Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Self-cleaning photocuring antifogging paint and preparation method thereof

An anti-fog coating, light-curing technology, applied in the field of coatings, can solve problems such as poor compatibility, affecting the transparency of the coating, limitations, etc., to achieve the effect of improving strength and wear resistance, inhibiting the growth of bacteria, and improving mechanical properties

Active Publication Date: 2016-10-12
湖南天氟新材料有限公司
View PDF8 Cites 8 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The patent with the publication number CN104725640A discloses a hydrophilic modified silica sol and its application in the preparation of hydrophilic anti-fog and wear-resistant coatings. The PEG-modified silane coupling agent and ethyl orthosilicate are hydrolyzed to prepare hydrophilic Modified silica sol, adding this silica sol to the anti-fog coating, the prepared anti-fog coating has good wear resistance and adhesion, but the compatibility between silica sol and polyethylene glycol is poor, resulting in poor transmittance of the coating Low-level problems; the patent with the publication number CN105038430A discloses a super-hydrophilic anti-fog coating, which is composed of modified acrylic emulsion, nano-silica, titanium dioxide and surfactants, adding nano-silica to significantly improve the coating. The adhesion of the layer to the substrate and the strength of the coating can improve the long-lasting anti-fog effect, but the long-chain hydrophobic groups of the surfactant are easy to aggregate and separate from the hydrophilic components. After absorbing moisture, a color film is formed on the surface, which affects the optical properties. The introduction of white powder will affect the transparency of the coating; the publication number is CN102850924A, which discloses a long-lasting anti-fog coating, which is prepared from a modified hydrophilic resin, a blocked isocyanate curing agent and a modified surfactant. The blocked isocyanate curing agent must be unblocked and heat-cured above 120°C, which requires high temperature resistance for transparent substrates, and its application is limited
The disadvantage of the existing technology is that it is difficult for the existing system to take into account the comprehensive performance of adhesion, surface hardness, wear resistance, water resistance and long-lasting anti-fog performance, and sacrifice some performance to improve other performance

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Self-cleaning photocuring antifogging paint and preparation method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0032] Ⅰ. Preparation of modified graphene nanoparticles:

[0033] (1) Add 50 parts by mass of allyl glycidyl ether, 6 parts by mass of graphene, 43 parts by mass of ethylene glycol ether, and 1 part by mass of p-phenol polymerization inhibitor into the reaction vessel, ultrasonically disperse for 30 minutes, and stir at 100°C 18 hours, obtain allyl graft modified graphene;

[0034] (2) Add 18 parts by mass of allyl graft modified graphene, 42 parts by mass of acrylate, and 40 parts by mass of ethylene glycol ether into the reaction vessel, and stir for 24 hours at a temperature of 55° C. to obtain modified graphene nanoparticles. particle.

[0035] Ⅱ. Preparation of hydrophilic photosensitive resin:

[0036] 25 parts by mass of 2-acrylamide-2-methyl-propanesulfonic acid, 25 parts by mass of dimethylaminoethyl methacrylate and 15 parts by mass of N, N-dimethylaminoethyl (meth)acrylamide were slowly Add 32 parts by mass to ethylene glycol ether dropwise, add 3 parts by mass ...

Embodiment 2

[0039] Ⅰ. Preparation of modified graphene nanoparticles:

[0040] (1) Add 45 parts by mass of allyl glycidyl ether, 8 parts by mass of graphene, 45 parts by mass of diethylene glycol methyl ether, and 2 parts by mass of p-phenol polymerization inhibitor into the reaction vessel, and ultrasonically disperse for 30min. Stirring at 90°C for 18 hours to obtain allyl grafted modified graphene;

[0041] (2) Add 20 parts by mass of allyl grafted modified graphene, 60 parts by mass of hydroxyethyl methacrylate, and 20 parts by mass of diethylene glycol methyl ether into the reaction vessel, and stir at a temperature of 60°C After 24 hours, modified graphene nanoparticles were obtained.

[0042] Ⅱ. Preparation of hydrophilic photosensitive resin:

[0043] 30 parts by mass of hydroxybutyl methacrylate, 15 parts by mass of dimethylaminoethyl methacrylate and 21 parts by mass of N,N-dimethylacrylamide are slowly added dropwise to 30 parts by mass of diethylene glycol ethyl ether, At 9...

Embodiment 3

[0046] Ⅰ. Preparation of modified graphene nanoparticles:

[0047] (1) Add 55 parts by mass of allyl glycidyl ether, 10 parts by mass of graphene, 33 parts by mass of diethylene glycol ether, and 2 parts by mass of p-phenol polymerization inhibitor into the reaction vessel, ultrasonically disperse for 30min, and Stirring at ℃ for 18 hours to obtain allyl graft modified graphene;

[0048] (2) Add 16 parts by mass of allyl graft modified graphene, 50 parts by mass of hydroxyethyl acrylate, and 34 parts by mass of diethylene glycol ethyl ether into the reaction vessel, and stir for 24 hours at a temperature of 70° C. to obtain Modified graphene nanoparticles.

[0049] Ⅱ. Preparation of hydrophilic photosensitive resin:

[0050] 31 parts by mass of hydroxyethyl acrylate, 15 parts by mass of dimethylaminoethyl methacrylate and 15 parts by mass of N,N-diethylacrylamide were slowly added dropwise to 35 parts by mass of propylene glycol methyl ether, at 90°C, 4 parts by mass of diben...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention provides a self-cleaning photocuring antifogging paint which is prepared from the following raw materials in parts by mass: 3-8 parts of modified graphene nano particle, 20-80 parts of hydrophilic photosensitive resin, 5-20 parts of photoinitiator, 15-40 parts of diluter and 1-3 parts of curing accelerator. The invention also provides a preparation method of the self-cleaning photocuring antifogging paint. Compared with correlation techniques, the method provided by the invention has the following advantages: the graphene surface is subjected to hydrophilc modification to endow the graphene with favorable hydrophilicity and dispersity, and the graphene has favorable compatibility with the photosensitive resin, thereby greatly enhancing the strength wear resistance of the coating; the cation organic monomer modified hydrophilic resin can effectively inhibit the bacteria on the coating surface from generation, and has favorable self-cleaning property; the cured paint forms a crosslinked network, so that the adhesion, hardness, frictional resistance, water resistance and other mechanical properties are enhanced, and the cured paint can resist fog for a long time; and the paint is baked at low temperature, and is applicable to various substrates.

Description

【Technical field】 [0001] The invention relates to the technical field of coatings, in particular to a self-cleaning light-curing anti-fog coating and a preparation method thereof. 【Background technique】 [0002] The existing anti-fog coatings make the coating hydrophilic by introducing hydrophilic functional groups, so that the contact of fog droplets on the coating surface is low, and spread into a uniform water film to prevent light scattering, so as to achieve the purpose of anti-fog. The patent with the publication number CN104725640A discloses a hydrophilic modified silica sol and its application in the preparation of hydrophilic anti-fog and wear-resistant coatings. The PEG-modified silane coupling agent and ethyl orthosilicate are hydrolyzed to prepare hydrophilic Modified silica sol, adding this silica sol to the anti-fog coating, the prepared anti-fog coating has good wear resistance and adhesion, but the compatibility between silica sol and polyethylene glycol is p...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): C09D133/24C09D133/14C09D5/14C08F220/58C08F220/34C08F220/60C08F220/28C08F220/54
CPCC08F220/28C08F220/281C08F220/58C08F220/585C08K3/04C08K9/08C09D5/14C09D133/14C09D133/24C08F220/343C08F220/60C08F220/54
Inventor 樊孝红董其宝
Owner 湖南天氟新材料有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products