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High-purity sio extracted from a rice husk 2 Methods

A rice husk, high-purity technology, applied in silica, bulk chemical production, nanotechnology and other directions, can solve the problems of high cost, long process flow, low quality of SiO2 products, etc., to improve the purity, the process is simple, the elimination of The effect of mass transfer resistance

Active Publication Date: 2021-09-14
KUNMING UNIV OF SCI & TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The wet method mainly produces water glass by reacting rice husk with alkali, adding acidulant and chelating agent to precipitate, and then making SiO through aging, washing, drying and other post-treatment processes. 2 , but its process is long, costly, and there are many factors affecting product quality. It requires systematic analysis to determine the optimal process conditions in order to obtain high-quality products.
SiO produced in the prior art 2 The product quality is not high, and acid treatment process, SiO 2 Subsequent processing

Method used

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  • High-purity sio extracted from a rice husk <sub>2</sub> Methods
  • High-purity sio extracted from a rice husk <sub>2</sub> Methods
  • High-purity sio extracted from a rice husk <sub>2</sub> Methods

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Embodiment 1

[0015] Embodiment 1: extract high-purity SiO in a kind of rice husk 2 method, the specific steps are:

[0016] Rice husk, compound oxidant (HNO 3 -H 2 SO 4 mixed oxidant) into the high-temperature and high-pressure reactor, and under airtight conditions, use inert gas (nitrogen) to replace the air in the reactor, and then add distilled water to obtain a reaction system. The system reaches the supercritical state, and react for 20 minutes to obtain the reaction product system, cool to room temperature, separate the solid and liquid phases, wash the solid with deionized water, and dry to obtain high-purity SiO 2 ; The temperature of the supercritical state is 380 ° C, the pressure is 23Mpa; rice husk and HNO 3 The mass ratio is 1:50, HNO 3 with H 2 SO 4 The volume ratio is 1:2;

[0017] The present embodiment high-purity SiO 2 The scanning electron microscope image of figure 1 shown, from figure 1 It can be seen that high-purity SiO 2 The average particle size of cry...

Embodiment 2

[0019] Embodiment 2: extract high-purity SiO in a kind of rice husk 2 method, the specific steps are:

[0020] Rice husk, compound oxidant (HNO 3 -H 2 SO 4 mixed oxidant) into the high-temperature and high-pressure reactor, and under airtight conditions, use inert gas to replace the air in the reactor, and then add distilled water to obtain a reaction system. Critical state, and react for 40 minutes to obtain the reaction product system, cool to room temperature, separate the solid and liquid phases, wash the solid with deionized water, and dry to obtain high-purity SiO 2 ; The temperature of the supercritical state is 400°C and the pressure is 24Mpa; rice husk and HNO 3 The mass ratio is 1:70, HNO 3 with H 2 SO 4 The volume ratio is 1:3;

[0021] The present embodiment high-purity SiO 2 The scanning electron microscope image of figure 2 shown, from figure 2 It can be seen that high-purity SiO 2 The average particle size of crystals is 3.0 nm;

[0022] The prese...

Embodiment 3

[0023] Embodiment 3: extract high-purity SiO in a kind of rice husk 2 method, the specific steps are:

[0024] Rice husk, compound oxidant (HNO 3 -H 2 SO 4 mixed oxidant) into the high-temperature and high-pressure reactor, and under airtight conditions, use inert gas to replace the air in the reactor, and then add distilled water to obtain a reaction system. Critical state, and react for 50 minutes to obtain the reaction product system, cool to room temperature, separate the solid and liquid phases, wash the solid with deionized water, and dry to obtain high-purity SiO 2 ; The temperature of the supercritical state is 420 ℃, the pressure is 24Mpa; rice husk and HNO 3 The mass ratio is 1:100, HNO 3 with H 2 SO 4 The volume ratio is 1:4;

[0025] From this embodiment high-purity SiO 2 The scanning electron microscope picture shows that high-purity SiO 2 The average particle size of crystals is 1.5 nm;

[0026] The present embodiment high-purity SiO 2 The purity is 9...

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Abstract

The invention relates to a method for extracting high-purity SiO from rice husks 2 The method belongs to the technical field of silicon dioxide extraction. In the present invention, rice husks and composite oxidants are added to a high-temperature and high-pressure reaction kettle, and inert gas is used to replace the air in the reaction kettle under airtight conditions, and then distilled water is added to obtain a reaction system, and the reaction system in the high-temperature and high-pressure reaction kettle is heated and pressurized Until the reaction system reaches the supercritical state, react for 20-60 minutes to obtain the reaction product system, cool to room temperature, separate the solid and liquid phases, wash the solid with deionized water, and dry to obtain high-purity SiO 2 ; Wherein the composite oxidant is HNO 3 -H 2 SO 4 Mixed oxidant, the temperature of the supercritical state is 380~450℃, and the pressure is 23~25Mpa. In the present invention, the water in the supercritical state dissolves with the oxidizing agent, eliminates the mass transfer resistance between the phases, and undergoes a strong hydrolysis-oxidation reaction, which can quickly oxidize the organic matter in the rice husk and leach the inorganic salt in the rice husk, and increase the SiO 2 purity.

Description

technical field [0001] The invention relates to a method for extracting high-purity SiO from rice husks 2 The method belongs to the technical field of silicon dioxide extraction. Background technique [0002] Silicon dioxide (SiO 2 ) is an acidic oxide, the most important compound of silicon, accounting for about 12% of the mass of the earth's crust. Silica is mostly used in glass products, ceramic glazes, anti-rust sand blasting, filter sand, fluxes, refractory materials, etc. It can also be used to manufacture important components, optical instruments and handicrafts in the electronics industry. At the same time, silica is also an important raw material for the manufacture of optical fibers. At present, the raw material of silicon dioxide mainly comes from ore, and high-purity SiO is extracted from the ore. 2 The process is more complicated and the cost is higher. High-purity SiO 2 It is the basic raw material for industries such as fine ceramics, optical fiber and s...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C01B33/12B82Y40/00
CPCB82Y40/00C01B33/12C01P2004/03C01P2004/64C01P2006/80Y02P20/54
Inventor 田森林谢明军赵群李英杰胡学伟黄建洪张月超谷俊杰宁平
Owner KUNMING UNIV OF SCI & TECH
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