus barrier and its preparation
CN105412935BActive Publication Date: 2019-02-19SICHUAN UNIV
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
SICHUAN UNIV
Publication Date
2019-02-19

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Abstract

The invention discloses an N-(2-hydroxypropyl) methacrylamide polymer based nanoparticles capable of overcoming a mucus barrier and a preparation method thereof. The nanoparticles consist of nucleuses and shells, wherein the kernels are a nanometer compound prepared from a biocompatible carrier material and active ingredients, and the shells are an HPMA polymer and its derivatives.
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Description

technical field

[0001] The present invention relates to a kind of N-(2-hydroxypropyl) methacrylamide (HPMA) polymer and its derivatives which can overcome mucus barrier, in particular to a kind of N-(2-hydroxypropyl) methacrylamide Nanoparticles of (HPMA) polymers and derivatives thereof passing through the mucus barrier and a preparation method thereof belong to the field of pharmaceutical preparations. Background technique

[0002] Mucus is a complex hydrogel composed of proteins, carbohydrates, lipids, inorganic salts, antibodies, bacteria and cell debris (Adv. Drug. Deliv. Rev., 2012, 64: 557-570), covering the Human gastrointestinal tract, respiratory tract, eyes and cervix and other mucous membrane surfaces. On the one hand, the mucus layer plays a vital role in human health by adsorbing and rapidly removing pathogens and foreign substances; at the same time, the mucus layer also constitutes an important physiological barrier that must be crossed for mucosal drug deli...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
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