Preparation method of body-centered cubic Ta coating

A body-centered cubic, tantalum coating technology, applied in the field of material science, can solve problems such as difficulty in promotion, chromic waste water and waste gas cause cancer, increase production costs, etc., to avoid environmental pollution and poisoning problems, avoid easy peeling problems, improve The effect of thermal shock resistance

Active Publication Date: 2018-06-01
INST OF METAL RESEARCH - CHINESE ACAD OF SCI +1
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

In addition, the fatal disadvantage of hexavalent chromium in the chromium electroplating process is: chromium-containing wastewater and waste gas are serious carcinogens, which belong to the national first-class control emissions, and are extremely harmful to the environment and human beings; the electroplating production equipment must include sewage treatment equipment, so that increased production costs
S.L.Lee et al. (Mater.Res.Soc.Symp.Proc.Vol.987 2007Materials Research Society) and Beijing University of Science and Technology Zhang Guling et al. (Prog.Nat.Sci.16 (2006) 1119-1126) proposed to use Kr and Xe two kinds of inert gases as sputtering gases, which can deposit 100% α- Ta coating, but the price of Kr and Xe two inert gases is extremely expensive and very rare, it is difficult to promote

Method used

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  • Preparation method of body-centered cubic Ta coating
  • Preparation method of body-centered cubic Ta coating
  • Preparation method of body-centered cubic Ta coating

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0028] The substrate is made of 30CrNi3MoV alloy steel. The sample size is 15mm×10mm×2mm. The purity of the tantalum target is 99.99wt%. chamber; the chamber is vacuumed to below 7×10 -2 Pa, turn on the heater, heat the surrounding of the sample to 250 degrees Celsius, and then pump the background vacuum to 1×10 -2 Pa. Inject argon to 1.6×10 -1 Pa, start sputtering. The power supply used is a DC power supply, the sputtering power is set to 2.0kW, and the sputtering power density is 4W / cm 2 , the deposition time was about 4 hours, and the thickness of the tantalum coating was about 47 μm.

[0029] Observation of the cross-section and surface of the deposited tantalum coating shows that the structure of the film layer is dense and well combined with the substrate, such as figure 1 (a) and figure 1 (b) shown. X-ray diffraction analysis shows that the existence of almost no β-Ta diffraction peaks can be detected in the coating, all of which are the diffraction peaks of body...

Embodiment 2

[0031] The substrate is made of 25Cr3Mo3NiNb alloy steel. The sample size is 15mm×10mm×2mm. The purity of the tantalum target is 99.99wt%. chamber; the chamber is vacuumed to below 7×10 -2 Pa, turn on the heater, heat the surrounding of the sample to 300 degrees Celsius, and then pump the background vacuum to 7×10 -3 Pa. Inject argon to 1.3×10 -1 Pa, start sputtering. The power supply used is a DC power supply, the sputtering power is set to 2.0kW, and the sputtering power density is 4W / cm 2 , the deposition time is about 1 hour, and the thickness of the tantalum coating is about 12 μm.

[0032] Observation of the cross-section and surface of the deposited tantalum coating shows that the structure of the coating is dense and well combined with the substrate. X-ray diffraction analysis shows that the existence of almost no β-Ta diffraction peaks can be detected in the coating, all of which are the diffraction peaks of α-Ta, such as Figure 4 shown. The thermal shock resi...

Embodiment 3

[0034] The substrate is PCrNi3M O V alloy steel, the sample size is 15mm×10mm×2mm, the purity of the tantalum target is 99.99wt%, the distance between the substrate and the target is 25mm (in the range of the negative glow area), the substrate is loaded into the working room after surface cleaning; The studio is vacuumed to below 7×10 -2 Pa, turn on the heater, heat the surrounding of the sample to 270 degrees Celsius, and then pump the background vacuum to 7×10 -3 Pa. Inject argon to 1.2×10 -1 Pa, start sputtering. The power supply used is a DC power supply, the sputtering power is set to 2.0kW, and the sputtering power density is 4W / cm 2, the deposition time was about 6 hours, and the thickness of the tantalum coating was about 63 μm.

[0035] Observation of the cross-section and surface of the deposited tantalum coating shows that the structure of the coating is dense and well combined with the substrate. X-ray diffraction analysis shows that almost no β-Ta diffractio...

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Abstract

The invention relates to the field of material science, in particular to a preparation method of a body-centered cubic Ta coating. With adoption of a negative glow region magnetron sputtering method,a substrate part is placed in a negative glow region between an anode and a cathode, heating temperature of the substrate is 200-400 DEG C, a direct-current power supply or a pulsed power supply is used, pure Ta is taken as a target, Ar is taken as working gas, and sputtering power density is 3-15 W/cm<2>. With adoption of the method, the body-centered cubic lattice alpha-Ta coating can be deposited, and binding force and thermal shock resistance are remarkably better than those of an excellent conventional magnetron sputtered Ta coating. The Ta coating prepared with the method binds well withthe substrate when the thickness of the Ta coating reaches about 100 mu m, while the Ta coating prepared with the conventional magnetron sputtering method peels off when the thickness reaches 15 mu m. The thermal shock resistance of the Ta coating prepared with the method and having thickness of 100 mu m is 7 times higher than that of the Ta coating prepared with the conventional magnetron sputtering method and having thickness of 10 mu m.

Description

Technical field: [0001] The invention relates to the field of material science, in particular to a method for preparing a body-centered cubic tantalum coating. Background technique: [0002] Generally, electrochrome plating is used to improve the wear resistance, high temperature resistance and corrosion resistance of key components such as the inner bore of the gun barrel and the coal mine hydraulic support. Electroplated chromium coatings have many disadvantages, such as: high brittleness, relatively low shear strength and tensile strength, and many problems such as easy peeling and cracking. Under the action of cyclic thermal stress, abrasive wear or plastic flow, the electroplated chromium layer system often cracks due to insufficient toughness, and the defects such as microcracks in electroplated chromium inevitably provide short-range channels for the intrusion of ablation atmosphere and corrosive solution. In addition, the fatal disadvantage of hexavalent chromium in...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/35C23C14/14
CPCC23C14/14C23C14/35
Inventor 牛云松朱圣龙陈明辉沈明礼鲍泽斌王福会王世臣杨军
Owner INST OF METAL RESEARCH - CHINESE ACAD OF SCI
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