Self-cleaning photocuring antifogging paint and preparation method thereof
An anti-fog coating, light-curing technology, applied in the field of coatings, can solve problems such as poor compatibility, affecting the transparency of the coating, limitations, etc., to achieve the effect of improving strength and wear resistance, inhibiting the growth of bacteria, and improving mechanical properties
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[0031] Example 1
[0032] Ⅰ. Preparation of modified graphene nanoparticles:
[0033] (1) Add 50 parts by mass of allyl glycidyl ether, 6 parts by mass of graphene, 43 parts by mass of ethyl glycol ether, and 1 part by mass of p-phenol polymerization inhibitor into the reaction vessel, ultrasonically disperse for 30 minutes, and stir at 100°C After 18 hours, allyl grafted modified graphene was obtained;
[0034] (2) Add 18 parts by mass of allyl grafted modified graphene, 42 parts by mass of acrylate, and 40 parts by mass of ethylene glycol ether into the reaction vessel, and stir for 24h at a temperature of 55°C to obtain modified graphene nano particle.
[0035] Ⅱ. Preparation of hydrophilic photosensitive resin:
[0036] Slowly mix 25 parts by mass of 2-acrylamide-2-methyl-propanesulfonic acid, 25 parts by mass of dimethylaminoethyl methacrylate, and 15 parts by mass of N,N-dimethylaminoethyl (meth)acrylamide Drop 32 parts by mass into ethylene glycol ethyl ether, add 3 parts by m...
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[0038] Example 2
[0039] Ⅰ. Preparation of modified graphene nanoparticles:
[0040] (1) Add 45 parts by mass of allyl glycidyl ether, 8 parts by mass of graphene, 45 parts by mass of diethylene glycol methyl ether, and 2 parts by mass of p-phenol polymerization inhibitor into the reaction vessel, and ultrasonically disperse for 30 min. Stir at 90°C for 18 hours to obtain allyl grafted modified graphene;
[0041] (2) Add 20 parts by mass of allyl grafted modified graphene, 60 parts by mass of hydroxyethyl methacrylate, and 20 parts by mass of diethylene glycol methyl ether into the reaction vessel, and stir at a temperature of 60°C After 24 hours, modified graphene nanoparticles were obtained.
[0042] Ⅱ. Preparation of hydrophilic photosensitive resin:
[0043] 30 parts by mass of hydroxybutyl methacrylate, 15 parts by mass of dimethylaminoethyl methacrylate and 21 parts by mass of N,N-dimethylacrylamide are slowly added dropwise to 30 parts by mass of diethylene glycol ethyl ether,...
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[0045] Example 3
[0046] Ⅰ. Preparation of modified graphene nanoparticles:
[0047] (1) Add 55 parts by mass of allyl glycidyl ether, 10 parts by mass of graphene, 33 parts by mass of diethylene glycol ethyl ether, and 2 parts by mass of p-phenol polymerization inhibitor into the reaction vessel, and ultrasonically disperse for 30 min at 110 Stir at ℃ for 18 hours to obtain allyl grafted modified graphene;
[0048] (2) Add 16 parts by mass of allyl grafted modified graphene, 50 parts by mass of hydroxyethyl acrylate, and 34 parts by mass of diethylene glycol ethyl ether into the reaction vessel, and stir at 70°C for 24 hours to obtain Modified graphene nanoparticles.
[0049] Ⅱ. Preparation of hydrophilic photosensitive resin:
[0050] 31 parts by mass of hydroxyethyl acrylate, 15 parts by mass of dimethylaminoethyl methacrylate, and 15 parts by mass of N,N-diethylacrylamide were slowly added dropwise to 35 parts by mass of propylene glycol methyl ether. At 90°C, Add 4 parts by mas...
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