Thin film special material for polyether-ether-ketone as well as preparation method and application thereof in preparing polyether-ether-ketone/polyetherimide alloy thin film

A technology of polyetheretherketone resin and polyetherimide is applied in the application field of preparing polyetheretherketone/polyetherimide alloy film, which can solve processing difficulties, hinder the large-scale application of film, polyetherether Ketones Are Expensive and More

Active Publication Date: 2017-05-31
JILIN UNIV
View PDF10 Cites 11 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

In recent years, polyether ether ketone film materials have attracted much attention. Because polyether ether ketone films have the advantages of high temperature resistance, corrosion resistance, and radiation resistance of polyether ether ketone resins, they are widely used in the fields of aviation, nuclear energy and electronics. However, due to commodity Insufficient purity of chemical engineering plastic grade polyether ether ketone resin leads to insufficient product uniformity and performance when preparing films; in addition, polyetherether ketone is expensive and has high melt viscosity and difficult processing, which hinders the large-scale application of films

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Thin film special material for polyether-ether-ketone as well as preparation method and application thereof in preparing polyether-ether-ketone/polyetherimide alloy thin film
  • Thin film special material for polyether-ether-ketone as well as preparation method and application thereof in preparing polyether-ether-ketone/polyetherimide alloy thin film
  • Thin film special material for polyether-ether-ketone as well as preparation method and application thereof in preparing polyether-ether-ketone/polyetherimide alloy thin film

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0031] Add 43.35Kg of diphenyl sulfone into a reaction kettle equipped with mechanical stirring, temperature control system and nitrogen protection, heat to 160°C and add 10.921Kg (50.05mol) of 4,4'-difluorobenzophenone, anhydrous 6.36Kg (60mol) of sodium carbonate, then heated to 165°C, added 5.502Kg (50mol) of hydroquinone, continued to heat to 200°C for 1 hour, then gradually raised the temperature to 250°C for 35 minutes, and then reacted for 1 hour at 280°C. Finally, it was heated to 315° C. for 4 hours to react. Then 85.1 g (0.5 mol) of 4-hydroxybiphenyl monomer was added. After continuing the reaction for 30 minutes, it can be found that the viscosity of the reaction solution no longer increases with the reaction time, which proves that 4-hydroxybiphenyl can react with the end group of the polymer to terminate the polymerization reaction. The reaction solution was pumped into a filter tank at 260° C. containing 57.8 Kg of diphenyl sulfone solution to adjust the solid c...

Embodiment 2

[0034] According to the reaction steps of Example 1, only 10.916Kg (50.03mol) of 4,4'-difluorobenzophenone was changed and the reaction steps were unchanged.

[0035]The melt index of the test material is 15g / 10min (melt index meter, 400°C, 5kg pressure, the melt index can reflect the molecular weight), and the initial thermal weight loss temperature of the polymer under nitrogen environment is higher than 550°C. Its glass transition temperature is 146°C and its melting point is 343°C.

Embodiment 3

[0037] The raw material is the melt index 26g / 10min film-grade polyetheretherketone resin prepared in Example 1, polyetherimide resin (Sabic company Altem1000), polyetheretherketone / polyetherimide film according to each component and 100.0wt % calculation, containing 95.0wt% film-grade polyether ether ketone resin, 5.0wt% polyetherimide resin, premixed in a high-speed mixer and dried at 130 ° C for 2.5 hours at a high temperature, and then passed through a feeding screw The hopper is added to the twin-screw extruder. The temperature of each section of the twin-screw extruder barrel is 335°C, 350°C, 365°C, and 380°C. The ratio of the speed of the feeding screw in the hopper to the speed of the twin-screw of the extruder is 3: 2; The width of the mouth film is 150mm, the film lip thickness of the bow-shaped slit film is 0.18mm, the temperature of the mouth film is 360°C, the distance between the mouth film and the three-roll calender is 2mm, and the three-roll calender roll The ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

PropertyMeasurementUnit
melt flow indexaaaaaaaaaa
glass transition temperatureaaaaaaaaaa
melting pointaaaaaaaaaa
Login to view more

Abstract

The invention relates to a biphenyl-blocked thin film special material for polyether-ether-ketone as well as a preparation method and application thereof in preparing a polyether-ether-ketone / polyetherimide alloy thin film and belongs to the technical field of high molecular composite materials. By taking 4-hydroxyl biphenyl which is lower in cost and has a liquid crystal state as the blocking group, the prepared polyether-ether-ketone (PEEK) has a stable end group, so that not only can the stability of the resin be improved, but also the melt viscosity of the resin can be improved. By means of compatibility and performance complementarity of high molecular polymers, the polyether-ether-ketone / polyetherimide alloy thin film which is excellent in performance is prepared. By uniaxial tension of the thin film, a uniaxial tension process of the polyether-ether-ketone / polyetherimide alloy thin film and a late-stage thermal treatment process of the polyether-ether-ketone / polyetherimide alloy thin film are developed. The prepared polyether-ether-ketone / polyetherimide alloy thin film is good in processing flowability and high in toughness of the material while keeps the crystal structure of the polyether-ether-ketone material.

Description

technical field [0001] The invention belongs to the technical field of polymer composite materials, and in particular relates to a biphenyl-terminated film-grade polyetheretherketone resin special material, a preparation method and an application in preparing polyetheretherketone / polyetherimide alloy films. Background technique [0002] Because of its excellent heat resistance, good chemical stability and excellent mechanical properties, polyether ether ketone is considered as a special engineering plastic with excellent comprehensive properties. It is widely used in national defense, military industry, electronics, medical and other fields. In recent years, polyether ether ketone film materials have attracted much attention. Because polyether ether ketone films have the advantages of high temperature resistance, corrosion resistance, and radiation resistance of polyether ether ketone resins, they are widely used in the fields of aviation, nuclear energy and electronics. How...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): C08G65/40C08L71/10C08L79/08B29C69/02B29C47/92B29C71/02B29L7/00B29C48/92
Inventor 姜振华庞金辉张海博张淑玲
Owner JILIN UNIV
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products