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Method for achieving electro-deposition preparation of diamond-like carbon film in choline compound aqueous solution

A diamond thin film and compound technology, applied in the direction of electrolytic inorganic material coating, etc., can solve the problems of high energy consumption, high voltage application, difficult operation, etc., and achieve the effects of easy quality, reduced electrolytic voltage, and good repeatability

Active Publication Date: 2017-05-31
JIANGSU MINGFENG ELECTRONIC MATERIALS CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] The technical problem to be solved by the present invention is: in the process of liquid-phase electrochemical deposition of diamond-like film in the prior art, high pressure and high temperature need to be applied, the operation is difficult and the energy consumption is high

Method used

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  • Method for achieving electro-deposition preparation of diamond-like carbon film in choline compound aqueous solution
  • Method for achieving electro-deposition preparation of diamond-like carbon film in choline compound aqueous solution
  • Method for achieving electro-deposition preparation of diamond-like carbon film in choline compound aqueous solution

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Experimental program
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Embodiment 1-10

[0027] The treated FTO electrode is used as the cathode, and the carbon rod is used as the anode, and the distance between the cathode and the anode is adjusted to be 7 mm, and a certain voltage is applied. The type, concentration and applied voltage of the electrolyte used are shown in Table 1.

[0028] Adopt DXR laser micro-Raman spectrum to characterize the thin film structure, the Raman spectrum of thin film prepared in embodiment 1 to 10 is at 1360cm -1 (D peak) and 1580cm -1 (G peak) presents two broad scattering peaks (as attached figure 1 Shown), it can be confirmed that the prepared film is a typical diamond-like carbon film.

[0029] From the appearance, if the formed diamond-like film is very good, it is expressed as "◎", if the formed diamond-like film is poor, it is expressed as "○", if no diamond-like film is formed, it is expressed as "X", as shown in Table 1 Shown:

[0030] Conditions and results of the embodiment of table 1

[0031]

[0032] It has been...

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Abstract

The invention belongs to the technical field of diamond-like carbon film preparation, and particularly relates to a method for achieving electro-deposition preparation of a diamond-like carbon film in a choline compound aqueous solution. According to the method, fluorine-doped stannic oxide conducting glass, ITO or monocrystalline silicon serves as a cathode, a carbon rod serves as an anode, and the choline compound solution serves as an electrolyte. Under the normal temperature condition, the direct voltage ranging from 0.5 V to 30 V is applied between the cathode and the anode, and the diamond-like carbon film can be deposited on the cathode. The method has the beneficial effects of being simple in equipment, low in energy consumption, high in deposition rate, good in film forming uniformity and the like, and industrial production is easy to achieve.

Description

technical field [0001] The invention belongs to the technical field of diamond-like film preparation, and in particular relates to a method for preparing a diamond-like film by electrodeposition in an aqueous solution of choline compounds. Background technique [0002] Diamond-like Carbon Films (DLC film for short) is a kind of amorphous carbon film whose hardness, optical, electrical, chemical and tribological properties are similar to diamond. For example, it has the characteristics of high hardness, low friction coefficient, high resistivity, good biocompatibility, low dielectric constant, wide optical bandgap, etc., and can be used in mechanical, electronic, chemical, military, aerospace and other technical fields. [0003] At present, the traditional methods for preparing diamond-like carbon films include physical vapor deposition (PVD) and chemical vapor deposition (CVD), such as ion beam deposition, cathodic arc deposition, sputtering deposition, and plasma enhanced c...

Claims

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Application Information

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IPC IPC(8): C25D9/04C25D3/02
CPCC25D3/02C25D9/04
Inventor 陈智栋张倩王世颖王文昌
Owner JIANGSU MINGFENG ELECTRONIC MATERIALS CO LTD