Method for preparing nitrogen-doped graphene supported carbon-coated silicon-based composite negative electrode material for lithium ion battery
A nitrogen-doped graphene and negative electrode material technology, applied in the field of electrochemical materials and new energy, can solve the problems that are not conducive to large-scale production of materials, increase the pressure of the inner tank of the reactor, and the low output of the hydrothermal reaction method. Achieve excellent cycle performance, facilitate uniform dispersion, and good reproducibility
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment 1
[0026] Dissolve 0.015mmol of column[5]arene in 30mL of deionized water with stirring, then continue to add it to the graphene oxide solution (30mL) containing 1.2mol under stirring, and stir for 2h to obtain supramolecularly modified Graphene oxide solution (NSM-GO). 11.2 g of nano-silica powder was dispersed in 80 mL of deionized water under ultrasonic conditions, and then added dropwise into the NSM-GO mixed solution. The above mixed solution was transferred to a 250 mL round bottom flask, 10 mL of hydrazine hydrate was added, and the reaction was refluxed at 80° C. for 8 h while stirring. The obtained product was collected by centrifugation, and a graphene-supported silicon material was obtained after vacuum drying. The above graphene-supported silicon material is placed in a tube furnace, and nitrogen is introduced as a protective gas at a gas flow rate of 200mL / min. After the temperature is raised to 800°C, a mixed gas of acetylene / nitrogen with a volume ratio of 1:10 is...
Embodiment 2
[0028] Dissolve 0.06 mmol of column [5] aromatics in 30 mL of deionized water with stirring, then continue to add it to the graphene oxide solution (30 mL) containing 1.2 mol under stirring, and stir for 2 h to obtain supramolecularly modified Graphene oxide solution (NSM-GO). 16.8 g of nano-silica powder was dispersed in 80 mL of deionized water under ultrasonic conditions, and then added dropwise into the NSM-GO mixed solution. The above mixed solution was transferred to a 250 mL round bottom flask, 10 mL of hydrazine hydrate was added, and the reaction was refluxed at 80° C. for 8 h while stirring. The obtained product was collected by centrifugation, and a graphene-supported silicon material was obtained after vacuum drying. The above-mentioned graphene-supported silicon material was placed in a tube furnace, and nitrogen gas was introduced as a protective gas at a gas flow rate of 200 mL / min. After the temperature was raised to 800°C, an acetylene / nitrogen mixed gas with...
Embodiment 3
[0031]Dissolve 0.06 mmol of column [5] aromatics in 30 mL of deionized water with stirring, then continue to add it to the graphene oxide solution (30 mL) containing 1.2 mol under stirring, and stir for 2 h to obtain supramolecularly modified Graphene oxide solution (NSM-GO). 16.8 g of nano-silica powder was dispersed in 80 mL of deionized water under ultrasonic conditions, and then added dropwise into the NSM-GO mixed solution. The above mixed solution was transferred to a 250 mL round bottom flask, 10 mL of hydrazine hydrate was added, and the reaction was refluxed at 80° C. for 8 h while stirring. The obtained product was collected by centrifugation, and a graphene-supported silicon material was obtained after vacuum drying. The above-mentioned graphene-supported silicon material was placed in a tube furnace, and nitrogen was introduced as a protective gas at a gas flow rate of 200 mL / min. After the temperature was raised to 700°C, a mixed gas of acetylene / nitrogen with a ...
PUM
Login to View More Abstract
Description
Claims
Application Information
Login to View More - R&D
- Intellectual Property
- Life Sciences
- Materials
- Tech Scout
- Unparalleled Data Quality
- Higher Quality Content
- 60% Fewer Hallucinations
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2025 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com


