Anti-radiation anti-reflection lampshade capable of filtering blue light and manufacturing method thereof
A technology for filtering blue light and a manufacturing method, applied in the field of lampshade, can solve the problems of affecting the light transmittance of lampshade, little radiation protection of lampshade, and physical influence.
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Embodiment 1
[0070] When the substrate 1 is molded by resin, the manufacturing method of the lampshade for filtering blue light, anti-radiation and anti-reflection specifically includes the following steps:
[0071] 1) Clean and dry the substrate 1: place the substrate in a vacuum chamber, bombard it with an ion gun and place it in the vacuum chamber, and bombard the outer surface of the substrate with an ion gun for 2-3 minutes to clean;
[0072] 2) Coating the outer surface of the substrate 1;
[0073] A. Coating the first film layer 2:
[0074] Adjust the vacuum degree in the vacuum coating chamber to less than or equal to 5.0×10 -3 Pa, and control the temperature in the vacuum coating chamber to 50-70°C, use an electron gun to bombard the film material of the first film layer 2, and the film material of the first film layer 2 evaporates and deposits on the outer surface of the substrate in the form of nano-scale molecules , while controlling the evaporation rate of the first film lay...
Embodiment 2
[0094] When the substrate 1 is formed from glass, the manufacturing method of the lampshade for filtering blue light, anti-radiation and anti-reflection specifically includes the following steps:
[0095] 1) Clean and dry the substrate 1: place the substrate in a vacuum chamber, bombard it with an ion gun and place it in the vacuum chamber, and bombard the outer surface of the substrate with an ion gun for 5-10 minutes to clean;
[0096] 2) Coating the outer surface of the substrate 1;
[0097] A. Coating the first film layer 2:
[0098] Adjust the vacuum degree in the vacuum coating chamber to less than or equal to 5.0×10 -3 Pa, and control the temperature in the vacuum coating chamber to 200-300°C, use an electron gun to bombard the film material of the first film layer 2, and the film material of the first film layer 2 evaporates and deposits on the outer surface of the substrate in the form of nanometer molecules , while controlling the evaporation rate of the first film...
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