Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

1,1-diacetylferrocene chiral poly-schiff base salt/graphene composite wave absorbing material

A technology of diacetylferrocene and composite wave-absorbing materials, which is applied in the field of wave-absorbing materials, can solve the problems of narrow wave-absorbing frequency bandwidth and high density, and achieve the effects of strong wave-absorbing performance, thin thickness, and stable performance

Active Publication Date: 2018-06-15
NANCHANG HANGKONG UNIVERSITY
View PDF9 Cites 2 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] Aiming at the deficiencies of existing wave-absorbing materials such as high density and narrow wave-absorbing frequency bandwidth, the present invention provides a 1,1-diacetylferrocene chiral poly-Schiff base salt / graphene composite wave-absorbing material and its preparation method

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0019] (1) Dissolve 0.01mol of chiral 1,2-propanediamine in 30ml of absolute ethanol to prepare a chiral diamine ethanol solution.

[0020] (2) Dissolve 0.01mol 1,1-diacetylferrocene in 30ml of absolute ethanol, then slowly drop the solution into the chiral diamine ethanol solution, add glacial acetic acid as a catalyst at the same time, heat up to 60°C, and Under the reaction 6h.

[0021] (3) Add 0.02mol ferrous sulfate to the above reaction solution, continue to react for 10h, filter the resulting product under reduced pressure, rinse the filter cake with absolute ethanol and deionized water for 3 times, and then put it into a vacuum drying oven for drying After 12 hours, the chiral 1,1-diacetylferrocene poly-Schiff base iron salt was obtained.

[0022] (4) Put 0.6g of chiral 1,1-diacetylferrocene poly-Schiff base iron salt into ethanol for ultrasonic dispersion to obtain chiral 1,1-diacetylferrocene poly-Schiff base salt Ethanol suspension; put 0.15g graphene into ethanol...

Embodiment 2

[0028] (1) Dissolve 0.02mol of chiral 1,2-cyclohexanediamine in 60ml of absolute ethanol to prepare a chiral diamine ethanol solution.

[0029](2) Dissolve 0.02mol 1,1-diacetylferrocene in 60ml of absolute ethanol, then slowly drop the solution into the chiral diamine ethanol solution, add glacial acetic acid as a catalyst at the same time, heat up to 55°C, and Under the reaction 8h.

[0030] (3) Add 0.04mol cobalt chloride to the above reaction solution, continue the reaction for 12h, filter the resulting product under reduced pressure, rinse the filter cake with absolute ethanol and deionized water for 3 times, and then put it into a vacuum drying oven for drying After 12 hours, chiral 1,1-diacetylferrocene poly-Schiff base cobalt salt was obtained.

[0031] (4) Put 1g of chiral 1,1-diacetylferrocene poly-Schiff base cobalt salt into ethanol for ultrasonic dispersion to obtain chiral 1,1-diacetylferrocene poly-Schiff base cobalt salt Ethanol suspension; put 0.25g graphene ...

Embodiment 3

[0037] (1) Dissolve 0.01mol of chiral 2,2-diamino-1,1-binaphthyl in 30ml of absolute ethanol to prepare a chiral diamine ethanol solution.

[0038] (2) Dissolve 0.01mol 1,1-diacetylferrocene in 30ml of absolute ethanol, then slowly drop the solution into the chiral diamine ethanol solution, add glacial acetic acid as a catalyst at the same time, heat up to 60°C, and Under the reaction 7h.

[0039] (3) Add 0.02mol cobalt chloride to the above reaction solution, continue to react for 10h, filter the resulting product under reduced pressure, rinse the filter cake with absolute ethanol and deionized water for 3 times, and then put it into a vacuum drying oven to dry After 12 hours, chiral 1,1-diacetylferrocene poly-Schiff base cobalt salt was obtained.

[0040] (4) Put 0.4g of chiral 1,1-diacetylferrocene poly-Schiff base cobalt salt into ethanol for ultrasonic dispersion to obtain chiral 1,1-diacetylferrocene poly-Schiff base salt Ethanol suspension; put 0.1g graphene into etha...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
thicknessaaaaaaaaaa
thicknessaaaaaaaaaa
thicknessaaaaaaaaaa
Login to View More

Abstract

The invention relates to a 1,1-diacetylferrocene chiral poly-schiff base salt / graphene composite wave absorbing material. The 1,1-diacetylferrocene chiral poly-schiff base salt / graphene composite waveabsorbing material is a chiral conductive polymer composite material. The material is prepared by compounding the chiral 1,1-diacetylferrocene chiral poly-schiff base salt with the graphene and thenadding a paraffin matrix. The composite material has the advantages of simple and convenient preparation process and low density; in addition, by combining the preparation process with chiral characteristic of the composite material, the composite material has strong practical value in electromagnetic wave absorbing materials, electromagnetic shielding, electromagnetic radiation protection and thelike.

Description

technical field [0001] The invention relates to a 1,1-diacetylferrocene chiral poly-Schiff base salt / graphene composite wave-absorbing material. The composite wave-absorbing material belongs to electromagnetic wave absorbing materials and belongs to the technical field of wave-absorbing materials. Background technique [0002] The absorbing material is generally composed of a matrix material and an absorbing medium, which can absorb the electromagnetic wave energy projected on its surface, and convert the electromagnetic wave energy into heat energy or other forms of energy through the dielectric loss of the material. In addition to having a high absorption rate for electromagnetic waves in a wide frequency band, excellent wave-absorbing materials also need to have properties such as light weight, temperature resistance, moisture resistance, and corrosion resistance. Traditional absorbing materials such as ferrite, metal powder, barium titanate, silicon carbide, graphite, co...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): C08L79/04C08K3/04C08G73/06C09K3/00
CPCC08G73/0644C08G73/065C08K3/04C09K3/00C08L79/04
Inventor 王靳一然刘崇波张祥李琳吴铭魏鑫唐维露
Owner NANCHANG HANGKONG UNIVERSITY
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com