A kind of conductive nickel paste for perovskite solar cells and preparation method thereof
A solar cell and perovskite technology, which is applied in the direction of cable/conductor manufacturing, semiconductor/solid-state device manufacturing, conductive materials dispersed in non-conductive inorganic materials, etc., can solve the problem of inability to obtain conductive nickel paste, and achieve improvement The effect of battery device efficiency, simple composition, and good electrical conductivity
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Embodiment 1
[0028] Mix 10 grams of nickel powder (average particle size 10 microns) with 1 gram of nano-nickel oxide, add to 10 grams of water and 3.75 grams of ethanol, add 0.25 grams of nickel acetylacetonate, and grind thoroughly to obtain a conductive nickel paste. The conductive nickel paste is used to prepare a thin film by printing technology, and sintered at a temperature of 600°C to obtain a conductive film, which is then assembled into a perovskite solar cell. Its structure is as follows: figure 1 As shown, there are 1-7 layers from bottom to top, wherein 1 is a transparent substrate, 2 is a transparent conductive layer, 3 is a hole blocking layer, 4 is an electron selective layer, 5 is a spacer layer, 6 is an electron selective layer, and 7 is an electron selective layer. for nickel electrodes. Since nickel is easily oxidized to nickel oxide under high temperature conditions, part of the surface of nickel powder will be oxidized to form a nickel / nickel oxide core-shell structur...
Embodiment 2
[0031] Mix 10 grams of nickel powder (average particle size 10 microns) with 2.5 grams of carbon black, add to 8 grams of water and 3.5 grams of acetonitrile, add 1 gram of zirconium oxychloride, and grind thoroughly to obtain a nickel slurry. The nickel paste is used to prepare a thin film by printing technology, and sintered at a temperature of 350°C to obtain a conductive film, which is then assembled into a perovskite solar cell.
[0032] The conductivity test shows that the surface resistance of the conductive film is 0.8Ω / □ when the thickness is 10 μm.
[0033] Cell efficiency: 100mW / cm at intensity 2 The simulated solar photoelectric performance test shows that the solar cell obtains a short-circuit photocurrent density J sc =12mA / cm 2 , open circuit voltage V oc =900mV, fill factor FF=0.63, photoelectric conversion efficiency η=6.8%.
Embodiment 3
[0035]Mix 10 grams of nickel powder (average particle size 10 microns) with 0.816 grams of nano-copper, add to 5 grams of water and 0.83 grams of dimethyl sulfoxide, add 0.017 grams of tetraethyl orthosilicate, and fully grind to obtain nickel paste . The nickel paste is used to prepare a thin film by printing technology, and sintered at a temperature of 300°C to obtain a conductive film.
[0036] The conductive nickel film prepared above has a surface resistance of ≤0.020Ω / □, an adhesion of 4B, and a hardness of >2H when the film thickness is 10 μm.
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