Multistage magnetic field electric arc iron plating method adopting lining positive bias tapered pipe and straight pipe compositing
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A technology of arc ion plating and positive bias, which is applied in the field of material surface treatment, can solve the problems of large particle defects and low arc plasma transmission efficiency, improve crystal structure and stress state, avoid large particle defects, and improve bonding strength Effect
Active Publication Date: 2017-05-31
ZHENGZHOU UNIVERSITY OF AERONAUTICS
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[0004] The purpose of the present invention is to solve the traditional arc ion plating method using low-melting point pure metal or multi-element alloy material and non-metallic material (such as graphite) as the target material, which is easy to produce large particle defects, and the arc plasma transmission efficiency caused by the curved magnetic filter technology. Low-level problems, combined with the multi-level magnetic field filtering method and the composite effect of the mechanical barrier shielding of the conical tube's own shape and the positive bias electric field attraction, at the same time ensure that the arc plasma passes through the conical tube and the multi-level magnetic field with high transmission efficiency The filtering device enables continuous and dense preparation of high-quality thin films on the surface of the workpiece under the condition of applying negative bias voltage, and at the same time realizes the control of element content in the thin film, reduces the production cost of using alloy targets, improves the deposition efficiency of thin films, and reduces large particle defects Detrimental effects on film growth and performance, a multi-stage magnetic field arc ion plating method lined with positively biased conical tubes and straight tubes is proposed
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specific Embodiment approach 1
[0015] Specific implementation mode one: the following combination figure 1 and 2 Describe this embodiment, the device used in the multi-stage magnetic field arc ion plating method of lining positive bias conical pipe and straight pipe composite in this embodiment includes bias power supply 1, arc power supply 2, arc ion plating target source 3, multi-stage Magnetic field device 4, multi-stage magnetic field power supply 5, liner positive bias tapered tube and straight tube composite device 6, positive bias power supply 7, sample stage 8, bias power supply waveform oscilloscope 9 and vacuum chamber 10;
[0016] The method includes the following steps:
[0017] Step 1, place the substrate workpiece to be processed on the sample stage 8 in the vacuum chamber 10, and insulate between the lining positive bias conical tube and the straight tube composite device 6 and the vacuum chamber 10 and the multi-stage magnetic field device 4, and the workpiece and The sample stage 8 is con...
specific Embodiment approach 2
[0026] Embodiment 2: The difference between this embodiment and Embodiment 1 is that the method also includes:
[0027] Step 3: Thin films can be deposited by combining traditional DC magnetron sputtering, pulsed magnetron sputtering, traditional arc ion plating and pulsed cathodic arc with DC bias, pulse bias or DC pulse composite bias to prepare pure metal films , compound ceramic films with different element ratios, functional films and high-quality films with nano-multilayer or gradient structures.
specific Embodiment approach 3
[0028] Embodiment 3: The difference between this embodiment and Embodiment 2 is that Steps 1 to 3 are repeated to prepare multi-layered thin films with different stress states, microstructures and element ratios, and the others are the same as Embodiment 2.
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Abstract
The invention relates to a multistage magnetic field electric arc iron plating method adopting lining positive bias tapered pipe and straight pipe compositing and belongs to the technical field of material surface treatment. The problem of losses in the process of pollution cleaning of macroparticles and deposited irons to the inner wall of a pipe and transmitting of electric arc plasma in a filtering device of a multistage magnetic field is solved. The method comprises the following steps that firstly, a workpiece to be subjected to film plating is placed on a sample table in a vacuum chamber, relative power supplies are powered on, and an external water-cooling system is started; secondly, a thin film is deposited, specifically, when the vacuum degree in the vacuum chamber is smaller than 10<-4> Pa, working air is pumped in, air pressure is adjusted, and a film plating power supply is started; meanwhile, a bias power supply is utilized to attract electric arc plasma in an outlet, and energy is adjusted; by means of the self obstructing shield of a lining positive bias tapered pipe and straight pipe compositing device, the inhibiting effect of a positive bias electric field and the filtering effect of the multistage magnetic field, the macroparticile defect is effectively eliminated, and the transmitting efficiency of the electric arc plasma is guaranteed; and the needed process parameters are set to prepare the thin film.
Description
technical field [0001] The invention relates to a multi-stage magnetic field arc ion plating method in which a positively biased conical tube and a straight tube are combined, and belongs to the technical field of material surface treatment. Background technique [0002] In the process of preparing thin films by arc ion plating, due to the arc spot current density as high as 2.5~5×10 10 A / m 2 , causing molten liquid metal to appear at the arc spot position on the target surface, which is splashed out in the form of droplets under the action of local plasma pressure, and adheres to the surface of the film or is embedded in the film to form "macroparticles" (Macroparticles) Defects (BoxmanR L, Goldsmith S. Macroparticle contamination in cathodic arc coatings: generation, transport and control [J]. Surf Coat Tech, 1992, 52(1): 39-50.). In the arc plasma, since the movement speed of electrons is much greater than that of ions, the number of electrons reaching the surface of la...
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