A kind of thin film transistor using zinc tin aluminum potassium oxide as channel layer and preparation method thereof
A thin-film transistor, zinc-tin-aluminum-potassium technology, which is applied in the field of thin-film transistors using zinc-tin-aluminum-potassium oxide as a channel layer and the field of preparation thereof, can solve the problem of reducing electron mobility, reducing off-state current of TFT, and being difficult to control. and other problems, to achieve the effect of low energy consumption and low cost preparation
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Embodiment 1
[0030] A thin-film transistor with zinc-tin-aluminum-potassium oxide as the channel layer, using glass as the substrate, zinc-tin-aluminum-potassium oxide film as the channel layer, organic PVP film as the insulating layer, aluminum film as the source electrode, The drain electrode and the gate electrode are used to prepare a TFT with a top-gate coplanar structure, which is prepared by the following method:
[0031] (1) Analytical pure Zn(C 2 h 3 o 2 ) 2 ·5H 2 O, SnCl 2 2H 2 O, AlCl 3 ·6H 2 O and KCl·3H 2 O was dissolved in ethylene glycol, with ethanolamine as a stabilizer, stirred at 70°C for 30 hours to form a transparent precursor solution, wherein the concentration of the precursor solution was 0.2M, Zn(C 2 h 3 o 2 ) 2 ·5H 2 O, SnCl 2 2H 2 O, AlCl 3 ·6H 2 O and KCl 3H 2 The molar ratio of zinc ions, tin ions, aluminum ions, and potassium ions in O is 1:2:0.07:0.1, and the volume ratio of ethanolamine to ethylene glycol is 0.2:100;
[0032] (2) After agi...
Embodiment 2
[0038] A thin-film transistor with zinc-tin-aluminum-potassium oxide as the channel layer, using glass as the substrate, zinc-tin-aluminum-potassium oxide film as the channel layer, organic PVP film as the insulating layer, aluminum film as the source electrode, The drain electrode and the gate electrode are used to prepare a TFT with a top-gate coplanar structure, which is prepared by the following method:
[0039] (1) Analytical pure Zn(C 2 h 3 o 2 ) 2 ·5H 2 O, SnCl 2 2H 2 O, AlCl 3 ·6H 2 O and KCl·3H 2 O was dissolved in ethylene glycol, with ethanolamine as a stabilizer, stirred at 50°C for 24 hours to form a transparent precursor solution, wherein the concentration of the precursor solution was 0.35M, Zn(C 2 h 3 o 2 ) 2 ·5H 2 O, SnCl 2 2H 2 O, AlCl 3 ·6H 2 O and KCl 3H 2 The molar ratio of zinc ions, tin ions, aluminum ions, and potassium ions in O is 1:2:0.07:0.1, and the volume ratio of ethanolamine to ethylene glycol is 0.1:100;
[0040] (2) After ag...
Embodiment 3
[0046] A thin-film transistor with zinc-tin-aluminum-potassium oxide as the channel layer, using glass as the substrate, zinc-tin-aluminum-potassium oxide film as the channel layer, organic PVP film as the insulating layer, aluminum film as the source electrode, The drain electrode and the gate electrode are used to prepare a TFT with a top-gate coplanar structure, which is prepared by the following method:
[0047] (1) Analytical pure Zn(C 2 h 3 o 2 ) 2 ·5H 2 O, SnCl 2 2H 2 O, AlCl 3 ·6H 2 O and KCl·3H 2 O was dissolved in ethylene glycol, with ethanolamine as a stabilizer, stirred at 80°C for 48 hours to form a transparent precursor solution, wherein the concentration of the precursor solution was 0.6M, Zn(C 2 h 3 o 2 ) 2 ·5H 2 O, SnCl 2 2H 2 O, AlCl 3 ·6H 2 O and KCl 3H 2 The molar ratio of zinc ions, tin ions, aluminum ions, and potassium ions in O is 1:2:0.07:0.1, and the volume ratio of ethanolamine to ethylene glycol is 1:100;
[0048] (2) After aging...
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