The invention discloses a PN junction gate
gallium oxide-based MODFET device and a preparation method thereof, the PN junction gate
gallium oxide-based MODFET device sequentially comprises a substrate, a channel layer, a spacing layer, a
delta doping layer and a
barrier layer, and further comprises a first
ohmic contact region arranged on one side of the end surfaces of the spacing layer, the
delta doping layer and the
barrier layer; the second
ohmic contact region is arranged on the other side of the end surfaces of the spacing layer, the
delta doping layer and the
barrier layer; the first
ohmic contact region and the second ohmic
contact region are higher than the upper surface of the barrier layer; the PN junction structure is arranged on a part of the surface of the barrier layer; the
dielectric layer structure is arranged above the barrier layer, the PN junction structure, the first ohmic
contact region and the second ohmic
contact region in a crossing manner; a source
electrode disposed on the first ohmic contact region; the drain
electrode is arranged on the second ohmic contact region; the gate
electrode is arranged on the PN junction structure and the
dielectric layer structure, and the upper end of the gate electrode extends towards the two ends of the
dielectric layer structure located above the PN junction structure to form a field plate structure. The reliability of the device can be improved.