Method for preparing large-area single-oriented hexagonal boron nitride two-dimensional atomic crystal
A two-dimensional atomic crystal and hexagonal boron nitride technology, applied in the field of material science, can solve the problems that h-BN research has not been reported yet, and achieve the effects of low cost, good controllability and simple preparation process
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[0020] see figure 1 As shown, the present invention provides a method for preparing a large-area single-orientation hexagonal boron nitride two-dimensional atomic crystal, which includes the following steps:
[0021] Step 1, epitaxially a transition metal single crystal thin film with a predetermined thickness on a magnesium oxide MgO(111) single crystal substrate to form a sample; the MgO(111) single crystal substrate is 100 μm 2 The surface roughness within the range is less than 1.5nm (the present embodiment is 1.0nm); the method of the epitaxial transition metal single crystal thin film is magnetron sputtering method, ion beam sputtering method, molecular beam epitaxy method, thermal evaporation method One or more combination, the preferred epitaxial method is magnetron sputtering (this embodiment is magnetron sputtering); the transition metal single crystal thin film is Ni(111) single crystal thin film or Cu(111 ) single crystal film (this embodiment is Ni(111) single cr...
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