A kind of heterojunction photovoltaic cell and its preparation method
A photovoltaic cell and heterojunction technology, which is applied in photovoltaic power generation, circuits, electrical components, etc., can solve the problems of reducing the photoelectric conversion efficiency of organic and inorganic solar cells, the inability to carry out large-scale applications, and the long time of methylation treatment. , to achieve the effect of improving the photoelectric conversion efficiency, increasing the contact increase, and the method is simple and easy
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[0018] A method for preparing a heterojunction photovoltaic cell proposed in a specific embodiment of the present invention includes the following steps:
[0019] (1) Cleaning of n-type silicon wafers: ultrasonically clean n-type silicon wafers in acetone, ethanol, and deionized water for 10-15 minutes, and then place them in concentrated H 2 SO 4 / H 2 o 2 mixed solution and heated to 100-110°C for 50-70 minutes, the concentrated H 2 SO 4 / H 2 o 2 H in the mixed solution 2 SO 4 with H 2 o 2 The volume ratio is 3:1, then rinse the n-type silicon wafer with deionized water, and dry it with nitrogen for standby;
[0020] (2) Prepare a pyramid-structured textured layer on the upper surface of the n-type silicon wafer: place the n-type silicon wafer obtained in step 1 in a mixed solution of NaOH and ethanol, wherein in the mixed solution, the The mass fraction of NaOH is 4-5%, the volume fraction of the ethanol is 12-15%, etch at 80-90°C for 40-50 minutes to obtain the p...
Embodiment 1
[0029] A method for preparing a heterojunction photovoltaic cell, comprising the following steps:
[0030] (1) Cleaning of n-type silicon wafers: ultrasonically clean n-type silicon wafers in acetone, ethanol, and deionized water for 12 minutes, and then place them in concentrated H 2 SO 4 / H 2 o 2 mixed solution and heated to 105°C for 60 minutes, the concentrated H 2 SO 4 / H 2 o 2 H in the mixed solution 2 SO 4 with H 2 o 2 The volume ratio is 3:1, then rinse the n-type silicon wafer with deionized water, and dry it with nitrogen for standby;
[0031] (2) Prepare a pyramid-structured textured layer on the upper surface of the n-type silicon wafer: place the n-type silicon wafer obtained in step 1 in a mixed solution of NaOH and ethanol, wherein in the mixed solution, the The mass fraction of NaOH is 4.5%, the volume fraction of the ethanol is 12%, etch at 90°C for 45 minutes to obtain the pyramid structure texture layer, and then place the n-type silicon wafer in ...
Embodiment 2
[0040] A method for preparing a heterojunction photovoltaic cell, comprising the following steps:
[0041] (1) Cleaning of n-type silicon wafers: ultrasonically clean n-type silicon wafers in acetone, ethanol, and deionized water for 15 minutes, and then place them in concentrated H 2 SO 4 / H 2 o 2 mixed solution and heated to 110°C for 50 minutes, the concentrated H 2 SO 4 / H 2 o 2 H in the mixed solution 2 SO 4 with H 2 o 2 The volume ratio is 3:1, then rinse the n-type silicon wafer with deionized water, and dry it with nitrogen for standby;
[0042] (2) Prepare a pyramid-structured textured layer on the upper surface of the n-type silicon wafer: place the n-type silicon wafer obtained in step 1 in a mixed solution of NaOH and ethanol, wherein in the mixed solution, the The mass fraction of NaOH is 4%, the volume fraction of the ethanol is 15%, etch at 85°C for 50 minutes to obtain the pyramid structure texture layer, and then place the n-type silicon wafer in hy...
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