Surface clad layer treatment method of copper tungsten electrical contact material for arc extinguish chamber
An electrical contact material and processing method technology, applied in metal material coating process, coating, sputtering and other directions, can solve the problem of deterioration of material stability and service life, deterioration of material surface roughness, unfavorable industrial production, etc. The problem is to improve the selective concentrated ablation of the arc, improve the strong hardness and arc resistance, and improve the abnormal breakdown discharge phenomenon.
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Embodiment 1
[0032] A method for treating the surface of a copper-tungsten electric contact material for an arc extinguishing chamber, comprising the following steps:
[0033]The CuW60 electrical contact material with a density of 92% prepared by the infiltration method was selected as the base material. After the CuW60 contact material was mechanically polished to a surface roughness of about 0.5 μm, it was placed in an alcohol solution for ultrasonication for 10 minutes, and then Put it in acetone solution and ultrasonically clean it for 10 minutes, and finally rinse it with deionized water and dry it with a hair dryer; then place the CuW60 substrate on a special fixture and fix it on the sample stage in the magnetron sputtering vacuum chamber , put into copper target, tungsten target and chromium target, let the base surface of the contact material be paralleled downward, and place it at 45° with the plane of copper target, tungsten target and chromium target; vacuumize the vacuum cavity...
Embodiment 2
[0035] A method for treating the surface of a copper-tungsten electric contact material for an arc extinguishing chamber, comprising the following steps:
[0036] The CuW80 electrical contact material with a density of 90% prepared by PAS sintering was selected as the base material. After the CuW80 contact material was mechanically polished to a surface roughness of about 0.5 μm, it was placed in an alcohol solution for ultrasonication for 5 minutes, and then Put it in acetone solution and ultrasonically clean it for 5 minutes, and finally rinse it with deionized water and dry it with a hair dryer; then place the CuW80 substrate on a special fixture and fix it on the sample stage in the magnetron sputtering vacuum chamber , put copper target, tungsten target and titanium target, make the base surface of the contact material parallel downward, and place it at 45° to the plane of copper target, tungsten target and titanium target; vacuumize the vacuum chamber to make the chamber ...
Embodiment 3
[0038] A method for treating the surface of a copper-tungsten electric contact material for an arc extinguishing chamber, comprising the following steps:
[0039] The CuW90 electrical contact material with a density of 93% prepared by the infiltration method was selected as the base material. After the CuW90 contact material was mechanically polished to a surface roughness of about 0.5 μm, it was placed in an alcohol solution for ultrasonication for 10 minutes, and then Put it in acetone solution and ultrasonically clean it for 10 minutes, and finally rinse it with deionized water and dry it with a hair dryer; then place the CuW90 substrate on a special fixture and fix it on the sample stage in the magnetron sputtering vacuum chamber , put copper target, tungsten target and nickel target, make the base surface of the contact material parallel downward, and place it at 45° with the plane of copper target, tungsten target and nickel target; vacuumize the vacuum chamber to make th...
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