Patterned transparent back plate material

A patterned and transparent technology, applied in polyester coatings, rosin coatings, polyurea/polyurethane coatings, etc., can solve the problems of double-sided cells that do not achieve high light utilization, and achieve a simple and easy coating and curing process , the gain effect is obvious, and the attenuation effect is low after aging

Active Publication Date: 2018-03-06
HANGZHOU FIRST APPLIED MATERIAL CO LTD
View PDF8 Cites 21 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0007] However, the use of ordinary transparent backsheet materials does not achieve a high light utilization rate for both the front and back of the double-sided cell. Therefore, effective design

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Patterned transparent back plate material
  • Patterned transparent back plate material
  • Patterned transparent back plate material

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0067] The formula of matrix layer is as follows (mass fraction):

[0068] Polyethylene terephthalate (DuPont, USA) 90%;

[0069] Modified resin maleic anhydride graft compatibilizer C701 (Chuanju Chemical Technology Co., Ltd.) 5%;

[0070] Hydrolysis Stabilizer P200 (Rheinland Chemical) 0.01%;

[0071] Antioxidant tetrakis(3,5-di-tert-butyl-4-hydroxy)pentaerythritol phenylpropionate (Germany BASF) 0.01%;

[0072] Heat stabilizer hydrotalcite powder (Cunda Chemical Products Co., Ltd.) 4.95%;

[0073] The formula of weather-resistant layer is as follows (mass fraction):

[0074] Fluorine resin GK570 (Japan Daikin paint) 90%;

[0075] Hydroxy acrylic resin LR7765 (Mitsubishi, Japan) 5%;

[0076] Isophorone diisocyanate prepolymer (Japan Polyurethane Company) 3%;

[0077] UV absorber 3-[3-(2-H-benzotriazol-2-yl)-4-hydroxy-5-tert-butylphenyl]-propionic acid-polyethylene glycol ester (Taiwan Double Bond Chemical Company) 1.2%;

[0078] Light stabilizer poly{[6-[(1,1,3,3-tet...

Embodiment 2

[0095] The formula of matrix layer is as follows (mass fraction):

[0096] Polyethylene terephthalate (U.S. DuPont) 50%;

[0097] Modified resin M210 (Japan Zhongyuan) 30%;

[0098] Hydrolysis stabilizer I powder (Rheinland Chemical) 10%;

[0099] Antioxidant triethylene glycol ether-bis(3-tert-butyl-4-hydroxy-5-methylphenyl) propionate (Yongguang Chemical, Taiwan, China) 5%;

[0100] Heat stabilizer N-phenylmaleimide-styrene-methyl methacrylate (Huawen Chemical Co., Ltd.) 5%;

[0101] The formula of weather-resistant layer is as follows (mass fraction):

[0102] Fluororesin T-1 (Sanaifu Chemical) 50%;

[0103] Terpene resin 803L (Yoshida Chemical Co., Ltd.) 30%;

[0104] White carbon black (Jinhe Nano Chemical Co., Ltd.) 3%;

[0105] Methylated polymethylol melamine resin (Changchun Chemical, Taiwan, China) 15%;

[0106] UV Absorber 2-[4-[2-Hydroxy-3-dodecyloxypropyl]oxy]-2-hydroxyphenyl]-4,6-bis(2,4-dimethylphenyl) -1,3,5-triazine (BASF, Germany) 0.8%;

[0107] Ligh...

Embodiment 3

[0122] The formula of matrix layer is as follows (mass fraction):

[0123] Polyethylene terephthalate (DuPont, USA) 62%;

[0124] Modified resin MR501 (Japan Zhongyuan) 20%;

[0125] Hydrolysis stabilizer UN-03 (Shanghai Union Chemical) 5%;

[0126] Antioxidant triethylene glycol ether-bis(3-tert-butyl-4-hydroxy-5-methylphenyl) propionate (BASF, Germany) 3%;

[0127] Heat stabilizer N-phenylmaleimide-styrene-methyl methacrylate (Huawen Chemical Co., Ltd.) 10%;

[0128] The formula of weather-resistant layer is as follows (mass fraction):

[0129] Fluororesin 4102 (Changxing Chemical) 40%;

[0130] Hydroxy polyester resin ST5790 (Japan Toyobo) 20%;

[0131] Scratch-resistant powder (Renqian Chemical Technology Co., Ltd.) 10%;

[0132] Hexamethylene diisocyanate prepolymer (Bayer, Germany) 20%;

[0133] UV absorber 2-(4,6-bis(2,4-dimethylphenyl)-1,3,5-triazin-2-yl)-5-octyloxyphenol (BASF, Germany) 4% ;

[0134] Light stabilizer bis(1,2,2,6,6-pentamethyl-4-piperidinyl)-s...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

PropertyMeasurementUnit
Thicknessaaaaaaaaaa
Login to view more

Abstract

The invention relates to a patterned transparent back plate material which consists of a pattern layer, an adhesive layer, a substrate layer and a weather resistant layer in sequence, wherein the pattern layer has good reflection properties in visible light-near infrared areas of 400-1200nm and faces to the side of a battery piece when being used. Due to integration of good light permeability andgood reflection, a transparent back plate made of the patterned transparent back plate material is excellent in comprehensive property such as long-term weather resistance, adhesiveness and insulation. The patterned transparent back plate material is novel in design, simple in preparation process, easy to operate and excellent in product performance, an effective power gain effect is provided fordouble-side power generation crystalline silicon photovoltaic modules, a base is made for cost optimization of a crystalline silicon photovoltaic back plate material, and meanwhile long-term outdoor use reliability of the photovoltaic modules is powerfully ensured.

Description

technical field [0001] The invention belongs to the field of photovoltaic encapsulation materials, in particular to a transparent backboard material. Background technique [0002] In recent years, new energy has become the general trend, among which solar energy is inexhaustible and inexhaustible, which has become the focus of new energy development. According to the "Letter on Soliciting Opinions on the Construction Scale of Photovoltaic Power Generation in 2013 and 2014", the construction scale of photovoltaic power generation increased by 20% in 2014, reaching 12GW, of which 8GW is distributed photovoltaic, and its industrial scale can reach 1.2 trillion yuan, one trillion Yuan's industry is gradually taking shape, and its development potential is huge. The "Notice of the General Division of the National Energy Administration on Doing a Good Job in the Preparation of the 13th Five-Year Plan for Solar Energy Development" mentioned that solar energy resources are abundant,...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
IPC IPC(8): C08L67/02C08L27/12C08L33/04C08L71/02C08L35/06C08L45/00C08K5/526C08K3/26C08K5/134C09J133/04C09J163/00C09J167/08C09J161/06C09J167/00C09J11/04C09D167/08C09D167/00C09D167/04C09D175/04C09D145/00C09D193/04C09D133/04C09D7/62C09D7/61C09D4/02C09D4/06H01L31/048H01L31/049H01L31/056
CPCC08K2003/2241C08K2201/003C08L67/02C08L2201/08C08L2201/10C08L2203/204C08L2205/035C08L2205/08C09D4/06C09D167/00C09D167/08C09D175/04C09D193/04C09J11/04C09J133/04C09J167/00C09J167/08H01L31/0481H01L31/049H01L31/056C08L27/12C08L33/04C08L71/02C08K5/526C08K3/26C08K5/1345C08L35/06C08L45/00C08K13/02C08K3/36C08L63/00C08K13/06C08K9/02C08K7/20C08K3/22C08L67/04C08K7/18Y02E10/52
Inventor 林维红梅云宵詹志英王伟周光大林建华
Owner HANGZHOU FIRST APPLIED MATERIAL CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap